公开(公告)号：US09818580B2

公开(公告)日：2017-11-14

申请号：US14727857

申请日：2015-06-01

Applicant: Applied Materials, Inc.

Inventor： Jozef Kudela ,  Tsutomu Tanaka ,  Carl A. Sorensen ,  Suhail Anwar ,  John M. White ,  Ranjit Indrajit Shinde ,  Seon-Mee Cho ,  Douglas D. Truong

IPC: H05H1/24 ,  H01J37/32 ,  H01P3/00 ,  H01P11/00 ,  H05H1/46 ,  H01P3/06 ,  H01P3/08 ,  H01Q13/22

CPC classification number: H01J37/32082 ,  H01J37/3222 ,  H01J37/32577 ,  H01P3/00 ,  H01P3/06 ,  H01P3/085 ,  H01P11/003 ,  H01Q13/22 ,  H05H1/24 ,  H05H1/46 ,  H05H2001/463 ,  Y10T29/49169

Abstract: A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises two conductors, one of which has a plurality of apertures. In one aspect, apertures in different portions of the conductor have different sizes, spacing or orientations. In another aspect, adjacent apertures at successive longitudinal positions are offset along the transverse dimension. In another aspect, the apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor.

公开(公告)号：US20150340204A1

公开(公告)日：2015-11-26

申请号：US14727857

申请日：2015-06-01

Applicant: Applied Materials, Inc.

Inventor： Jozef Kudela ,  Tsutomu Tanaka ,  Carl A. Sorensen ,  Suhail Anwar ,  John M. White ,  Ranjit Indrajit Shinde ,  Seon-Mee Cho ,  Douglas D. Truong

IPC: H01J37/32

CPC classification number: H01J37/32082 ,  H01J37/3222 ,  H01J37/32577 ,  H01P3/00 ,  H01P3/06 ,  H01P3/085 ,  H01P11/003 ,  H01Q13/22 ,  H05H1/24 ,  H05H1/46 ,  H05H2001/463 ,  Y10T29/49169

Abstract: A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises two conductors, one of which has a plurality of apertures. In one aspect, apertures in different portions of the conductor have different sizes, spacing or orientations. In another aspect, adjacent apertures at successive longitudinal positions are offset along the transverse dimension. In another aspect, the apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor.

Abstract translation: 用于将RF功率耦合到等离子体室中的等离子体的传输线RF施加装置和方法。 该装置包括两个导体，其中一个具有多个孔。 在一个方面，导体的不同部分中的孔具有不同的尺寸，间距或取向。 在另一方面，连续纵向位置处的相邻孔沿横向尺寸偏移。 在另一方面，该装置包括内部导体和一个或两个外部导体。 一个或两个外部导体中的每一个的主要部分包括在外部导体的内表面和外表面之间延伸的多个孔。