公开(公告)号：US20230220923A1

公开(公告)日：2023-07-13

申请号：US18124126

申请日：2023-03-21

申请人： Applied Materials, Inc.

发明人： Sohrab Zokaei ,  Kiran Garikipati ,  Shawn Thanhsan Le

IPC分类号： F15B13/08 ,  F15B19/00

CPC分类号： F15B13/0817 ,  F15B13/0892 ,  F15B19/005

摘要： A system includes a mounting panel having diffusion-bonded metal plates that form a reservoir to contain a process fluid, multiple channels through which to flow the process fluid, and vias through which to flow the process fluid to and from process fluid control components attached to the mounting panel. At least a pair of the multiple channels are connected with the reservoir. A temperature sensor is attached to a top of the mounting panel, the temperature sensor in fluid communication with the reservoir through one of the vias. A set of inlet ports are attached to the mounting panel, the set of inlet ports to receive the process fluid. At least one outlet port is attached to the mounting panel, the at least one outlet port to output the process fluid from the mounting panel.

公开(公告)号：US20220349489A1

公开(公告)日：2022-11-03

申请号：US17244557

申请日：2021-04-29

申请人： Applied Materials, Inc.

发明人： Sohrab Zokaei ,  Kiran Garikipati ,  Shawn Thanhsan Le

IPC分类号： F16K27/00 ,  F16K37/00

摘要： An apparatus comprises a mounting panel including a top plate having multiple vias and multiple orifices. An internal face of the top plate includes a first cut-out region and channels through which to flow a process fluid. The first cut-out region can be a reservoir in which to contain the process fluid. The multiple vias are adapted for passing the process fluid through the top plate. The multiple orifices are adapted for attaching a plurality of process fluid control components to the mounting panel. An inner plate also has multiple additional vias. The apparatus includes a bottom plate, where the inner plate is compacted between the top plate and the bottom plate to form an integral metallic body in which to contain and flow the process fluid.

公开(公告)号：US20230141012A1

公开(公告)日：2023-05-11

申请号：US17522635

申请日：2021-11-09

申请人： Applied Materials, Inc.

发明人： Kostiantyn Achkasov ,  Peter Reimer ,  Shawn Thanhson Le ,  Sohrab Zokaei

IPC分类号： H01L21/67 ,  G05B19/418

CPC分类号： H01L21/67276 ,  G05B19/41875 ,  H01J37/32917

摘要： Exemplary diagnostic wafers for a semiconductor processing chamber may include a wafer body defining a plurality of recesses. The diagnostic wafers may include at least one data logging puck positionable within one of the plurality of recesses. The diagnostic wafers may include at least one battery puck positionable within one of the plurality of recesses. The diagnostic wafers may include at least one sensor puck positionable within one of the plurality of recesses.

公开(公告)号：US11624450B2

公开(公告)日：2023-04-11

申请号：US17244557

申请日：2021-04-29

申请人： Applied Materials, Inc.

发明人： Sohrab Zokaei ,  Kiran Garikipati ,  Shawn Thanhsan Le

IPC分类号： F16K27/00 ,  F16K37/00 ,  F15B13/08

摘要： An apparatus comprises a mounting panel including a top plate having multiple vias and multiple orifices. An internal face of the top plate includes a first cut-out region and channels through which to flow a process fluid. The first cut-out region can be a reservoir in which to contain the process fluid. The multiple vias are adapted for passing the process fluid through the top plate. The multiple orifices are adapted for attaching a plurality of process fluid control components to the mounting panel. An inner plate also has multiple additional vias. The apparatus includes a bottom plate, where the inner plate is compacted between the top plate and the bottom plate to form an integral metallic body in which to contain and flow the process fluid.

公开(公告)号：US12018372B2

公开(公告)日：2024-06-25

申请号：US17317342

申请日：2021-05-11

申请人： Applied Materials, Inc.

发明人： Tetsuya Ishikawa ,  Swaminathan T. Srinivasan ,  Matthias Bauer ,  Ala Moradian ,  Manjunath Subbanna ,  Kartik Bhupendra Shah ,  Errol Antonio C. Sanchez ,  Sohrab Zokaei ,  Michael R. Rice ,  Peter Reimer

IPC分类号： C23C16/40 ,  B01J4/00 ,  C23C16/44 ,  C23C16/455

CPC分类号： C23C16/4558 ,  B01J4/005 ,  B01J4/008 ,  C23C16/4412 ,  C23C16/45587

摘要： The present disclosure generally relates to gas inject apparatus for a process chamber for processing of semiconductor substrates. The gas inject apparatus include one or more gas injectors which are configured to be coupled to the process chamber. Each of the gas injectors are configured to receive a process gas and distribute the process gas across one or more gas outlets. The gas injectors include a plurality of pathways, a fin array, and a baffle array. The gas injectors are individually heated. A gas mixture assembly is also utilized to control the concentration of process gases flown into a process volume from each of the gas injectors. The gas mixture assembly enables the concentration as well as the flow rate of the process gases to be controlled.

公开(公告)号：US11236834B2

公开(公告)日：2022-02-01

申请号：US16297542

申请日：2019-03-08

申请人： Applied Materials, Inc.

发明人： Kenneth Le ,  Balarabe Mohammed ,  Sohrab Zokaei ,  Ming Xu

IPC分类号： F16K7/14 ,  F16K31/06 ,  F16K31/122

摘要： A diaphragm valve includes an inlet port, an outlet port, and a valve seat proximate one of the inlet port or the outlet port. A diaphragm is positioned relative to the valve seat and has an open state wherein the diaphragm is spaced from the valve seat to enable a fluid path between the inlet port and the outlet port. The diaphragm has a closed state wherein the diaphragm is seated on the valve seat to block the fluid path. A coupling member is coupled between the diaphragm and a reciprocatable member and configured to maintain the diaphragm in the open state while the reciprocatable member is in the opened position. The coupling member may have a clearance gap relative to the reciprocatable member when the reciprocatable member is in the closed position. Other diaphragm valves and methods of operating diaphragm valves are also disclosed.

公开(公告)号：US20200284360A1

公开(公告)日：2020-09-10

申请号：US16297542

申请日：2019-03-08

申请人： Applied Materials, Inc.

发明人： Kenneth Le ,  Balarabe Mohammed ,  Sohrab Zokaei ,  Ming Xu

IPC分类号： F16K7/14

摘要： A diaphragm valve includes an inlet port, an outlet port, and a valve seat proximate one of the inlet port or the outlet port. A diaphragm is positioned relative to the valve seat and has an open state wherein the diaphragm is spaced from the valve seat to enable a fluid path between the inlet port and the outlet port. The diaphragm has a closed state wherein the diaphragm is seated on the valve seat to block the fluid path. A coupling member is coupled between the diaphragm and a reciprocatable member and configured to maintain the diaphragm in the open state while the reciprocatable member is in the opened position. The coupling member may have a clearance gap relative to the reciprocatable member when the reciprocatable member is in the closed position. Other diaphragm valves and methods of operating diaphragm valves are also disclosed.