公开(公告)号：US11772958B2

公开(公告)日：2023-10-03

申请号：US17475294

申请日：2021-09-14

Applicant: APPLIED MATERIALS, INC.

Inventor： Nir Merry ,  Paul Wirth ,  Ming Xu ,  Sushant Koshti ,  Raechel Chu-Hui Tan

IPC: B81B3/00 ,  G01F1/684 ,  G01F1/72 ,  G01F1/86 ,  G05D7/06

CPC classification number: B81B3/0018 ,  G01F1/6845 ,  G01F1/72 ,  G01F1/86 ,  G05D7/0623 ,  G05D7/0647 ,  B81B2201/0292 ,  B81B2203/01 ,  B81B2203/0315 ,  B81B2203/0338 ,  B81B2207/11

Abstract: Disclosed herein are embodiments of a mass flow control apparatus, systems incorporating the same, and methods using the same. In one embodiment, a mass flow control apparatus comprises a flow modulating valve configured to modulate gas flow in a gas flow channel, a sensor device, such as a micro-electromechanical (MEMS) device, configured to generate a signal responsive to a condition of the gas flow, and a processing device operatively coupled to the flow modulating valve and the sensor device to control the flow modulating valve based on a signal received from the sensor device.

公开(公告)号：US20250167027A1

公开(公告)日：2025-05-22

申请号：US18517791

申请日：2023-11-22

Applicant: Applied Materials, Inc.

Inventor： Srinivas Poshatrahalli Gopalakrishna ,  Shivaraj Nara Manjunath ,  Devendra Channappa Holeyannavar ,  Paul Reuter ,  Douglas Baumgarten ,  Sushant Koshti ,  Amit Kumar Biswas ,  Nithiyanantham Balasubramaniam ,  Latha Ramesh ,  Navya Talluri

IPC: H01L21/673 ,  G01N19/10 ,  G01N33/00 ,  G06F30/27 ,  H01L21/67

Abstract: A method for monitoring inside parameters of a substrate carrier. The method includes receiving a first substrate carrier, supplying a fluid, at a first flow rate, through an inlet of the first substrate carrier, and at least partially purging the fluid through an outlet of the first substrate carrier for a first period of time. The method further includes measuring, using a first sensor disposed at the outlet, a first value of a first property of an exhaust from the substrate carrier at the outlet of the first substrate carrier, and determining, based at least in part on the first value of the first property, a second value of the first property inside the first substrate carrier.

公开(公告)号：US20220083081A1

公开(公告)日：2022-03-17

申请号：US17475294

申请日：2021-09-14

Applicant: APPLIED MATERIALS, INC.

Inventor： Nir Merry ,  Paul Wirth ,  Ming Xu ,  Sushant Koshti ,  Raechel Chu-Hui Tan

IPC: G05D7/06 ,  G01F1/86 ,  G01F1/72 ,  G01F1/684

Abstract: Disclosed herein are embodiments of a mass flow control apparatus, systems incorporating the same, and methods using the same. In one embodiment, a mass flow control apparatus comprises a flow modulating valve configured to modulate gas flow in a gas flow channel, a sensor device, such as a micro-electromechanical (MEMS) device, configured to generate a signal responsive to a condition of the gas flow, and a processing device operatively coupled to the flow modulating valve and the sensor device to control the flow modulating valve based on a signal received from the sensor device.