公开(公告)号：US09859135B2

公开(公告)日：2018-01-02

申请号：US14626903

申请日：2015-02-19

Applicant: Applied Materials, Inc.

Inventor： Jonathan S. Frankel ,  Brian J. Brown ,  Vincent S. Francischetti ,  Paul McHugh ,  Kyle M. Hanson ,  Ekaterina Mikhaylichenko

IPC: B05B1/04 ,  H01L21/67 ,  H01L21/02

CPC classification number: H01L21/67051 ,  B05B1/046 ,  H01L21/02052 ,  H01L21/67057

Abstract: An example waterfall apparatus includes (1) a first portion of a first width having (a) a first plenum, a second plenum, and a restricted fluid path therebetween; (b) a first coupling surface; and (c) an inlet opening that creates a fluid path between the first coupling surface and the first plenum; and (2) a second portion of a second width larger than the first width and having (a) a second coupling surface; and (b) an inlet aligned with the first portion inlet opening. The first and second coupling surfaces form a slot that extends along at least a portion of a length of the waterfall apparatus and that connects to the second plenum. Fluid introduced into the second portion inlet fills the first plenum, travels through the restricted fluid path to the second plenum, and exits the slot between the first and second portions to form a rinsing fluid waterfall.

公开(公告)号：US09984867B2

公开(公告)日：2018-05-29

申请号：US14602201

申请日：2015-01-21

Applicant: Applied Materials, Inc.

Inventor： Ekaterina Mikhaylichenko ,  Brian J. Brown ,  Kyle M. Hanson ,  Vincent S. Francischetti

IPC: H01L21/02 ,  H01L21/67 ,  H01L21/677 ,  B08B3/08

CPC classification number: H01L21/02054 ,  B08B3/08 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67057 ,  H01L21/67733 ,  H01L21/67736 ,  H01L21/67751

Abstract: In some embodiments, a system is provided that includes (1) a loading position; (2) a drying position; (3) a movable tank configured to (a) hold at least one substrate; (b) hold a cleaning chemistry so as to expose a substrate within the movable tank to the cleaning chemistry; and (c) translate between the loading position and the drying position; and (4) a drying station located at the drying position and configured to rinse and dry a substrate as the substrate is unloaded from the movable tank when the movable tank is at the drying position. Numerous other aspects are provided.

公开(公告)号：US20160181086A1

公开(公告)日：2016-06-23

申请号：US14602201

申请日：2015-01-21

Applicant: Applied Materials, Inc.

Inventor： Ekaterina Mikhaylichenko ,  Brian J. Brown ,  Kyle M. Hanson ,  Vincent S. Francischetti

IPC: H01L21/02 ,  B08B3/08 ,  H01L21/67 ,  H01L21/677

CPC classification number: H01L21/02054 ,  B08B3/08 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67057 ,  H01L21/67733 ,  H01L21/67736 ,  H01L21/67751

Abstract: In some embodiments, a system is provided that includes (1) a loading position; (2) a drying position; (3) a movable tank configured to (a) hold at least one substrate; (b) hold a cleaning chemistry so as to expose a substrate within the movable tank to the cleaning chemistry; and (c) translate between the loading position and the drying position; and (4) a drying station located at the drying position and configured to rinse and dry a substrate as the substrate is unloaded from the movable tank when the movable tank is at the drying position. Numerous other aspects are provided.

Abstract translation: 在一些实施例中，提供一种系统，其包括（1）装载位置; （2）干燥位置; （3）可移动罐，其构造成（a）保持至少一个基板; （b）保持清洁化学品，以将可移动罐内的基底暴露于清洁化学品; 和（c）在装载位置和干燥位置之间平移; 和（4）位于干燥位置处的干燥站，其构造为当可移动罐处于干燥位置时基底从可移动罐卸载时冲洗和干燥基底。 提供了许多其他方面。

公开(公告)号：US20160175857A1

公开(公告)日：2016-06-23

申请号：US14626903

申请日：2015-02-19

Applicant: Applied Materials, Inc.

Inventor： Jonathan S. Frankel ,  Brian J. Brown ,  Vincent S. Francischetti ,  Paul McHugh ,  Kyle M. Hanson ,  Ekaterina Mikhaylichenko

IPC: B05B1/04

CPC classification number: H01L21/67051 ,  B05B1/046 ,  H01L21/02052 ,  H01L21/67057

Abstract: An example waterfall apparatus includes (1) a first portion of a first width having (a) a first plenum, a second plenum, and a restricted fluid path therebetween; (b) a first coupling surface; and (c) an inlet opening that creates a fluid path between the first coupling surface and the first plenum; and (2) a second portion of a second width larger than the first width and having (a) a second coupling surface; and (b) an inlet aligned with the first portion inlet opening. The first and second coupling surfaces form a slot that extends along at least a portion of a length of the waterfall apparatus and that connects to the second plenum. Fluid introduced into the second portion inlet fills the first plenum, travels through the restricted fluid path to the second plenum, and exits the slot between the first and second portions to form a rinsing fluid waterfall.

Abstract translation: 示例性瀑布装置包括（1）第一宽度的第一部分，其具有（a）第一增压室，第二增压室和它们之间的限制流体路径; （b）第一耦合表面; 和（c）入口开口，其在所述第一联接表面和所述第一增压室之间产生流体路径; 和（2）第二宽度大于第一宽度的第二部分，并且具有（a）第二联接表面; 和（b）与第一部分入口开口对准的入口。 第一和第二联接表面形成沿着瀑布装置的长度的至少一部分延伸并连接到第二增压室的槽。 引入第二部分入口的流体填充第一集气室，穿过受限制的流体路径到达第二集气室，并且离开第一和第二部分之间的槽，以形成冲洗流体瀑布。