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1.发明申请CONDUCTIVE ELEMENT FOR ELECTRICALLY COUPLING AN EUVL MASK TO A SUPPORTING CHUCK 有权将EUVL面罩电气连接到支撑卡盘的导电元件公开(公告)号：US20130075605A1
公开(公告)日：2013-03-28
申请号：US13623804
申请日：2012-09-20
Applicant: APPLIED MATERIALS ISRAEL, LTD.
Inventor： Igor Krivts (Krayvitz) , Israel Avneri , Yoram Uziel , Nir Ben-David , Ido Holcman , Itzak Yair , Yosi Basson
CPC classification number: H01J37/20 , F16B17/00 , G01N23/18 , G03F1/22 , G03F1/40 , H01J2237/0044 , H01J2237/20 , H01J2237/2008 , H01L21/6831 , Y10T279/23 , Y10T403/70
Abstract: A coupling module may include an upper portion that defines an aperture, mask contact elements, chuck contact elements and an intermediate element that is connected between the mask contact elements and the upper portion. A shape and a size of the aperture may correspond to a shape and size of a pattern transfer area of an extreme ultra violet (EUVL) mask. The coupling module may be shaped and sized so that once the mask contact elements contact the upper portion of the EUVL mask, the chuck contact elements contact a chuck that supports the mask. The coupling module may further provide at least one conductive path between the upper portion of the EUVL mask and the chuck when the EUVL mask is positioned on the chuck.
Abstract translation: 耦合模块可以包括限定孔的上部，掩模接触元件，卡盘接触元件和连接在掩模接触元件和上部之间的中间元件。 孔径的形状和尺寸可以对应于极紫外（EUVL）掩模的图案转移区域的形状和尺寸。 耦合模块的形状和尺寸可以使得一旦掩模接触元件接触EUVL掩模的上部，卡盘接触元件就接触支撑掩模的卡盘。 当EUVL掩模位于卡盘上时，耦合模块还可以在EUVL掩模的上部和卡盘之间提供至少一个导电路径。
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2.发明授权Conductive element for electrically coupling an EUVL mask to a supporting chuck 有权用于将EUVL掩模电耦合到支撑卡盘的导电元件公开(公告)号：US08772737B2
公开(公告)日：2014-07-08
申请号：US13623804
申请日：2012-09-20
Applicant: Applied Materials Israel, Ltd.
Inventor： Igor Krivts (Krayvitz) , Israel Avneri , Yoram Uziel , Nir Ben-David Dodzin , Ido Holcman , Itzak Yair , Yosi Basson
IPC: H01J37/20 , H01L21/683 , G03F1/14 , G03F1/40 , G03F1/22
CPC classification number: H01J37/20 , F16B17/00 , G01N23/18 , G03F1/22 , G03F1/40 , H01J2237/0044 , H01J2237/20 , H01J2237/2008 , H01L21/6831 , Y10T279/23 , Y10T403/70
Abstract: A coupling module may include an upper portion that defines an aperture, mask contact elements, chuck contact elements and an intermediate element that is connected between the mask contact elements and the upper portion. A shape and a size of the aperture may correspond to a shape and size of a pattern transfer area of an extreme ultra violet (EUVL) mask. The coupling module may be shaped and sized so that once the mask contact elements contact the upper portion of the EUVL mask, the chuck contact elements contact a chuck that supports the mask. The coupling module may further provide at least one conductive path between the upper portion of the EUVL mask and the chuck when the EUVL mask is positioned on the chuck.
Abstract translation: 耦合模块可以包括限定孔的上部，掩模接触元件，卡盘接触元件和连接在掩模接触元件和上部之间的中间元件。 孔径的形状和尺寸可以对应于极紫外（EUVL）掩模的图案转移区域的形状和尺寸。 耦合模块的形状和尺寸可以使得一旦掩模接触元件接触EUVL掩模的上部，卡盘接触元件就接触支撑掩模的卡盘。 当EUVL掩模位于卡盘上时，耦合模块还可以在EUVL掩模的上部和卡盘之间提供至少一个导电路径。
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