公开(公告)号：US20160161869A1

公开(公告)日：2016-06-09

申请号：US15040908

申请日：2016-02-10

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Israel Avneri ,  Igor Krivts (Krayvitz) ,  Yoram Uziel ,  Nir Ben-David Dodzin ,  Ido Holcman

IPC: G03F9/00

CPC classification number: G03F9/7096 ,  G03F7/0002 ,  H01L21/67359 ,  H01L21/67775 ,  H01L21/67778

Abstract: A system for coupling a mask to a mask holder. The system includes a base, an aperture; mask holder cover supporting elements arranged to move between a first position and a third position while supporting the mask holder cover; mask supporting elements arranged to move between a fourth position and a sixth position while supporting the mask; mask holder base supporting elements arranged to support the mask holder base. When the mask holder cover supporting elements are at the first position and the mask supporting elements are at the third position the mask holder cover, the mask and the base are spaced apart from each other. When the mask holder cover supporting elements are at the third position and the mask supporting elements are at the sixth position the mask holder cover, the mask and the base are connected to each other.

Abstract translation: 一种用于将掩模与掩模支架结合的系统。 该系统包括基座，孔径; 掩模保持器盖支撑元件，布置成在支撑掩模保持器盖的同时在第一位置和第三位置之间移动; 掩模支撑元件，布置成在支撑所述掩模的同时在第四位置和第六位置之间移动; 布置用于支撑掩模支架基座的掩模支架基座支撑元件。 当掩模支架覆盖支撑元件处于第一位置并且掩模支撑元件处于第三位置时，掩模保持器盖，掩模和基座彼此间隔开。 当掩模保持器覆盖支撑元件处于第三位置并且掩模支撑元件处于第六位置时，掩模保持器盖，掩模和基座彼此连接。

公开(公告)号：US20130075605A1

公开(公告)日：2013-03-28

申请号：US13623804

申请日：2012-09-20

Applicant: APPLIED MATERIALS ISRAEL, LTD.

Inventor： Igor Krivts (Krayvitz) ,  Israel Avneri ,  Yoram Uziel ,  Nir Ben-David ,  Ido Holcman ,  Itzak Yair ,  Yosi Basson

IPC: F16B17/00 ,  G01N23/18

CPC classification number: H01J37/20 ,  F16B17/00 ,  G01N23/18 ,  G03F1/22 ,  G03F1/40 ,  H01J2237/0044 ,  H01J2237/20 ,  H01J2237/2008 ,  H01L21/6831 ,  Y10T279/23 ,  Y10T403/70

Abstract: A coupling module may include an upper portion that defines an aperture, mask contact elements, chuck contact elements and an intermediate element that is connected between the mask contact elements and the upper portion. A shape and a size of the aperture may correspond to a shape and size of a pattern transfer area of an extreme ultra violet (EUVL) mask. The coupling module may be shaped and sized so that once the mask contact elements contact the upper portion of the EUVL mask, the chuck contact elements contact a chuck that supports the mask. The coupling module may further provide at least one conductive path between the upper portion of the EUVL mask and the chuck when the EUVL mask is positioned on the chuck.

Abstract translation: 耦合模块可以包括限定孔的上部，掩模接触元件，卡盘接触元件和连接在掩模接触元件和上部之间的中间元件。 孔径的形状和尺寸可以对应于极紫外（EUVL）掩模的图案转移区域的形状和尺寸。 耦合模块的形状和尺寸可以使得一旦掩模接触元件接触EUVL掩模的上部，卡盘接触元件就接触支撑掩模的卡盘。 当EUVL掩模位于卡盘上时，耦合模块还可以在EUVL掩模的上部和卡盘之间提供至少一个导电路径。

公开(公告)号：US09829809B2

公开(公告)日：2017-11-28

申请号：US15040908

申请日：2016-02-10

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Israel Avneri ,  Igor Krivts (Krayvitz) ,  Yoram Uziel ,  Nir Ben-David Dodzin ,  Ido Holcman

IPC: G03B27/62 ,  G03B27/58 ,  G03F9/00 ,  H01L21/673 ,  H01L21/677 ,  G03F7/00

CPC classification number: G03F9/7096 ,  G03F7/0002 ,  H01L21/67359 ,  H01L21/67775 ,  H01L21/67778

Abstract: A system for coupling a mask to a mask holder. The system includes a base, an aperture; mask holder cover supporting elements arranged to move between a first position and a third position while supporting the mask holder cover; mask supporting elements arranged to move between a fourth position and a sixth position while supporting the mask; mask holder base supporting elements arranged to support the mask holder base. When the mask holder cover supporting elements are at the first position and the mask supporting elements are at the third position the mask holder cover, the mask and the base are spaced apart from each other. When the mask holder cover supporting elements are at the third position and the mask supporting elements are at the sixth position the mask holder cover, the mask and the base are connected to each other.

公开(公告)号：US08772737B2

公开(公告)日：2014-07-08

申请号：US13623804

申请日：2012-09-20

Applicant: Applied Materials Israel, Ltd.

Inventor： Igor Krivts (Krayvitz) ,  Israel Avneri ,  Yoram Uziel ,  Nir Ben-David Dodzin ,  Ido Holcman ,  Itzak Yair ,  Yosi Basson

IPC: H01J37/20 ,  H01L21/683 ,  G03F1/14 ,  G03F1/40 ,  G03F1/22

CPC classification number: H01J37/20 ,  F16B17/00 ,  G01N23/18 ,  G03F1/22 ,  G03F1/40 ,  H01J2237/0044 ,  H01J2237/20 ,  H01J2237/2008 ,  H01L21/6831 ,  Y10T279/23 ,  Y10T403/70

Abstract: A coupling module may include an upper portion that defines an aperture, mask contact elements, chuck contact elements and an intermediate element that is connected between the mask contact elements and the upper portion. A shape and a size of the aperture may correspond to a shape and size of a pattern transfer area of an extreme ultra violet (EUVL) mask. The coupling module may be shaped and sized so that once the mask contact elements contact the upper portion of the EUVL mask, the chuck contact elements contact a chuck that supports the mask. The coupling module may further provide at least one conductive path between the upper portion of the EUVL mask and the chuck when the EUVL mask is positioned on the chuck.

Abstract translation: 耦合模块可以包括限定孔的上部，掩模接触元件，卡盘接触元件和连接在掩模接触元件和上部之间的中间元件。 孔径的形状和尺寸可以对应于极紫外（EUVL）掩模的图案转移区域的形状和尺寸。 耦合模块的形状和尺寸可以使得一旦掩模接触元件接触EUVL掩模的上部，卡盘接触元件就接触支撑掩模的卡盘。 当EUVL掩模位于卡盘上时，耦合模块还可以在EUVL掩模的上部和卡盘之间提供至少一个导电路径。