公开(公告)号：US20070089982A1

公开(公告)日：2007-04-26

申请号：US11256195

申请日：2005-10-24

申请人： Hendryk Richert ,  Patrick Wieland ,  Armin Schmidt ,  Gerald Janicke ,  Roland Weidl ,  Bernd Gruenler ,  Hans-Jurgen Tiller ,  Uwe Kriltz

发明人： Hendryk Richert ,  Patrick Wieland ,  Armin Schmidt ,  Gerald Janicke ,  Roland Weidl ,  Bernd Gruenler ,  Hans-Jurgen Tiller ,  Uwe Kriltz

IPC分类号： C23C14/00

CPC分类号： H01J37/3405 ,  H01J37/3497

摘要： A sputtering target includes an outer target tube, an inner support tube of rectangular cross-sectional shape supporting a magnet carrier extending along substantially the entire length of the inner support tube; and a water cooling circuit including at least one passageway within said inner support tube with an inlet at one end thereof adapted to receive cooling water from an external source, at least one outlet aperture at an opposite end thereof opening to a chamber radially between the inner support tube and the outer target tube; and at least one cooling water outlet at the one end of the inner support tube.

摘要翻译： 溅射靶包括外目标管，支撑沿着内支撑管的整个长度延伸的磁体载体的矩形横截面形状的内支撑管; 以及水冷却回路，其包括在所述内部支撑管内的至少一个通道，其一端处的入口适于接收来自外部源的冷却水，在其相对端处的至少一个出口孔径向地在所述内部 支撑管和外目标管; 以及在内支撑管的一端的至少一个冷却水出口。

公开(公告)号：US20070089985A1

公开(公告)日：2007-04-26

申请号：US11256196

申请日：2005-10-24

申请人： Armin Schmidt ,  Gerald Janicke ,  Roland Weidl ,  Hendryk Richert ,  Bernd Gruenler ,  Hans-Jurgen Tiller ,  Uwe Kriltz

发明人： Armin Schmidt ,  Gerald Janicke ,  Roland Weidl ,  Hendryk Richert ,  Bernd Gruenler ,  Hans-Jurgen Tiller ,  Uwe Kriltz

IPC分类号： C23C14/00

CPC分类号： H01J37/3497 ,  H01J37/3405

摘要： A sputtering target comprising an outer target tube, an inner support tube supporting a magnet carrier extending along substantially the entire length of the inner support tube; and a water cooling circuit including at least one passageway within the inner support tube with an inlet at one end thereof adapted to receive cooling water from an external source, at least one outlet aperture at an opposite end thereof opening to a cooling chamber radially between the inner support tube and the outer target tube; and a plurality of spiral vane segments attached to an outer surface of the inner support tube.

摘要翻译： 一种溅射靶，包括外目标管，支撑沿着内支撑管的整个长度延伸的磁体载体的内支撑管; 以及水冷却回路，其包括在所述内部支撑管内的至少一个通道，其一端处的入口适于从外部源接收冷却水;至少一个在其相对端处的出口孔， 内支撑管和外目标管; 以及附接到内部支撑管的外表面的多个螺旋叶片段。

公开(公告)号：US07504011B2

公开(公告)日：2009-03-17

申请号：US11256196

申请日：2005-10-24

申请人： Armin Schmidt ,  Gerald Janicke ,  Roland Weidl ,  Hendryk Richert ,  Bernd E. Gruenler ,  Hans-Jurgen Tiller ,  Uwe Kriltz

发明人： Armin Schmidt ,  Gerald Janicke ,  Roland Weidl ,  Hendryk Richert ,  Bernd E. Gruenler ,  Hans-Jurgen Tiller ,  Uwe Kriltz

IPC分类号： C23C14/35

CPC分类号： H01J37/3497 ,  H01J37/3405

摘要： A sputtering target comprising an outer target tube, an inner support tube supporting a magnet carrier extending along substantially the entire length of the inner support tube; and a water cooling circuit including at least one passageway within the inner support tube with an inlet at one end thereof adapted to receive cooling water from an external source, at least one outlet aperture at an opposite end thereof opening to a cooling chamber radially between the inner support tube and the outer target tube; and a plurality of spiral vane segments attached to an outer surface of the inner support tube.

摘要翻译： 一种溅射靶，包括外目标管，支撑沿着内支撑管的整个长度延伸的磁体载体的内支撑管; 以及水冷却回路，其包括在所述内部支撑管内的至少一个通道，其一端处的入口适于从外部源接收冷却水;至少一个在其相对端处的出口孔， 内支撑管和外目标管; 以及附接到内部支撑管的外表面的多个螺旋叶片段。

公开(公告)号：US07560011B2

公开(公告)日：2009-07-14

申请号：US11256200

申请日：2005-10-24

申请人： Hendryk Richert ,  Uwe Kriltz ,  Armin Schmidt ,  Roland Weidl ,  Gerald Janicke

发明人： Hendryk Richert ,  Uwe Kriltz ,  Armin Schmidt ,  Roland Weidl ,  Gerald Janicke

IPC分类号： C23C14/35

CPC分类号： H01J37/3497 ,  H01J37/3405

摘要： A sputtering target includes an outer target tube, an inner support tube supporting a magnet carrier bar extending along substantially the entire length of the inner support tube; and a water cooling circuit including at least one passageway within the inner support tube with an inlet at one end thereof adapted to receive cooling water from an external source, at least one outlet aperture at an opposite end thereof opening to a cooling plenum radially between the inner support tube and the outer target tube; and a baffle comprising a substantially flat plate attached to the inner support tube adjacent the opposite end, the plate extending radially within the plenum between the inner support tube and the outer target tube and having an array of flow apertures therein.

摘要翻译： 溅射靶包括外目标管，支撑沿着内支撑管的整个长度延伸的磁体承载杆的内支撑管; 以及水冷却回路，其包括在所述内支撑管内的至少一个通道，其一端处的入口适于从外部源接收冷却水，所述至少一个出口在其相对端处径向地通向所述冷却室， 内支撑管和外目标管; 以及挡板，其包括邻近所述相对端附接到所述内支撑管的基本平坦的板，所述板在所述内支撑管和所述外目标管之间的所述增压室内径向延伸并且在其中具有一组流动孔。

公开(公告)号：US20070089986A1

公开(公告)日：2007-04-26

申请号：US11256200

申请日：2005-10-24

申请人： Hendryk Richert ,  Uwe Kriltz ,  Armin Schmidt ,  Roland Weidl ,  Gerald Janicke

发明人： Hendryk Richert ,  Uwe Kriltz ,  Armin Schmidt ,  Roland Weidl ,  Gerald Janicke

IPC分类号： C23C14/00

CPC分类号： H01J37/3497 ,  H01J37/3405

摘要： A sputtering target includes an outer target tube, an inner support tube supporting a magnet carrier bar extending along substantially the entire length of the inner support tube; and a water cooling circuit including at least one passageway within the inner support tube with an inlet at one end thereof adapted to receive cooling water from an external source, at least one outlet aperture at an opposite end thereof opening to a cooling plenum radially between the inner support tube and the outer target tube; and a baffle comprising a substantially flat plate attached to the inner support tube adjacent the opposite end, the plate extending radially within the plenum between the inner support tube and the outer target tube and having an array of flow apertures therein.

摘要翻译： 溅射靶包括外目标管，支撑沿着内支撑管的整个长度延伸的磁体承载杆的内支撑管; 以及水冷却回路，其包括在所述内支撑管内的至少一个通道，其一端处的入口适于从外部源接收冷却水，所述至少一个出口在其相对端处径向地通向所述冷却室， 内支撑管和外目标管; 以及挡板，其包括邻近所述相对端附接到所述内支撑管的基本平坦的板，所述板在所述内支撑管和所述外目标管之间的所述增压室内径向延伸并且在其中具有一组流动孔。

公开(公告)号：US20080047831A1

公开(公告)日：2008-02-28

申请号：US11509075

申请日：2006-08-24

申请人： Hendryk Richert ,  Roland Weidl ,  Bernd Grunler ,  Gerald Janicke ,  Siegfried Kern ,  Uwe Kriltz

发明人： Hendryk Richert ,  Roland Weidl ,  Bernd Grunler ,  Gerald Janicke ,  Siegfried Kern ,  Uwe Kriltz

IPC分类号： C23C14/00

CPC分类号： C23C14/3407 ,  C23C14/35 ,  H01J37/3405 ,  H01J37/3452

摘要： A modular and/or segmented magnetic bar for magnetron sputtering targets is provided. A magnet bar is made up of a plurality of magnet segments aligned in a substantially linear manner. One or more magnet bars may be provided. The positions of the magnet segments may be selectively adjusted to, for example, adjust magnetic field(s), replace magnet segment(s) that have been broken or damaged, and so forth.

摘要翻译： 提供了用于磁控溅射靶的模块化和/或分段磁棒。 磁棒由以基本线性的方式排列的多个磁体段组成。 可以提供一个或多个磁棒。 可以选择性地调整磁体段的位置以例如调节磁场，替换已经被破坏或损坏的磁体段等等。

公开(公告)号：US20070015960A1

公开(公告)日：2007-01-18

申请号：US10547229

申请日：2004-01-19

申请人： Peter Gornert ,  Jochen Heinrich ,  Hendryk Richert ,  Michael Roder ,  Udo Warschewske

发明人： Peter Gornert ,  Jochen Heinrich ,  Hendryk Richert ,  Michael Roder ,  Udo Warschewske

IPC分类号： A61B1/00

CPC分类号： A61B5/062 ,  A61B5/06 ,  A61B34/20 ,  A61B90/361 ,  A61B2034/107 ,  A61B2034/2051 ,  A61B2034/2072 ,  A61B2090/3954

摘要： The invention relates to a device for localizing tracking bodies (10), comprising at least one tracking body which is placed inside a physiological structure, and a means which is situated outside of the structure and which consists of sensor clusters (20) in a sensor cluster arrangement (55) as well as a method for localizing and influencing the tracking body. The tracking body is provided in the form of a body which is characterized by a finite remanent magnetization with a variable magnetic dipole moment and an anisotropic magnetic dipole field resulting therefrom. The sensor clusters (20) are provided in the form of a plurality of gradiometer sensors (30) with a specific measuring geometry. Optionally, physical/chemical properties and/or a trajectory of the tracking body may be altered in a specific manner by an externally acting magnetic field (H) and/or physiological processes in the environment of the at least one tracking body. In addition, it is possible to detect the location of a variable, in particular, a displaceable portion (57) which is associated with an expanded imaging means (60) of the sensor cluster arrangement (55) by means of a fixed portion (56) of the sensor cluster arrangement and to use the variable portion of the sensor cluster arrangement as a site marking in the expanded imaging arrangement.

摘要翻译： 本发明涉及一种用于定位跟踪体（10）的装置，包括放置在生理结构内的至少一个跟踪体，以及位于结构外部并由传感器组件（20）组成的装置 集群布置（55）以及用于定位和影响跟踪体的方法。 跟踪体以身体的形式提供，其特征在于具有可变磁偶极矩的有限剩余磁化和由此产生的各向异性磁偶极场。 传感器簇（20）以具有特定测量几何形状的多个梯度传感器（30）的形式提供。 任选地，可以通过在至少一个跟踪体的环境中的外部作用磁场（H）和/或生理过程以特定方式改变跟踪体的物理/化学性质和/或轨迹。 此外，可以通过固定部分（56）检测变量的位置，特别是与传感器簇装置（55）的扩展成像装置（60）相关联的可移位部分（57） ）并且将传感器簇布置的可变部分用作扩展成像布置中的站点标记。