利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

37 条记录 (耗时 0.032 秒)

    KEYED WAFER CARRIER
    2.
    发明申请
    KEYED WAFER CARRIER 有权
    键盘拖车

    公开(公告)号：US20130252404A1

    公开(公告)日：2013-09-26

    申请号：US13424821

    申请日：2012-03-20

    申请人： Sandeep Krishnan ,  Keng Moy ,  Alexander I. Gurary ,  Matthew King ,  Vadim Boguslavskiy ,  Steven Krommenhoek

    发明人： Sandeep Krishnan ,  Keng Moy ,  Alexander I. Gurary ,  Matthew King ,  Vadim Boguslavskiy ,  Steven Krommenhoek

    IPC分类号： C23C16/458 ,  H01L21/203

    CPC分类号： C23C16/4584 ,  C23C16/4586 ,  C23C16/46 ,  H01L21/6719 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/68792

    摘要： A structure for a chemical vapor deposition reactor desirably includes a reaction chamber having an interior, a spindle mounted in the reaction chamber, and a wafer carrier releasably mounted onto the spindle for rotation therewith. The spindle desirably has a shaft extending along a vertical rotational axis and a key projecting outwardly from the shaft. The wafer carrier preferably has a body defining oppositely-facing top and bottom surfaces and at least one wafer-holding feature configured so that a wafer can be held therein with a surface of the wafer exposed at the top surface of the body. The wafer carrier desirably further has a recess extending into the body from the bottom surface of the body and a keyway projecting outwardly from a periphery of the recess along a first transverse axis. The shaft preferably is engaged in the recess and the key preferably is engaged into the keyway.

    摘要翻译： 化学气相沉积反应器的结构理想地包括具有内部的反应室，安装在反应室中的主轴和可拆卸地安装到主轴上以与其一起旋转的晶片载体。 主轴理想地具有沿着垂直旋转轴线延伸的轴和从轴向外突出的键。 晶片载体优选地具有限定相对面对的顶表面和底表面的主体，并且至少一个晶片保持特征构造成使得晶片可以被保持在其中，晶片的表面暴露在主体的顶表面处。 晶片载体理想地还具有从主体的底表面延伸到主体中的凹槽和沿着第一横向轴线从凹部的周边向外突出的键槽。 轴优选地接合在凹部中，并且键优选地接合到键槽中。

    WAFER CARRIER WITH HUB
    8.
    发明申请
    WAFER CARRIER WITH HUB 失效
    带框架的拖车

    公开(公告)号：US20110287635A1

    公开(公告)日：2011-11-24

    申请号：US13188605

    申请日：2011-07-22

    申请人： Vadim Boguslavskiy ,  Alexander I. Gurary

    发明人： Vadim Boguslavskiy ,  Alexander I. Gurary

    IPC分类号： H01L21/302

    CPC分类号： C23C16/4581 ,  C23C16/4584 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/68792

    摘要： A wafer carrier for a rotating disc CVD reactor includes a unitary plate of a ceramic such as silicon carbide defining wafer-holding features such as pockets on its upstream surface and also includes a hub removably mounted to the plate in a central region of the plate. The hub provides a secure connection to the spindle of the reactor without imposing concentrated stresses on the ceramic plate. The hub can be removed during cleaning of the plate.

    摘要翻译： 用于旋转圆盘CVD反应器的晶片载体包括诸如碳化硅的陶瓷的整体板，其限定晶片保持特征，例如其上游表面上的凹穴，并且还包括可拆卸地安装到板的中心区域中的毂。 轮毂提供与反应器主轴的牢固连接，而不会在陶瓷板上产生集中应力。 在清洁板时可以拆下轮毂。

    Wafer carrier with hub
    9.
    发明申请
    Wafer carrier with hub 失效
    带轮毂的晶圆架

    公开(公告)号：US20090155028A1

    公开(公告)日：2009-06-18

    申请号：US12001761

    申请日：2007-12-12

    申请人： Vadim Boguslavskiy ,  Alexander I. Gurary

    发明人： Vadim Boguslavskiy ,  Alexander I. Gurary

    IPC分类号： B65H1/00

    CPC分类号： C23C16/4581 ,  C23C16/4584 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/68792

    摘要： A wafer carrier for a rotating disc CVD reactor includes a unitary plate of a ceramic such as silicon carbide defining wafer-holding features such as pockets on its upstream surface and also includes a hub removably mounted to the plate in a central region of the plate. The hub provides a secure connection to the spindle of the reactor without imposing concentrated stresses on the ceramic plate. The hub can be removed during cleaning of the plate.

    摘要翻译： 用于旋转圆盘CVD反应器的晶片载体包括诸如碳化硅的陶瓷的整体板，其限定晶片保持特征，例如其上游表面上的凹穴，并且还包括可拆卸地安装到板的中心区域中的毂。 轮毂提供与反应器主轴的牢固连接，而不会在陶瓷板上产生集中应力。 在清洁板时可以拆下轮毂。

    Temperature determination using pyrometry
    10.
    发明授权
    Temperature determination using pyrometry 有权
    使用高温计测定温度

    公开(公告)号：US06398406B1

    公开(公告)日：2002-06-04

    申请号：US09587375

    申请日：2000-06-01

    申请人： William G. Breiland ,  Alexander I. Gurary ,  Vadim Boguslavskiy

    发明人： William G. Breiland ,  Alexander I. Gurary ,  Vadim Boguslavskiy

    IPC分类号： G01J500

    CPC分类号： G01J5/524

    摘要： A method for determining the temperature of a surface upon which a coating is grown using optical pyrometry by correcting Kirchhoff's law for errors in the emissivity or reflectance measurements associated with the growth of the coating and subsequent changes in the surface thermal emission and heat transfer characteristics. By a calibration process that can be carried out in situ in the chamber where the coating process occurs, an error calibration parameter can be determined that allows more precise determination of the temperature of the surface using optical pyrometry systems. The calibration process needs only to be carried out when the physical characteristics of the coating chamber change.

    摘要翻译： 使用光学高温测量法确定涂层生长的表面的温度的方法，通过校正与涂层生长相关联的发射率或反射率测量的误差的基尔霍夫定律以及随后的表面热发射和传热特性的变化。 通过可以在发生涂覆过程的室中原位进行的校准过程，可以确定误差校准参数，其允许使用光学高温测量系统更精确地确定表面的温度。 只有当涂层室的物理特性发生变化时，才需要进行校准过程。