摘要:
A resistor is connected in series with a semiconductor laser device, while, on both sides of this resistor, a first capacitor and a second capacitor are connected in parallel with the semiconductor laser device so as to be arranged in π-type configuration, thereby achieving a high electrostatic breakdown voltage.
摘要:
There is provided a plasma CVD device which can deposit a high-quality a-Si:H or other film at a high rate, and which can improve production efficiency thereof remarkably. The CVD device has a substrate holding electrode and a high frequency application electrode arranged opposite to and parallel to a substrate held by the substrate holding electrode. A material gas introduced between the substrate holding electrode and the high frequency application electrode is decomposed by glow discharge, so that a thin film is deposited on the heated substrate. A first electrode heater for heating a peripheral portion of the high frequency application electrode is installed along the peripheral portion of the high frequency application electrode. A second electrode heater for heating the peripheral portion of the high frequency application electrode and a surface of the high frequency application electrode opposite to its surface facing the substrate is composed of a bottom portion and a side portion provided uprightly along a peripheral edge of the bottom portion and formed in a concave shape to surround the high frequency application electrode with a spacing therebetween.
摘要:
There is provided a semiconductor laser device capable of maintaining a good luminous characteristic under severe environment. A cap 4 in an approximate portal shape having lateral apertures 41 is attached to a stem 1 on which a laser diode 2 and a light receiving element 3 are mounted. A holographic element 5 is mounted on a window 43 of the cap 4. Air inside the cap 4 is exchanged with outside air through the lateral apertures 41 to effectively cool the laser diode 2, thus enabling the semiconductor laser device to maintain a good luminous characteristic under high-temperature severe environment.
摘要:
A semiconductor laser apparatus is provided which comprises a semiconductor laser device for emitting laser light and a base having a major surface and a circumferential side surface. The circumferential side surface has an upper surface and a lower surface. The semiconductor laser device is mounted on the major surface of the base. At least one of the upper and lower surfaces of the circumferential side surface is tilted from a direction perpendicular to the major surface so that a height in a vertical direction of the semiconductor laser apparatus is reduced or minimized.
摘要:
A semiconductor laser apparatus is provided which comprises a semiconductor laser device for emitting laser light and a base having a major surface and a circumferential side surface. The circumferential side surface has an upper surface and a lower surface. The semiconductor laser device is mounted on the major surface of the base. At least one of the upper and lower surfaces of the circumferential side surface is tilted from a direction perpendicular to the major surface so that a height in a vertical direction of the semiconductor laser apparatus is reduced or minimized.