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    Method and apparatus for article inspection including speckle reduction
    1.
    发明授权
    Method and apparatus for article inspection including speckle reduction 有权
    用于物品检查的方法和装置，包括减少斑点

    公开(公告)号：US06798505B2

    公开(公告)日：2004-09-28

    申请号：US10436920

    申请日：2003-05-12

    申请人： Avner Karpol ,  Silviu Reinhorn ,  Emanuel Elyasaf ,  Shimon Yalov ,  Boaz Kenan

    发明人： Avner Karpol ,  Silviu Reinhorn ,  Emanuel Elyasaf ,  Shimon Yalov ,  Boaz Kenan

    IPC分类号： G01N2100

    CPC分类号： G03F7/70616 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/479 ,  G02B27/48 ,  G03F1/84

    摘要： A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.

    摘要翻译： 一种用于在用于制造半导体器件（包括晶片，掩模，光掩模和掩模版）的制品的检查期间减少斑点的方法和装置。 通过在光路中设置元件来减少由相干光源（例如脉冲激光）输出的光束的相干性。 这些元件的实例包括光纤束; 光学导光板; 光栅; 积分球; 和声光调制器。 这些各种元件可以根据需要组合，使得由元件组合输出的光束具有的光路长度差大于由相干光源输出的光束的相干长度。

    Method and apparatus for article inspection including speckle reduction
    2.
    发明授权
    Method and apparatus for article inspection including speckle reduction 有权
    用于物品检查的方法和装置，包括减少斑点

    公开(公告)号：US07463352B2

    公开(公告)日：2008-12-09

    申请号：US11040528

    申请日：2005-01-21

    申请人： Avner Karpol ,  Silviu Reinhorn ,  Emanuel Elysaf ,  Shimon Yalov ,  Boaz Kenan

    发明人： Avner Karpol ,  Silviu Reinhorn ,  Emanuel Elysaf ,  Shimon Yalov ,  Boaz Kenan

    IPC分类号： G01N21/88

    CPC分类号： G03F7/70616 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/479 ,  G02B27/48 ,  G03F1/84

    摘要： A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.

    摘要翻译： 一种用于在用于制造半导体器件（包括晶片，掩模，光掩模和掩模版）的制品的检查期间减少斑点的方法和装置。 通过在光路中设置元件来减少由相干光源（例如脉冲激光）输出的光束的相干性。 这些元件的实例包括光纤束; 光学导光板; 光栅; 积分球; 和声光调制器。 这些各种元件可以根据需要组合，使得由元件组合输出的光束具有的光路长度差大于由相干光源输出的光束的相干长度。

    Method and apparatus for article inspection including speckle reduction
    6.
    发明授权
    Method and apparatus for article inspection including speckle reduction 失效
    用于物品检查的方法和装置，包括减少斑点

    公开(公告)号：US06429931B1

    公开(公告)日：2002-08-06

    申请号：US10043798

    申请日：2002-01-11

    申请人： Avner Karpol ,  Silviu Reinhorn ,  Emanuel Elysaf ,  Shimon Yalov ,  Boaz Kenan

    发明人： Avner Karpol ,  Silviu Reinhorn ,  Emanuel Elysaf ,  Shimon Yalov ,  Boaz Kenan

    IPC分类号： G01N2100

    CPC分类号： G03F7/70616 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/479 ,  G02B27/48 ,  G03F1/84

    摘要： A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.

    摘要翻译： 一种用于在用于制造半导体器件（包括晶片，掩模，光掩模和掩模版）的制品的检查期间减少斑点的方法和装置。 通过在光路中设置元件来减少由相干光源（例如脉冲激光）输出的光束的相干性。 这些元件的实例包括光纤束; 光学导光板; 光栅; 积分球; 和声光调制器。 这些各种元件可以根据需要组合，使得由元件组合输出的光束具有的光路长度差大于由相干光源输出的光束的相干长度。

    Method for reticle inspection using aerial imaging
    9.
    发明授权
    Method for reticle inspection using aerial imaging 有权
    使用空中成像进行掩模版检查的方法

    公开(公告)号：US06268093B1

    公开(公告)日：2001-07-31

    申请号：US09417518

    申请日：1999-10-13

    申请人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

    发明人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

    IPC分类号： G03F900

    CPC分类号： G03F7/701 ,  G03F1/84 ,  G03F7/70125 ,  G03F7/70616 ,  G03F7/70633

    摘要： A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.

    摘要翻译： 可以使用用于检查掩模版的掩模版检查系统作为进入的检查工具，以及作为周期性和预曝光检查工具。 面具店可以将其用作与客户兼容的检测工具，也可以作为可打印的错误检测工具。 本发明系统检测出两种缺陷：（1）打印图像中的线宽错误; （2）表面缺陷。 在模具区域上检测线宽错误。 通过在与曝光条件（即波长，数值孔径，西格玛和照明孔径类型）相同的光学条件下获取掩模版的图像，并且通过比较多个管芯以发现线宽中的误差来执行检测。 在掩模版上遍历表面缺陷。 通过获取掩模版的透射和暗场反射图像并使用组合信息来检测颗粒和其它表面缺陷来执行表面缺陷的检测。

    Method and apparatus for reticle inspection using aerial imaging
    10.
    发明授权
    Method and apparatus for reticle inspection using aerial imaging 有权
    使用航空成像进行掩模版检查的方法和装置

    公开(公告)号：US07133548B2

    公开(公告)日：2006-11-07

    申请号：US09851779

    申请日：2001-05-08

    申请人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

    发明人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

    IPC分类号： G06K9/00

    CPC分类号： G03F7/701 ,  G03F1/84 ,  G03F7/70125 ,  G03F7/70616 ,  G03F7/70633

    摘要： A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.

    摘要翻译： 可以使用用于检查掩模版的掩模版检查系统作为进入的检查工具，以及作为周期性和预曝光检查工具。 面具店可以将其用作与客户兼容的检测工具，并可作为可打印的错误检测工具。 本发明系统检测出两种缺陷：（1）打印图像中的线宽错误; （2）表面缺陷。 在模具区域上检测线宽错误。 通过在与曝光条件（即波长，数值孔径，西格玛和照明孔径类型）相同的光学条件下获取掩模版的图像，并且通过比较多个管芯以发现线宽中的误差来执行检测。 在掩模版上遍历表面缺陷。 通过获取掩模版的透射和暗场反射图像并使用组合信息来检测颗粒和其它表面缺陷来执行表面缺陷的检测。