Method and apparatus for article inspection including speckle reduction
    1.
    发明授权
    Method and apparatus for article inspection including speckle reduction 有权
    用于物品检查的方法和装置,包括减少斑点

    公开(公告)号:US07463352B2

    公开(公告)日:2008-12-09

    申请号:US11040528

    申请日:2005-01-21

    IPC分类号: G01N21/88

    摘要: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.

    摘要翻译: 一种用于在用于制造半导体器件(包括晶片,掩模,光掩模和掩模版)的制品的检查期间减少斑点的方法和装置。 通过在光路中设置元件来减少由相干光源(例如脉冲激光)输出的光束的相干性。 这些元件的实例包括光纤束; 光学导光板; 光栅; 积分球; 和声光调制器。 这些各种元件可以根据需要组合,使得由元件组合输出的光束具有的光路长度差大于由相干光源输出的光束的相干长度。

    Method and apparatus for article inspection including speckle reduction
    7.
    发明授权
    Method and apparatus for article inspection including speckle reduction 失效
    用于物品检查的方法和装置,包括减少斑点

    公开(公告)号:US06429931B1

    公开(公告)日:2002-08-06

    申请号:US10043798

    申请日:2002-01-11

    IPC分类号: G01N2100

    摘要: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.

    摘要翻译: 一种用于在用于制造半导体器件(包括晶片,掩模,光掩模和掩模版)的制品的检查期间减少斑点的方法和装置。 通过在光路中设置元件来减少由相干光源(例如脉冲激光)输出的光束的相干性。 这些元件的实例包括光纤束; 光学导光板; 光栅; 积分球; 和声光调制器。 这些各种元件可以根据需要组合,使得由元件组合输出的光束具有的光路长度差大于由相干光源输出的光束的相干长度。

    Method and apparatus for article inspection including speckle reduction
    8.
    发明授权
    Method and apparatus for article inspection including speckle reduction 有权
    用于物品检查的方法和装置,包括减少斑点

    公开(公告)号:US06798505B2

    公开(公告)日:2004-09-28

    申请号:US10436920

    申请日:2003-05-12

    IPC分类号: G01N2100

    摘要: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.

    摘要翻译: 一种用于在用于制造半导体器件(包括晶片,掩模,光掩模和掩模版)的制品的检查期间减少斑点的方法和装置。 通过在光路中设置元件来减少由相干光源(例如脉冲激光)输出的光束的相干性。 这些元件的实例包括光纤束; 光学导光板; 光栅; 积分球; 和声光调制器。 这些各种元件可以根据需要组合,使得由元件组合输出的光束具有的光路长度差大于由相干光源输出的光束的相干长度。

    Lens array projector
    9.
    发明授权
    Lens array projector 有权
    镜头阵列投影机

    公开(公告)号:US08908277B2

    公开(公告)日:2014-12-09

    申请号:US13567099

    申请日:2012-08-06

    摘要: Optical apparatus includes a matrix of light sources arranged on a substrate with a predetermined, uniform spacing between the light sources. A beam homogenizer includes a first optical surface, including a first microlens array, which has a first pitch equal to the spacing between the light sources and which is aligned with the matrix so that a respective optical axis of each microlens in the array intercepts a corresponding light source in the matrix and transmits light emitted by the corresponding light source. A second optical surface, including a second microlens array, is positioned to receive and focus the light transmitted by the first microlens array and has a second pitch that is different from the first pitch.

    摘要翻译: 光学装置包括在光源之间以预定的均匀间隔布置在基板上的光源矩阵。 光束均化器包括第一光学表面,第一光学表面包括第一微透镜阵列,其具有等于光源之间的间隔的第一间距并且与阵列对准,使得阵列中的每个微透镜的相应光轴截取对应的 矩阵中的光源并透射由相应光源发射的光。 包括第二微透镜阵列的第二光学表面被定位成接收和聚焦由第一微透镜阵列传输的光,并具有不同于第一间距的第二间距。

    Objective optics with interference filter
    10.
    发明授权
    Objective optics with interference filter 有权
    具有干涉滤光片的物镜

    公开(公告)号:US08717488B2

    公开(公告)日:2014-05-06

    申请号:US13351242

    申请日:2012-01-17

    IPC分类号: H04N5/225 G02B5/28

    摘要: Optical apparatus includes an image sensor and an optical assembly, which is configured to focus optical radiation via an aperture stop onto the image sensor. The optical assembly includes a plurality of optical surfaces, consisting of a first, curved surface through which the optical radiation enters the assembly, a final surface through which the rays exit the assembly toward the image sensor, and at least two intermediate surfaces between the first and final surfaces. An interference filter, which has a center wavelength and a passband no greater than 4% of the center wavelength, and includes a coating formed on one of the optical surfaces. All rays of the optical radiation passing through the aperture stop are incident on the coating over a range of incidence angles with a half-width that is no greater than three fourths of the numerical aperture of the optical assembly.

    摘要翻译: 光学设备包括图像传感器和光学组件,其被配置为将光学辐射经由孔径光阑聚焦到图像传感器上。 所述光学组件包括多个光学表面,所述多个光学表面包括第一弯曲表面,所述光学辐射穿过所述弯曲表面进入所述组件,所述光线通过所述弯曲表面射出所述组件朝向所述图像传感器;以及至少两个中间表面, 和最终表面。 一种干涉滤光器,其具有中心波长和不大于中心波长的4%的通带,并且包括形成在其中一个光学表面上的涂层。 通过孔径光阑的光学辐射的所有光线在不大于光学组件的数值孔径的四分之三的半宽度的入射角范围内入射到涂层上。