公开(公告)号：US20100247801A1

公开(公告)日：2010-09-30

申请号：US12726888

申请日：2010-03-18

Applicant: Aziz ZENASNI

Inventor： Aziz ZENASNI

IPC: B05D3/06

CPC classification number: B82Y30/00 ,  B82Y40/00 ,  C01B32/184 ,  C01B32/186 ,  C23C16/26 ,  C23C16/56 ,  H01L21/02381 ,  H01L21/02447 ,  H01L21/02527 ,  H01L21/02592 ,  H01L21/0262 ,  H01L21/02661 ,  H01L21/02686

Abstract: The present invention relates to a method of production of graphene comprising the following stages respectively: a stage of deposition of a thin layer comprising amorphous carbon on a substrate; a stage of annealing of said thin layer under photonic and/or electronic irradiation, by which a layer comprising graphene is obtained.

Abstract translation: 本发明涉及石墨烯的制造方法，其分别包括以下阶段：在基材上沉积包含无定形碳的薄层的阶段; 在光子和/或电子照射下所述薄层的退火阶段，由此获得包括石墨烯的层。

公开(公告)号：US20090280638A1

公开(公告)日：2009-11-12

申请号：US12434018

申请日：2009-05-01

Applicant: Aziz ZENASNI

Inventor： Aziz ZENASNI

IPC: H01L21/768

CPC classification number: B81C1/00047 ,  B81C2201/0108 ,  B81C2201/0128 ,  H01L21/7682

Abstract: The invention relates to a process for producing at least one air gap in a microstructure, which comprises: 1) the supply of a microstructure comprising at least one gap filled with a sacrificial material that decomposes starting from a temperature θ1, this gap being delimited over at least one part of its surface by a non-porous membrane, composed of a material that forms a matrix and of a pore-forming agent that decomposes at a temperature θ2

Abstract translation: 本发明涉及一种用于在微结构中产生至少一个气隙的方法，其包括：1）提供微结构，其包括填充有从温度θ1开始分解的牺牲材料的至少一个间隙，该间隙被界定在 其表面的至少一部分由无孔膜组成，其由形成基质的材料和成孔剂组成，其在温度θ2θ下分解至少20℃并分散在该孔中 矩阵; 2）在温度> =θ2但<θ1处理微结构以选择性分解成孔剂; 然后3）在温度> =θ1处理微结构以便分解牺牲材料。 应用：在微电子和微电子工业中制造用于集成电路和任何其他微结构的气隙互连结构。

公开(公告)号：US20090280644A1

公开(公告)日：2009-11-12

申请号：US12434007

申请日：2009-05-01

Applicant: Aziz ZENASNI

Inventor： Aziz ZENASNI

IPC: H01L21/768

CPC classification number: B81C1/00047 ,  B81C2201/0108 ,  B81C2201/0128 ,  H01L21/7682

Abstract: The invention relates to a process for producing at least one air gap in a microstructure, which comprises:1) the supply of a microstructure comprising at least one gap filled with a sacrificial material that decomposes starting from a temperature θ1, this gap being delimited over at least one part of its surface by a non-porous membrane, composed of a material that forms a matrix and of a pore-forming agent that decomposes at a temperature θ2

公开(公告)号：US20120135161A1

公开(公告)日：2012-05-31

申请号：US13367439

申请日：2012-02-07

Applicant: Aziz ZENASNI

Inventor： Aziz ZENASNI

IPC: C23C16/56 ,  C23C16/44 ,  C23C16/50

CPC classification number: H01L21/31695 ,  B05D1/60 ,  B05D3/065 ,  B05D3/14 ,  C23C16/401 ,  C23C16/482 ,  C23C16/50 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02274 ,  H01L21/02277 ,  H01L21/3122

Abstract: Provided a method for producing an oriented-porosity dielectric material on a substrate. The method includes depositing a vapor phase on a substrate of a composite layer comprising a material forming a matrix and a compound comprising chemical groups capable of being oriented under the effect of an electromagnetic field and/or photonic radiation; treating the composite layer to obtain the cross-linking of the material forming a matrix; and subjecting the substrate coated with the composite layer to an electromagnetic field and/or a photonic radiation.

Abstract translation: 提供了一种在衬底上制备取向孔隙介电材料的方法。 该方法包括在包含形成基质的材料和包含能够在电磁场和/或光子辐射的作用下定向的化学基团的化合物的复合层的基底上沉积气相; 处理复合层以获得形成基质的材料的交联; 以及对涂覆有复合层的基板进行电磁场和/或光子辐射。