公开(公告)号：US11180719B2

公开(公告)日：2021-11-23

申请号：US16756303

申请日：2018-10-29

Applicant: BASF SE

Inventor： Daniel Loeffler ,  Mei Chin Shen ,  Sheng Hsuan Wei ,  Frank Pirrung ,  Lothar Engelbrecht ,  Yeni Burk ,  Andreas Klipp ,  Marcel Brill ,  Szilard Csihony

IPC: C11D3/37 ,  C11D7/50 ,  G03F7/40 ,  H01L21/02

Abstract: The invention relates to the use of a non-aqueous composition comprising an organic solvent and at least one particular siloxane-type additive for treating substrates comprising patterns having line-space dimensions of 50 nm or below and aspect ratios of 4 or more as well as a method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices, the said method comprising the steps of (1) providing a substrate having patterned material layers having line-space dimensions of 50 nm, aspect ratios of greater or equal 4, or a combination thereof, (2) contacting the substrate at least once with a non-aqueous composition, and (3) removing the non-aqueous composition from the contact with the substrate, wherein the non-aqueous composition comprising an organic solvent and at least one of such siloxane-type additives.

公开(公告)号：US11970647B2

公开(公告)日：2024-04-30

申请号：US17624872

申请日：2020-06-19

Applicant: BASF SE

Inventor： Francisco Javier Lopez Villanueva ,  Yeni Burk ,  Daniel Loeffler ,  Jan Ole Mueller ,  Marcel Brill ,  Patrick Wilke ,  Jean-Pierre Berkan Lindner ,  Volodymyr Boyko

IPC: C09K13/08 ,  C09K13/00 ,  H01L21/306 ,  H01L21/311 ,  H01L21/3213

CPC classification number: C09K13/08 ,  C09K13/00 ,  H01L21/30604 ,  H01L21/31111 ,  H01L21/32134

Abstract: Described herein is a composition for selectively etching a layer including a silicon germanium alloy (SiGe) in the presence of a silicon-containing layer, particularly a layer comprising a-Si, SiOx, SiON, SiN, or a combination thereof, the composition including:



(a) an oxidizing agent,
(b) an acid selected from an inorganic acid and an organic acid,
(c) an etchant including a source of fluoride ions,
(d) a polyvinylpyrrolidone (PVP), and
(e) water.

公开(公告)号：US20220290050A1

公开(公告)日：2022-09-15

申请号：US17624872

申请日：2020-06-19

Applicant: BASF SE

Inventor： Francisco Javier Lopez Villanueva ,  Yeni Burk ,  Daniel Loeffler ,  Jan Ole Mueller ,  Marcel Brill ,  Patrick Wilke ,  Jean-Pierre Berkan Lindner ,  Volodymyr Boyko

IPC: C09K13/08 ,  C09K13/00 ,  H01L21/306

Abstract: The invention relates to a composition for selectively etching a layer comprising a silicon germanium alloy (SiGe) in the presence of a silicon-containing layer, particularly a layer comprising a-Si, SiOx, SiON, SiN, or a combination thereof, the composition comprising: (a) an oxidizing agent, (b) an acid selected from an inorganic acid and an organic acid, 10 (c) an etchant comprising a source of fluoride ions, (d) a polyvinylpyrrolidone (PVP), and (e) water.

公开(公告)号：US12146125B2

公开(公告)日：2024-11-19

申请号：US17057801

申请日：2019-05-13

Applicant: BASF SE

Inventor： Marcel Brill ,  Daniel Loeffler ,  Yeni Burk ,  Frank Pirrung ,  Lothar Engelbrecht ,  Szilard Csihony ,  Maike Bergeler ,  Volodymyr Boyko ,  Patrick Wilke

IPC: C11D7/26 ,  C11D3/20 ,  C11D7/50 ,  G03F7/20 ,  G03F7/40 ,  G03F7/42

Abstract: The invention relates to the use of a composition comprising a C1 to C6 alkanol and a carboxylic acid ester of formula (I) wherein R1 is selected from a C1 to C6 alkyl, which may be unsubstituted or substituted by OH or F, and —X21—[O—X22]n—H; R2 is selected from a C1 to C6 alkyl, which may be unsubstituted or substituted by OH or F, and —X21—[O—X22]n—H; X21, X22 are independently selected from C1 to C6 alkandiyl, which may be unsubstituted or substituted by OH or F; n is an integer from 1 to 5. wherein, the C1 to C6 alkanol and the carboxylic acid ester are selected so as to form an azeotropic mixture and are present in an amount from 20% by weight below to 20% by weight above such azeotropic mixture.

公开(公告)号：US20220187712A1

公开(公告)日：2022-06-16

申请号：US17603250

申请日：2020-04-03

Applicant: BASF SE

Inventor： Szilard Csihony ,  Daniel Loeffler ,  Marcel Brill ,  Frank Pirrung ,  Lothar Engelbrecht ,  Maike Bergeler ,  Paatrick Wilke ,  Yeni Burk ,  Volodymyr Boyko

IPC: G03F7/40 ,  C11D11/00 ,  C11D7/50 ,  C11D7/26 ,  H01L21/02

Abstract: Described herein is a non-aqueous composition including (a) an organic solvent, and (b) at least one additive of formulae I, where R1, R2, R3, and R4 are independently selected from C1 to C10 alkyl, C1 to C11 alkylcarbonyl, C6 to C12 aryl, C7 to C14 alkylaryl, and C7 to C14 arylalkyl; and n is 0 or 1.

公开(公告)号：US20220169956A1

公开(公告)日：2022-06-02

申请号：US17601740

申请日：2020-03-27

Applicant: BASF SE

Inventor： Chi Yueh Kao ,  Mei Chin Shen ,  Sheng Hsuan Wei ,  Daniel Loeffler ,  Andreas Klipp ,  Marcel Brill ,  Szilard Csihony ,  Frank Pirrung ,  Niklas Benjamin Heine

IPC: C11D7/26 ,  G03F7/40 ,  C11D11/00 ,  C11D7/50 ,  C11D7/24 ,  C11D7/02

Abstract: Described herein is a non-aqueous composition including (a) an organic protic solvent, (b) ammonia, and (c) at least one additive of formulae I or II where R1 is H R2 is selected from H, C1 to C10 alkyl, C1 to C10 alkoxy, C6 to C10 aryl, and C6 to C10 aroxy, R3 is selected from R2, R4 is selected from C1 to C10 alkyl, C1 to C10 alkoxy, C6 to C10 aryl, and C6 to C10 aroxy, R10, R12 are independently selected from C1 to C10 alkyl and C1 to C10 alkoxy, m is 1, 2 or 3, and n is 0 or an integer from 1 to 100.