Method for Improving Uniformity of High-Frequency Plasma Discharge by Means of Frequency Modulation
    1.
    发明申请
    Method for Improving Uniformity of High-Frequency Plasma Discharge by Means of Frequency Modulation 失效
    通过调频提高高频等离子体放电均匀性的方法

    公开(公告)号:US20130285551A1

    公开(公告)日:2013-10-31

    申请号:US13526484

    申请日:2012-06-18

    IPC分类号: H05H1/46

    摘要: A method for improving the uniformity of high-frequency discharge plasma by means of frequency modulation is disclosed. In a plasma discharge chamber, there is a pair of parallel electrodes. A high-frequency power supply is adopted to feed the electrodes. The frequency range of the electromagnetic field is 13.56 MHz˜160 MHz. Discharge gas is input to form plasma. The frequency of the fed-in high-frequency electromagnetic field is under automatic tuning control, and keeps changing cyclically without stop in the course of plasma discharge. The range of the frequency change may fall into either a portion of or the entire range of 13.56 MHz˜160 MHz and makes the locations with higher plasma density on the plane in parallel with the electrodes and in the plasma discharge space changed cyclically. In a time slot longer than one frequency change cycle, the average plasma density between the parallel electrodes is uniform.

    摘要翻译: 公开了一种通过频率调制来改善高频放电等离子体的均匀性的方法。 在等离子体放电室中存在一对平行电极。 采用高频电源供电电极。 电磁场的频率范围为13.56MHz〜160MHz。 输入放电气体以形成等离子体。 馈电高频电磁场的频率处于自动调谐控制状态,并且在等离子体放电过程中不停止地循环变化。 频率变化的范围可以落入13.56MHz〜160MHz的一部分或全部范围,并且使得与电极平行的平面上的等离子体密度较高的位置和等离子体放电空间中的位置周期性地变化。 在长于一个频率变化周期的时隙中,平行电极之间的平均等离子体密度是均匀的。

    Method for improving uniformity of high-frequency plasma discharge by means of frequency modulation
    2.
    发明授权
    Method for improving uniformity of high-frequency plasma discharge by means of frequency modulation 失效
    通过调频改善高频等离子体放电均匀性的方法

    公开(公告)号:US08704445B2

    公开(公告)日:2014-04-22

    申请号:US13526484

    申请日:2012-06-18

    IPC分类号: H01J7/24

    摘要: A method for improving the uniformity of high-frequency discharge plasma by means of frequency modulation is disclosed. In a plasma discharge chamber, there is a pair of parallel electrodes. A high-frequency power supply is adopted to feed the electrodes. The frequency range of the electromagnetic field is 13.56 MHz˜160 MHz. Discharge gas is input to form plasma. The frequency of the fed-in high-frequency electromagnetic field is under automatic tuning control, and keeps changing cyclically without stop in the course of plasma discharge. The range of the frequency change may fall into either a portion of or the entire range of 13.56 MHz˜160 MHz and makes the locations with higher plasma density on the plane in parallel with the electrodes and in the plasma discharge space changed cyclically. In a time slot longer than one frequency change cycle, the average plasma density between the parallel electrodes is uniform.

    摘要翻译: 公开了一种通过频率调制来改善高频放电等离子体的均匀性的方法。 在等离子体放电室中存在一对平行电极。 采用高频电源供电电极。 电磁场的频率范围为13.56MHz〜160MHz。 输入放电气体以形成等离子体。 馈电高频电磁场的频率处于自动调谐控制状态,并且在等离子体放电过程中不停止地循环变化。 频率变化的范围可以落入13.56MHz〜160MHz的一部分或全部范围,并且使得与电极平行的平面上的等离子体密度较高的位置和等离子体放电空间周期性地变化。 在长于一个频率变化周期的时隙中,平行电极之间的平均等离子体密度是均匀的。

    DYNAMIC GAS BLENDING
    5.
    发明申请
    DYNAMIC GAS BLENDING 审中-公开
    动态气体混合

    公开(公告)号:US20120227816A1

    公开(公告)日:2012-09-13

    申请号:US13045174

    申请日:2011-03-10

    IPC分类号: F15D1/00

    摘要: This invention is directed to various protocols for reprocessing off-spec gas to produce a concentration of off-spec gases to a desired target concentration. A combination of source gases is blended with the off-spec gas. This technique has the effect of enabling relatively small adjustments to the concentration of off-spec gas. Processes are also described that incorporate the blending protocols.

    摘要翻译: 本发明涉及用于重新处理不典型气体以产生浓度异常气体达到所需目标浓度的各种方案。 源气体的组合与异常气体混合。 这种技术具有能够对非典型气体的浓度进行相当小的调整的效果。 还描述了并入混合方案的方法。

    METHOD AND SYSTEM FOR OPTIMIZING THE FILLING, STORAGE AND DISPENSING OF CARBON DIOXIDE FROM MULTIPLE CONTAINERS WITHOUT OVER PRESSURIZATION

    公开(公告)号:US20200003366A1

    公开(公告)日:2020-01-02

    申请号:US16564206

    申请日:2019-09-09

    摘要: This invention relates to a novel method and system for dispensing CO2 vapor without over pressurization. The system includes one or more liquid containers and one or more vapor containers. The system is designed to operate in a specific manner whereby a restricted amount of CO2 liquid is permitted into the vapor container through a restrictive pathway that is created and maintained by a shuttle valve during the filling operation so that equalization of container pressures is achieved, thereby allowing shuttle valve to reseat when filling has stopped. During use, a pressure differential device is designed to specifically isolate the vapor container from the liquid container so as to preferentially deplete liquid CO2 from the vapor container and avoid over pressurization of the system until the vapor container. The system is operated so that at least 50% of the CO2 product is dispensed from the vapor container. The system also includes novel control methodology for performing pre-fill integrity checks to ensure safety of subsequent dispensing of CO2 liquid from a source vessel to the onsite CO2 containers.

    Cylinder preparation for high purity acetylene
    8.
    发明授权
    Cylinder preparation for high purity acetylene 有权
    高纯度乙炔气瓶准备

    公开(公告)号:US08322383B2

    公开(公告)日:2012-12-04

    申请号:US12472420

    申请日:2009-05-27

    IPC分类号: B65B31/00 B67C3/00

    CPC分类号: F17C11/002 Y02E60/321

    摘要: This invention relates in part to a method for preparing a pressure vessel for receiving high purity acetylene at elevated pressure. The method involves providing a porous filler-containing pressure vessel, deep cleaning the porous filler-containing pressure vessel, purifying a solvent, and charging the purified solvent into the deep cleaned, porous filler-containing pressure vessel. The pressure vessel is then charged with high purity acetylene for storage, transport and/or delivery of the high purity acetylene. The high purity acetylene may be useful as a source material for depositing carbon and carbon-containing films in semiconductor applications.

    摘要翻译: 本发明部分地涉及用于在高压下接收高纯度乙炔的压力容器的方法。 该方法包括提供含多孔填料的压力容器,深度清洗含多孔填料的压力容器,净化溶剂,并将纯化的溶剂装入深层清洁的含多孔填料的压力容器中。 然后向压力容器中加入高纯度乙炔,用于储存,运输和/或输送高纯度乙炔。 高纯度乙炔可用作在半导体应用中沉积碳和含碳膜的源材料。