Abstract:
Disclosed is an array substrate and a display device. The array substrate includes: a plurality of gate lines and a plurality of data lines formed on a base substrate, and a plurality of pixel units defined by the plurality of gate lines and the plurality of data lines intersecting each other, wherein each pixel unit includes a thin film transistor and a pixel electrode connected with the thin film transistor, the pixel electrode, the data line, as well as an active layer, a source and a drain of the thin film transistor are disposed in a same layer and are formed through a single patterning process.
Abstract:
The embodiments of the invention disclose an array substrate, a manufacturing method thereof and a display device. Due to the fact that the surfaces of a source electrode, a drain electrode and a data line which are arranged on the same layer are provided with an oxide film which is formed after annealing treatment is conducted on the source electrode, the drain electrode and the data line, in the process that the pattern of a pixel electrode is formed on the source electrode, the drain electrode and the data line by the adoption of a composition technology, the oxide film can protect the source electrode and the data line under the oxide film from being corroded by an etching agent when the pattern of the pixel electrode is formed by etching, and the display quality of a display panel will not be affected.
Abstract:
The invention relates to a method for fabricating an array substrate, an array substrate and a display device. The method for fabricating an array substrate may comprise: forming a metal thin film layer for a source electrode, a drain electrode and a data line; forming a non-crystalline semiconductor thin film layer on the metal thin film layer; and performing annealing, so as to at least partly convert the non-crystalline semiconductor thin film layer into a metal semiconductor compound. By at least partly converting the non-crystalline semiconductor thin film layer into a metal semiconductor compound, the resulting metal semiconductor compound may prevent oxidative-corrosion of the metal thin film layer, such as a low-resistance metal (e.g., Cu or Ti) layer, in the subsequent procedures, which is favorable for the fabrication of a metal oxide thin film transistor using Cu or Ti.
Abstract:
An array substrate and a display device, the array substrate comprises a fan-out area, an edge area and a display area for performing display, the fan-out area and the edge area are connected with the display area and located on two non-adjacent sides of the display area respectively; a plurality of wirings are arranged on the array substrate, and the wirings are routed through the display area and extend into the edge area, the input end of each wiring is located in the fan-out area; pads are configured for the wirings respectively are located on the side far away from the input end of each wiring, and the pads are located in the edge area.
Abstract:
The present disclosure provides an array substrate, its manufacturing method and a display device. The method includes forming a source electrode and a drain electrode of a thin film transistor, an active layer and a first transparent electrode in the array substrate by a masking step. The active layer and the first transparent electrode are formed by an identical metal oxide layer, and the source electrode and the drain electrode are arranged above the active layer. The first transparent electrode corresponds to a first semi-transparent region of a mask, a channel region of the thin film transistor corresponds to a second semi-transparent region of the mask, the source electrode and drain electrode of the thin film transistor correspond to a non-transparent region of the mask, and the first semi-transparent region of the mask is of transmittance greater than that of the second semi-transparent region of the mask.
Abstract:
This disclosure provides a circuit substrate, a display panel and a display device for solving the problem of a relatively large electrode pitch of the circuit substrate in the prior art while reducing the production cost. Wherein the circuit substrate comprises a substrate, a plurality of first electrodes arranged on the substrate, and insulating convex structures arranged between the substrate and the first electrodes, the convex structure comprising a top face and a bottom face, wherein the top face contacts with the first electrode, and the bottom face contacts with the substrate.
Abstract:
There are provided a thin film transistor and a manufacturing method thereof, an array substrate and a display device. The thin film transistor is formed on a base substrate, and includes a gate electrode, an active layer, a source electrode and a drain electrode, the gate electrode includes a first section, a second section and a third section, the first section and the third section correspond to locations of the source electrode and the drain electrode, respectively; the base substrate has two recesses formed therein, and the first section and the third section are situated in the two recesses, respectively; the first section and the third section are covered with a filling layer; the filling layer and the second section are covered with a gate insulating layer, the active layer, the source electrode and the drain electrode in sequence.
Abstract:
An array substrate, which is formed with a gate electrode (2), a source electrode (5), a drain electrode (6), a gate insulating layer (3), an active layer (4) and a passivation layer (9) in a thin film transistor region, and with the gate insulating layer (3), a pixel electrode (7), the passivation layer (9) and a common electrode (8) in a pixel electrode pattern region, and a color resin layer (11) is formed between the passivation layer (9) and the common electrode (8). Since the color resin layer (11) for planarization is formed on the passivation layer (9), the horizontal driving manner may be suitably applied in order to reduce light leakage, to improve contrast ratio and aperture ratio of a panel and to lower production costs.
Abstract:
This invention provides an array substrate, a method for fabricating the same, and an OLED display device. Each pixel unit of the array substrate comprises: a TFT drive layer; an OLED further away from the substrate than the TFT drive layer and driven by it, the OLED sequentially comprises a first electrode, a light emitting layer, a second electrode, wherein the first electrode is transparent, and the second electrode is a transflective layer, or the second electrode is transparent and has a transflective layer disposed thereon; a reflection layer disposed between the TFT drive layer and the OLED and forming a microcavity structure with the transflective layer, and a reflective surface of the reflection layer has a concave-convex or corrugated structure disposed thereon for causing diffuse reflection of light; and a color filter film disposed between the reflection layer and the OLED and located in the microcavity structure.
Abstract:
The present invention provides an open head mount display device and a display method thereof, relates to the field of head mount display technology, and can solve technical problems (such as a tedious operation, a poor display effect, an inaccurate position of the display image or the like) of the open head mount display device in the prior art. The open head mount display device of the present invention comprises: a display unit for providing a display image to user's eyes; an image acquisition unit for acquiring an image of an external object; an image analysis unit for analyzing and determining a position of the external object relative to the user's eyes in accordance with the image acquired by the image acquisition unit; and an image adjusting unit for adjusting the display image in accordance with an analysis result of the image analysis unit.