DC magnetron sputtering method and apparatus
    1.
    发明授权
    DC magnetron sputtering method and apparatus 失效
    直流磁控溅射法和设备

    公开(公告)号:US5693197A

    公开(公告)日:1997-12-02

    申请号:US319862

    申请日:1994-10-06

    IPC分类号: C23C14/35 G11B5/851 C23C14/34

    CPC分类号: G11B5/851 C23C14/352

    摘要: A method of producing a magnetic recording medium by sputtering a layer onto a substrate by DC-magnetron sputtering from a target while exposing the target to an RF signal is described. The RF signal is effective to extend the target utilization without significantly decreasing the sputtering rate. Also disclosed is an apparatus for use forming a medium in accordance with the method of the invention.

    摘要翻译: 描述了一种通过从目标的DC-磁控溅射将层溅射到衬底上的磁性记录介质的方法,同时将目标曝光到RF信号。 RF信号有效地延长目标利用率而不显着降低溅射速率。 还公开了根据本发明的方法形成介质的装置。

    Cathode assembly having rotating magnetic-field shunt and method of
making magnetic recording media
    2.
    发明授权
    Cathode assembly having rotating magnetic-field shunt and method of making magnetic recording media 失效
    具有旋转磁场分流的阴极组件和制造磁记录介质的方法

    公开(公告)号:US5685959A

    公开(公告)日:1997-11-11

    申请号:US736980

    申请日:1996-10-25

    IPC分类号: C23C14/34 H01J37/34

    摘要: A cathode assembly having a magnetic-field shunt for use in a magnetron sputtering apparatus is described. The magnetic-field shunt disposed between a sputtering target and a source of magnetic flux, and the shunt is moveable between first and second positions to effect preferential target erosion at first and second target regions, respectively. A method of using the assembly for preparation of a magnetic recording medium is also described.

    摘要翻译: 描述了一种用于磁控溅射装置的具有磁场分流器的阴极组件。 设置在溅射靶和磁通源之间的磁场分流器,并且分流可在第一和第二位置之间移动,以分别在第一和第二目标区域处实现优先目标侵蚀。 还描述了使用该组件来制备磁记录介质的方法。

    Method for forming a thin carbon overcoat in a magnetic recording medium
    3.
    发明授权
    Method for forming a thin carbon overcoat in a magnetic recording medium 失效
    在磁记录介质中形成薄碳外涂层的方法

    公开(公告)号:US5714044A

    公开(公告)日:1998-02-03

    申请号:US511729

    申请日:1995-08-07

    IPC分类号: G11B5/72 G11B5/84 C23C14/34

    CPC分类号: G11B5/8408 G11B5/72

    摘要: A method for forming an overcoat having first and second layers in a magnetic recording medium is described. The first overcoat layer is deposited in a first sputtering chamber where the magnetic means for confining target plasma in the chamber are oriented to retain magnetic-field confinement about the target surface and to produce magnetic field lines between directly confronting portions of the confronting sputtering targets. The second overcoat layer is deposited under a nitrogen-containing atmosphere.

    摘要翻译: 描述了在磁记录介质中形成具有第一和第二层的外涂层的方法。 第一外涂层沉积在第一溅射室中,其中用于限制室中的目标等离子体的磁性装置被取向为保持围绕目标表面的磁场约束并且在相对的溅射靶的直接面对部分之间产生磁场线。 第二外涂层在含氮气氛下沉积。

    Target assembly for use in forming an overcoat in a magnetic recording
medium
    5.
    发明授权
    Target assembly for use in forming an overcoat in a magnetic recording medium 失效
    用于在磁记录介质中形成外涂层的目标组件

    公开(公告)号:US5736020A

    公开(公告)日:1998-04-07

    申请号:US575163

    申请日:1995-12-19

    摘要: A target assembly for use in forming a protective overcoat in a magnetic recording medium is described. The assembly includes a centrally positioned target with inner and outer magnetic means adjacent the target. A sputtering shield is positioned between the target and the medium for controlling the amount and angle of material deposition on the medium. The assembly is effective to deposit an overcoat having a greater thickness in the inner landing zone of the medium than in the outer data zone. A method of using the assembly is also disclosed.

    摘要翻译: 描述了用于在磁记录介质中形成保护性外涂层的目标组件。 该组件包括一个中心定位的目标,内部和外部磁性装置邻近目标。 溅射屏蔽位于靶和介质之间,用于控制介质上材料沉积的量和角度。 组合件有效地在介质的内着陆区域中沉积具有比在外部数据区域中更大厚度的外涂层。 还公开了一种使用组件的方法。

    Load chamber with heater for a disk sputtering system
    7.
    发明授权
    Load chamber with heater for a disk sputtering system 有权
    带加热器的加载室,用于圆盘溅射系统

    公开(公告)号:US08791391B2

    公开(公告)日:2014-07-29

    申请号:US13781478

    申请日:2013-02-28

    申请人: Allen J. Bourez

    发明人: Allen J. Bourez

    IPC分类号: F27D5/00

    摘要: A disk processing system having a plurality of processing chambers, a load chamber comprising a heater, and a disk transport system coupled to the plurality of processing chambers and the load chamber to transport a disk there among.

    摘要翻译: 具有多个处理室的盘处理系统,包括加热器的装载室和耦合到多个处理室的盘传送系统和装载室,以便在其间传送盘。

    LOAD CHAMBER WITH HEATER FOR A DISK SPUTTERING SYSTEM
    8.
    发明申请
    LOAD CHAMBER WITH HEATER FOR A DISK SPUTTERING SYSTEM 有权
    用于盘式喷射系统的加热器的加热室

    公开(公告)号:US20130175252A1

    公开(公告)日:2013-07-11

    申请号:US13781478

    申请日:2013-02-28

    申请人: Allen J. Bourez

    发明人: Allen J. Bourez

    IPC分类号: F27D11/00

    摘要: A disk processing system having a plurality of processing chambers, a load chamber comprising a heater, and a disk transport system coupled to the plurality of processing chambers and the load chamber to transport a disk there among.

    摘要翻译: 具有多个处理室的盘处理系统,包括加热器的装载室和耦合到多个处理室的盘传送系统和装载室,以便在其间传送盘。

    Target assembly having inner and outer targets
    9.
    发明授权
    Target assembly having inner and outer targets 失效
    目标组件具有内部和外部目标

    公开(公告)号:US5512150A

    公开(公告)日:1996-04-30

    申请号:US401449

    申请日:1995-03-09

    摘要: A target assembly for use in fabricating magnetic recording media is described. The target assembly has inner and outer concentric targets for sputter depositing on a substrate first and second layers having different compositions. Disposed adjacent each target is a magnetic means, and at least one which is reversible in magnetic-pole polarity. One polarity produces a magnetic flux sufficient to ignite a sputtering plasma in the inner target only, when power is supplied to the inner target at a preselected level. The opposite polarity produces a magnetic flux sufficient to ignite a sputtering plasma in the outer target only, when power is supplied to the outer target at a preselected level.

    摘要翻译: 描述了用于制造磁记录介质的目标组件。 目标组件具有用于溅射沉积在衬底上的内部和外部同心靶,第一层和第二层具有不同的组成。 设置在每个目标附近是磁性装置,并且至少一个磁极极性是可逆的。 一个极性产生足够的磁通量,用于仅在内部靶中点燃溅射等离子体,当电力以预选的电平供应到内部靶子时。 相反的极性产生足够的磁通量,以在外部目标物体中以预定的水平向外部靶供电。