Apparatus for rapid deposition of test samples on an absorbent support
    3.
    发明授权
    Apparatus for rapid deposition of test samples on an absorbent support 失效
    用于将试样快速沉积在吸收剂载体上的装置

    公开(公告)号:US5011779A

    公开(公告)日:1991-04-30

    申请号:US418784

    申请日:1989-10-02

    申请人: Jonathan Maimon

    发明人: Jonathan Maimon

    摘要: The disclosure is directed to a method and apparatus for depositing a plurality of discrete liquid assay test samples onto an absorbent assay support. Pursuant to the invention, a guide and positioning device is provided to receive and position a device for dispensing a plurality of discrete test samples such that the dispensing device is operable to dispense the plurality of test samples in accordance with a predetermined pattern. A planar absorbent assay support device is positioned at a position which is vertically spaced and aligned below the guide and positioning device to receive the discrete test samples dispensed by the dispensing device. In this manner, a plurality of discrete test sample spots may be rapidly absorbed onto the absorbent assay support device in accordance with the predetermined pattern for efficient, simultaneous processing in a chosen immunoassay system.

    摘要翻译: 本公开涉及一种用于将多个离散的液体测定测试样品沉积到吸收测定载体上的方法和装置。 根据本发明,提供引导和定位装置以接收和定位用于分配多个离散测试样本的装置,使得分配装置可操作以根据预定模式分配多个测试样本。 平面吸收测定支持装置定位在垂直间隔开的位置并且在引导和定位装置下方对准以接收由分配装置分配的离散测试样本。 以这种方式,可以根据预定模式将多个离散的测试样本点快速吸收到吸收测定支持装置上,以在所选择的免疫测定系统中进行有效,同时的处理。

    Method for forming an interated resister having aligned body and contact
    4.
    发明授权
    Method for forming an interated resister having aligned body and contact 有权
    用于形成具有对准体和接触的中间电阻器的方法

    公开(公告)号:US06737327B2

    公开(公告)日:2004-05-18

    申请号:US10126352

    申请日:2002-04-19

    IPC分类号: H01L2120

    CPC分类号: G11C11/412

    摘要: A method for forming a resistor includes causing a semiconductor layer to have a first resistance, forming a first mask on the semiconductor layer, causing portions of the semiconductor layer left exposed by the first mask to have a second resistance that is lower than the first resistance, forming a second mask on the first mask and on the semiconductor layer, removing portions of the first mask and the semiconductor layer left exposed by the second mask, removing the second mask, and causing portions of the semiconductor layer exposed by the removing of the second mask to have a third resistance that is lower than the second resistance. Because a resistor formed by such a process can include an aligned body and contact, it often occupies a smaller area than prior integrated resistors having a similar resistance value.

    摘要翻译: 一种形成电阻器的方法,包括使半导体层具有第一电阻,在半导体层上形成第一掩模,使由第一掩模露出的半导体层的部分具有低于第一电阻的第二电阻 在所述第一掩模和所述半导体层上形成第二掩模,去除所述第一掩模的部分和由所述第二掩模露出的半导体层,去除所述第二掩模,并且通过去除所述第二掩模而使所述半导体层暴露的部分 第二掩模具有低于第二电阻的第三电阻。 由于通过这种处理形成的电阻器可以包括对准的主体和接触,所以它通常占据比具有相似电阻值的现有集成电阻器更小的面积。

    Method for fabricating resistors within semiconductor integrated circuit devices
    5.
    发明授权
    Method for fabricating resistors within semiconductor integrated circuit devices 有权
    在半导体集成电路器件内制造电阻器的方法

    公开(公告)号:US06717233B1

    公开(公告)日:2004-04-06

    申请号:US09491230

    申请日:2000-01-25

    IPC分类号: H01L2900

    摘要: A method for fabricating resistors within a semiconductor integrated circuit device is disclosed. A resistor is fabricated by first depositing a passivation layer on a semiconductor substrate having multiple transistors previously formed thereon. Next, a first contact window and a second contact window are formed through the first passivation layer at a first contact location and a second contact location, respectively. The first and second contact windows are then filled with metal, such as tungsten, and the metal at the first and second contact windows is planarized to form a first bottom contact and a second bottom contact, respectively. A resistive film, such as polysilicon, subsequently deposited over the first passivation layer. Next, a second passivation layer is formed over the resistive film. Finally, a first top contact and a second top contact are formed to respectively connect the first bottom contact and the second bottom contact to the resistive film.

    摘要翻译: 公开了一种在半导体集成电路器件内制造电阻器的方法。 通过首先在预先形成有多个晶体管的半导体衬底上沉积钝化层来制造电阻器。 接下来,分别在第一接触位置和第二接触位置处穿过第一钝化层形成第一接触窗口和第二接触窗口。 第一和第二接触窗口然后用诸如钨的金属填充,并且在第一和第二接触窗口处的金属被平坦化以分别形成第一底部触点和第二底部触点。 电阻膜,例如多晶硅,随后沉积在第一钝化层上。 接下来,在电阻膜上形成第二钝化层。 最后,形成第一顶部触点和第二顶部触点,以将第一底部触点和第二底部触点分别连接到电阻薄膜。

    Multichamber syringe device for fusing cells
    7.
    发明授权
    Multichamber syringe device for fusing cells 失效
    用于融合细胞的多室注射器装置

    公开(公告)号:US5350693A

    公开(公告)日:1994-09-27

    申请号:US44400

    申请日:1993-04-08

    IPC分类号: C12M3/00 C12M1/00 C12M1/02

    CPC分类号: C12M35/02 C12M33/04

    摘要: An apparatus for fusing cells which includes a multichamber syringe having a first chamber containing a suspension of cells, a second chamber containing a suspension of cells, and a third chamber containing at least 40% by volume polyethylene glycol (PEG). The exit passageways of the chambers being braided such that the downstream ends thereof are beveled and face one another at the same level. The relative cross sections of the chambers being of a diameter such that a desired ratio of the suspensions and solution form in midair a mixture of 15% to 25% PEG by volume. The apparatus also includes a non-linear tube in fluid communication with the syringe for receiving the mixture therefrom and a device for causing a reciprocating passage of the mixture through the non-linear tube.

    摘要翻译: 一种用于融合细胞的装置,其包括具有包含细胞悬浮液的第一室的多室注射器,含有细胞悬浮液的第二室和含有至少40体积%聚乙二醇(PEG)的第三室。 编织室的出口通道使其下游端部倾斜并且在相同水平面彼此面对。 室的相对横截面具有使得悬浮液和溶液在空中形成所需比例为15体积%至25体积%PEG的混合物的直径。 该装置还包括与注射器流体连通的用于接收混合物的非线性管和用于引起混合物通过非线性管的往复通道的装置。