Imprint apparatus, and method of manufacturing article

    公开(公告)号:US09927700B2

    公开(公告)日:2018-03-27

    申请号:US14491014

    申请日:2014-09-19

    Inventor: Yosuke Murakami

    CPC classification number: G03F7/0002 B29L2031/772

    Abstract: The present invention provides an imprint apparatus for molding an imprint material on a target region on a substrate using a mold to form a pattern on the target region, the apparatus comprising a heater configured to deform the target region by heating the substrate, a measurement device configured to measure an overlay state between the target region and the mold, and a controller configured to control the heater such that the overlay state falls within a tolerance.

Patent Agency Ranking