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公开(公告)号：US5138024A
公开(公告)日：1992-08-11
申请号：US645945
申请日：1991-01-25
IPC分类号： B29C55/12 , B29K67/00 , C08G63/181 , C08G63/688 , C08G63/78 , C08J5/18 , C08K5/524 , C08K5/527 , C08L67/00 , C08L67/02 , G03C1/795
CPC分类号： G03C1/7954 , C08G63/6886 , C08K5/527
摘要： A copolyester is synthesized by reacting a dialkyl ester of an aromatic dicarboxylic acid (e.g., dimethyl terephthalate) with ethylene glycol, low molecular weight poly(ethylene glycol) and a salt of a sulfonic acid-substituted aromatic dicarboxylate (e.g., sodium sulfoisophthalic acid) simultaneously in a first stage reaction in the presence of a phosphite or phosphate stabilizer. The intermediate product of the first stage is further reacted in a second stage in the presence of a polycondensation catalyst to obtain a random copolyester of the desired molecular weight. The copolyester is extruded to form a film which, after orientation and heat setting, has excellent clarity and is useful as a photographic film support. Aqueous processing of the film relaxes any core set or curl.
摘要翻译： 通过使芳族二羧酸（例如对苯二甲酸二甲酯）的二烷基酯与乙二醇，低分子量聚（乙二醇）和磺酸取代的芳族二羧酸盐（例如磺基间苯二甲酸钠）的盐反应来合成共聚多酯， 同时在亚磷酸盐或磷酸盐稳定剂存在下进行第一阶段反应。 第一阶段的中间产物在缩聚催化剂的存在下在第二阶段进一步反应，得到所需分子量的无规共聚酯。 将共聚酯挤出以形成膜，其在取向和热定形之后具有优异的透明度并且可用作照相胶片载体。 膜的水处理可以松弛任何芯组或卷曲。
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公开(公告)号：US4131465A
公开(公告)日：1978-12-26
申请号：US836987
申请日：1977-09-27
IPC分类号： C08G63/685 , G03F7/038 , G03C1/94
CPC分类号： G03F7/038 , C08G63/6854
摘要： Radiation-sensitive linear polymers comprise repeating structural units containing an o-nitrophenyl acetal. The polymer is formed, for example, by the linear polycondensation of o-nitrobenzaldehyde with a particular dihydroxy alcohol. The polymers are useful as coatings to form positive-working radiation-sensitive elements such as photoresists or lithographic printing plates.
摘要翻译： 辐射敏感线性聚合物包含含有邻硝基苯基缩醛的重复结构单元。 聚合物例如通过邻硝基苯甲醛与特定二羟基醇的线性缩聚形成。 聚合物可用作形成正性辐射敏感元件如光致抗蚀剂或平版印刷版的涂层。
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公开(公告)号：US4289842A
公开(公告)日：1981-09-15
申请号：US163470
申请日：1980-06-27
IPC分类号： G03F7/004 , C08F20/00 , C08F20/10 , C08F220/18 , C08F220/40 , G03F7/038 , G03C1/68
CPC分类号： G03F7/0388 , C08F220/18 , C08F220/40
摘要： Novel acrylate copolymer materials function as electron-beam resists with enhanced sensitivity and enhanced plasma etch resistance. The method of using such materials as an electron-beam resist is also described.
摘要翻译： 新型丙烯酸酯共聚物材料具有增强的灵敏度和增强的等离子体耐蚀刻性能的电子束抗蚀剂。 还描述了使用这种材料作为电子束抗蚀剂的方法。
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4.发明授权Novel radiation sensitive compounds and radiation sensitive compositions containing the same 失效新型的辐射敏感化合物和含有它们的辐射敏感组合物
公开(公告)号：US4233443A
公开(公告)日：1980-11-11
申请号：US24280
申请日：1979-03-26
IPC分类号： C07D309/34 , C07D311/04 , G03G5/06
CPC分类号： C07D311/04 , C07D309/34 , G03G5/067
摘要： Pyrylium, thiapyrylium and selenapyrylium salts and derivatives thereof having a trimethine linkage containing an aryl substituent attached to at least one carbon atom of the trimethine linkage are disclosed. Radiation sensitive compositions, e.g., photoconductive compositions, containing such materials are also disclosed.
摘要翻译： 公开了具有含有连接在三甲基键的至少一个碳原子上的芳基取代基的三甲基键的吡喃鎓，硫代吡喃鎓和硒代吡喃鎓盐及其衍生物。 还公开了含有这种材料的辐射敏感组合物，例如光导组合物。
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公开(公告)号：US4173473A
公开(公告)日：1979-11-06
申请号：US813371
申请日：1977-07-06
IPC分类号： C07D309/34 , C07D311/04 , C07D407/06 , G03G5/06 , G03G5/09
CPC分类号： G03G5/067 , C07D309/34 , C07D311/04
摘要： Pyrylium, thiapyrylium and selenapyrylium salts and derivatives thereof having a trimethine linkage containing an aryl substituent attached to at least one carbon atom of the trimethine linkage are disclosed. Radiation sensitive compositions, e.g., photoconductive compositions, containing such materials are also disclosed.
摘要翻译： 公开了具有含有连接在三甲基键的至少一个碳原子上的芳基取代基的三甲基键的吡喃鎓，硫代吡喃鎓和硒代吡喃鎓盐及其衍生物。 还公开了含有这种材料的辐射敏感组合物，例如光导组合物。
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