Synthetic silica glass with uniform fictive temperature
    1.
    发明授权
    Synthetic silica glass with uniform fictive temperature 有权
    具有均匀假想温度的合成石英玻璃

    公开(公告)号:US08596094B2

    公开(公告)日:2013-12-03

    申请号:US12902238

    申请日:2010-10-12

    摘要: A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described.

    摘要翻译: 制造具有均匀的假想温度的二氧化硅玻璃的方法。 将玻璃制品在目标假想温度下加热,或以低于假想温度变化率的速率加热或冷却一段足以使玻璃的假想温度达到3°的时间 C.目标虚构温度。 然后将二氧化硅玻璃从目标假想温度冷却至低于玻璃应变点的温度,其冷却速率大于目标假想温度下玻璃的松弛率。 二氧化硅玻璃具有在退火步骤之后变化小于3℃的假想温度。 还描述了通过该方法制备的二氧化硅玻璃。

    SYNTHETIC SILICA GLASS WITH UNIFORM FICTIVE TEMPERATURE
    2.
    发明申请
    SYNTHETIC SILICA GLASS WITH UNIFORM FICTIVE TEMPERATURE 有权
    合成二氧化硅玻璃具有均匀的温度

    公开(公告)号:US20110092354A1

    公开(公告)日:2011-04-21

    申请号:US12902238

    申请日:2010-10-12

    IPC分类号: C03C3/04 C03B25/00

    摘要: A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described.

    摘要翻译: 制造具有均匀的假想温度的二氧化硅玻璃的方法。 将玻璃制品在目标假想温度下加热,或以低于假想温度变化率的速率加热或冷却一段足以使玻璃的假想温度达到3°的时间 C.目标虚构温度。 然后将二氧化硅玻璃从目标假想温度冷却至低于玻璃应变点的温度,其冷却速率大于目标假想温度下玻璃的松弛率。 二氧化硅玻璃具有在退火步骤之后变化小于3℃的假想温度。 还描述了通过该方法制备的二氧化硅玻璃。

    Low expansivity, high transmission titania doped silica glass
    3.
    发明授权
    Low expansivity, high transmission titania doped silica glass 有权
    低膨胀性,高透射二氧化钛掺杂石英玻璃

    公开(公告)号:US08541325B2

    公开(公告)日:2013-09-24

    申请号:US13028472

    申请日:2011-02-16

    IPC分类号: C03C3/06

    摘要: In one embodiment the present disclosure is directed to a silica-titania glass with an internal transmission of >90%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the internal transmission is >93%/cm at wavelengths from 340 nm to 840 nm. In a further embodiment the internal transmission is >95%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the disclosure is directed to a silica-titania glass with an overall transmission through an optic made of the glass is >84% at wavelengths from 340 nm to 840 nm. In another embodiment overall transmission through an optic made of the glass is >86% at wavelengths from 340 nm to 840 nm. In a further embodiment the overall transmission through an optic made of the glass is >88% at wavelengths from 330 nm to 840 nm. In a further embodiment the silica-titania glass has a Ti+3 concentration level [Ti3+] less than 3 ppm by weight.

    摘要翻译: 在一个实施方案中,本公开涉及在340nm至840nm的波长下具有> 90%/ cm 3的内透射率的二氧化硅 - 二氧化钛玻璃。 在另一个实施例中,在340nm至840nm的波长下,内透射率> 93%/ cm。 在另一个实施方案中,在340nm至840nm的波长下,内透射率> 95%/ cm。 在另一个实施方案中,本发明涉及一种二氧化硅 - 二氧化钛玻璃,其透射率通过玻璃制成的光学透镜在340nm至840nm的波长处> 84%。 在另一个实施例中,通过由玻璃制成的光学器件的整个透射在340nm至840nm的波长处为> 86%。 在另一实施例中,通过由玻璃制成的光学器件的整体透射在330nm至840nm的波长处为> 88%。 在另一个实施方案中,二氧化硅 - 二氧化钛玻璃具有小于3ppm重量的Ti + 3浓度水平[Ti 3+]。

    Low Expansivity, High Transmission Titania Doped Silica Glass
    6.
    发明申请
    Low Expansivity, High Transmission Titania Doped Silica Glass 有权
    低膨胀率,高透射率二氧化钛掺杂二氧化硅玻璃

    公开(公告)号:US20110207592A1

    公开(公告)日:2011-08-25

    申请号:US13028472

    申请日:2011-02-16

    IPC分类号: C03C3/06

    摘要: In one embodiment the present disclosure is directed to a silica-titania glass with an internal transmission of >90%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the internal transmission is >93%/cm at wavelengths from 340 nm to 840 nm. In a further embodiment the internal transmission is >95%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the disclosure is directed to a silica-titania glass with an overall transmission through an optic made of the glass is >84% at wavelengths from 340 nm to 840 nm. In another embodiment overall transmission through an optic made of the glass is >86% at wavelengths from 340 nm to 840 nm. In a further embodiment the overall transmission through an optic made of the glass is >88% at wavelengths from 330 nm to 840 nm. In a further embodiment the silica-titania glass has a Ti+3 concentration level [Ti3+] less than 3 ppm by weight.

    摘要翻译: 在一个实施方案中,本公开涉及在340nm至840nm的波长下具有> 90%/ cm 3的内透射率的二氧化硅 - 二氧化钛玻璃。 在另一个实施例中,在340nm至840nm的波长下,内透射率> 93%/ cm。 在另一个实施方案中,在340nm至840nm的波长下,内透射率> 95%/ cm。 在另一个实施方案中,本公开涉及一种二氧化硅 - 二氧化钛玻璃,其透射率通过玻璃制成的光学器件在340nm至840nm的波长处为> 84%。 在另一个实施例中,通过由玻璃制成的光学器件的整个透射在340nm至840nm的波长处为> 86%。 在另一实施例中,通过由玻璃制成的光学器件的整体透射在330nm至840nm的波长处为> 88%。 在另一个实施方案中,二氧化硅 - 二氧化钛玻璃具有小于3ppm重量的Ti + 3浓度水平[Ti 3+]。

    TUNING Tzc BY THE ANNEALING OF ULTRA LOW EXPANSION GLASS
    7.
    发明申请
    TUNING Tzc BY THE ANNEALING OF ULTRA LOW EXPANSION GLASS 有权
    通过超低膨胀玻璃的退火调节Tzc

    公开(公告)号:US20110048075A1

    公开(公告)日:2011-03-03

    申请号:US12868934

    申请日:2010-08-26

    IPC分类号: C03B25/00 C03C3/06

    摘要: The disclosure describes a method by which the Tzc of a silica-titania glass article, for example, a EUVL mirror substrate, can be tuned to within a specification range by means of a selected final anneal that shifts Tzc of the article or substrate to the desired Tzc value. In addition, since different mirrors in a set can be specified at different values of Tzc, this process can be on used glass samples or pieces from a single glass boule to make parts with different Tzc values, thus reducing the number of separate boules required to fill an order.

    摘要翻译: 本公开内容描述了一种通过选择的最终退火将二氧化硅 - 二氧化钛玻璃制品的Tzc(例如EUVL反射镜基板)调谐到规定范围内的方法,该最终退火将制品或基材的Tzc移动到 期望的Tzc值。 另外,由于可以在不同的Tzc值中指定一组中的不同反射镜,所以该过程可以是来自单个玻璃棒的玻璃样品或碎片以制备具有不同Tzc值的部件,从而减少了需要的单独的毛坯的数量 填写订单。

    Tuning Tzc by the annealing of ultra low expansion glass
    8.
    发明授权
    Tuning Tzc by the annealing of ultra low expansion glass 有权
    通过超低膨胀玻璃的退火调整Tzc

    公开(公告)号:US08713969B2

    公开(公告)日:2014-05-06

    申请号:US12868934

    申请日:2010-08-26

    IPC分类号: C03B25/00

    摘要: The disclosure describes a method by which the Tzc of a silica-titania glass article, for example, a EUVL mirror substrate, can be tuned to within a specification range by means of a selected final anneal that shifts Tzc of the article or substrate to the desired Tzc value. In addition, since different mirrors in a set can be specified at different values of Tzc, this process can be on used glass samples or pieces from a single glass boule to make parts with different Tzc values, thus reducing the number of separate boules required to fill an order.

    摘要翻译: 本公开内容描述了一种通过选择的最终退火将二氧化硅 - 二氧化钛玻璃制品的Tzc(例如EUVL反射镜基板)调谐到规定范围内的方法,该最终退火将制品或基材的Tzc移动到 期望的Tzc值。 另外,由于可以在不同的Tzc值中指定一组中的不同反射镜,所以该过程可以是来自单个玻璃棒的玻璃样品或碎片以制备具有不同Tzc值的部件,从而减少了需要的单独的毛坯的数量 填写订单。