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7 条记录 (耗时 0.016 秒)

    Method of producing a hydrogenated amorphous carbon coating
    3.
    发明授权
    Method of producing a hydrogenated amorphous carbon coating 有权
    制备氢化无定形碳涂层的方法

    公开(公告)号：US08367207B2

    公开(公告)日：2013-02-05

    申请号：US12738679

    申请日：2008-10-20

    申请人： Caroline Chouquet ,  Cédric Ducros ,  Frédéric Sanchette

    发明人： Caroline Chouquet ,  Cédric Ducros ,  Frédéric Sanchette

    IPC分类号： C23C16/26

    CPC分类号： C23C16/26 ,  C23C16/515 ,  Y10T428/2495 ,  Y10T428/24975 ,  Y10T428/30

    摘要： The invention relates to a hydrogenated amorphous carbon coating and to a method for the production thereof. It also relates to devices having such a coating. The method of the invention consists in producing a hydrogenated amorphous carbon coating comprising at least two layers of hydrogenated amorphous carbon, each of said layers having chemical compositions and physical and mechanical properties that are identical, and with thicknesses that are identical or different. The coating of the invention finds many applications, in particular in the mechanical field for parts subject to considerable wear and rubbing problems. It may also be applicable, in particular, in the field of surgical implants and in the MEMS (microelectromechanical systems) field.

    摘要翻译： 本发明涉及氢化无定形碳涂层及其生产方法。 它还涉及具有这种涂层的装置。 本发明的方法在于制备包含至少两层氢化无定形碳的氢化无定形碳涂层，每层所述层的化学组成以及物理和机械性能相同，厚度相同或不同。 本发明的涂层具有许多应用，特别是对于受到相当大磨损和摩擦问题的部件的机械领域。 它也可能适用于特别是外科植入物领域和MEMS（微机电系统）领域。

    Method of Producing a Hydrogenated Amorphous Carbon Coating
    4.
    发明申请
    Method of Producing a Hydrogenated Amorphous Carbon Coating 有权
    生产氢化非晶碳涂层的方法

    公开(公告)号：US20110076476A1

    公开(公告)日：2011-03-31

    申请号：US12738679

    申请日：2008-10-20

    申请人： Caroline Chouquet ,  Cédric Ducros ,  Frédéric Sanchette

    发明人： Caroline Chouquet ,  Cédric Ducros ,  Frédéric Sanchette

    IPC分类号： B32B7/02 ,  C23C16/513

    CPC分类号： C23C16/26 ,  C23C16/515 ,  Y10T428/2495 ,  Y10T428/24975 ,  Y10T428/30

    摘要： The invention relates to a hydrogenated amorphous carbon coating and to a method for the production thereof. It also relates to devices having such a coating. The method of the invention consists in producing a hydrogenated amorphous carbon coating comprising at least two layers of hydrogenated amorphous carbon, each of said layers having chemical compositions and physical and mechanical properties that are identical, and with thicknesses that are identical or different. The coating of the invention finds many applications, in particular in the mechanical field for parts subject to considerable wear and rubbing problems. It may also be applicable, in particular, in the field of surgical implants and in the MEMS (microelectromechanical systems) field.

    摘要翻译： 本发明涉及氢化无定形碳涂层及其生产方法。 它还涉及具有这种涂层的装置。 本发明的方法在于制备包含至少两层氢化无定形碳的氢化无定形碳涂层，每层所述层的化学组成以及物理和机械性能相同，厚度相同或不同。 本发明的涂层具有许多应用，特别是对于受到相当大磨损和摩擦问题的部件的机械领域。 它也可能适用于特别是外科植入物领域和MEMS（微机电系统）领域。

    Sulfidation-resistant silver-base coating, method for depositing such a coating and use thereof
    6.
    发明授权
    Sulfidation-resistant silver-base coating, method for depositing such a coating and use thereof 失效
    耐硫酸银银涂层，沉积这种涂层的方法及其用途

    公开(公告)号：US07670689B2

    公开(公告)日：2010-03-02

    申请号：US11584533

    申请日：2006-10-23

    申请人： Denis Camel ,  Laurent Bedel ,  Frédéric Sanchette ,  Cédric Ducros

    发明人： Denis Camel ,  Laurent Bedel ,  Frédéric Sanchette ,  Cédric Ducros

    IPC分类号： B32B9/00 ,  B32B19/00 ,  C23C16/00

    CPC分类号： C23C14/165 ,  C23C14/0084

    摘要： The sulfidation resistance of a silver-base material coating is further improved by making a concentration gradient of silver, oxygen and of one or more oxidizable alloying elements that may be present in the material, from the free surface of the coating up to a depth comprised between 10 nm and 1 μm and more particularly between 100 nm and 1 μm. Thus, the coating comprises a stack of one main layer made from silver-base material and of one oxidized thin film. The thin film, with a thickness comprised between 10 nm and 1 μm, thus presents a decreasing silver concentration gradient from the interface between the thin film and the main layer to the free surface of the thin film. Deposition of the coating on a support can be achieved by two successive physical vapor deposition steps, and more particularly by magnetron cathode sputtering.

    摘要翻译： 银基材料涂层的耐硫化性进一步通过从涂层的自由表面形成银，氧和可能存在于材料中的一种或多种可氧化的合金元素的浓度梯度进一步改善，所述深度包括 在10nm和1μm之间，更特别地在100nm和1μm之间。 因此，涂层包括由银基材料制成的一个主层和一个氧化薄膜的叠层。 厚度在10nm和1μm之间的薄膜因此呈现从薄膜和主层之间的界面到薄膜自由表面的银浓度梯度的降低。 可以通过两个连续的物理气相沉积步骤，更具体地通过磁控管阴极溅射，将涂层沉积在载体上。