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1.发明申请Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same 有权用于形成二维重复的光刻胶图案的光掩模及其制造方法公开(公告)号：US20050003278A1
公开(公告)日：2005-01-06
申请号：US10827556
申请日：2004-04-19
申请人： Chan Hwang , In-Sung Kim , Young-Seog Kang
发明人： Chan Hwang , In-Sung Kim , Young-Seog Kang
IPC分类号： H01L21/027 , G03C5/00 , G03F1/00 , G03F1/36 , G03F9/00
CPC分类号： G03F1/36
摘要： A photomask includes a transparent substrate, and a plurality of light-shielding patterns repeatedly aligned on the transparent substrate in two dimensions. Each of the light-shielding patterns has length and width measurements that differ from each other. Further, the photomask includes at least one through hole penetrating a portion of each of the light-shielding patterns to expose the transparent substrate.
摘要翻译： 光掩模包括透明基板和在二维上在透明基板上重复对准的多个遮光图案。 每个遮光图案具有彼此不同的长度和宽度测量值。 此外，光掩模包括贯穿每个遮光图案的一部分的至少一个通孔，以露出透明基板。
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2.发明授权Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same 有权用于形成二维重复的光刻胶图案的光掩模及其制造方法公开(公告)号：US07361433B2
公开(公告)日：2008-04-22
申请号：US10827556
申请日：2004-04-19
申请人： Chan Hwang , In-Sung Kim , Young-Seog Kang
发明人： Chan Hwang , In-Sung Kim , Young-Seog Kang
IPC分类号： G03F1/00
CPC分类号： G03F1/36
摘要： A photomask includes a transparent substrate, and a plurality of light-shielding patterns repeatedly aligned on the transparent substrate in two dimensions. Each of the light-shielding patterns has length and width measurements that differ from each other. Further, the photomask includes at least one through hole penetrating a portion of each of the light-shielding patterns to expose the transparent substrate.
摘要翻译： 光掩模包括透明基板和在二维上在透明基板上重复对准的多个遮光图案。 每个遮光图案具有彼此不同的长度和宽度测量值。 此外，光掩模包括贯穿每个遮光图案的一部分的至少一个通孔，以露出透明基板。
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3.发明申请Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same 有权用于提供六极照明的光学系统和使用其形成光致抗蚀剂图案的方法公开(公告)号：US20050105072A1
公开(公告)日：2005-05-19
申请号：US10867469
申请日：2004-06-14
申请人： Dong-Seok Nam , Chan Hwang , Young-Seog Kang
发明人： Dong-Seok Nam , Chan Hwang , Young-Seog Kang
CPC分类号： G03F7/70108 , G03B27/42
摘要： In an optical system for forming a photoresist pattern on a substrate, an optical element such as a holographic optical element and an aperture plate provides an off-axis illumination beam having a hexapole. The photoresist pattern is formed to form structures such as contact pads, and includes first holes and second holes repeatedly arranged on the substrate. The hexapole includes four first poles symmetrically disposed with respect to an x-axis and a y-axis, and two second poles disposed in the x-axis so as to be symmetric with respect to the y-axis. The off-axis illumination beam may improve a resolution of the photoresist pattern and a depth of focus (DOF) of a light beam to be projected onto the substrate.
摘要翻译： 在用于在基板上形成光致抗蚀剂图案的光学系统中，诸如全息光学元件和孔板的光学元件提供具有六极的离轴照明光束。 形成光致抗蚀剂图案以形成诸如接触焊盘的结构，并且包括重复地布置在基板上的第一孔和第二孔。 六极包括相对于x轴和y轴对称设置的四个第一极和设置在x轴上以相对于y轴对称的两个第二极。 离轴照明光束可以提高光致抗蚀剂图案的分辨率和要投影到基板上的光束的焦深（DOF）。
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4.发明授权Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same 有权用于提供六极照明的光学系统和使用其形成光致抗蚀剂图案的方法公开(公告)号：US07139064B2
公开(公告)日：2006-11-21
申请号：US10867469
申请日：2004-06-14
申请人： Dong-Seok Nam , Chan Hwang , Young-Seog Kang
发明人： Dong-Seok Nam , Chan Hwang , Young-Seog Kang
CPC分类号： G03F7/70108 , G03B27/42
摘要： In an optical system for forming a photoresist pattern on a substrate, an optical element such as a holographic optical element and an aperture plate provides an off-axis illumination beam having a hexapole. The photoresist pattern is formed to form structures such as contact pads, and includes first holes and second holes repeatedly arranged on the substrate. The hexapole includes four first poles symmetrically disposed with respect to an x-axis and a y-axis, and two second poles disposed in the x-axis so as to be symmetric with respect to the y-axis. The off-axis illumination beam may improve a resolution of the photoresist pattern and a depth of focus (DOF) of a light beam to be projected onto the substrate.
摘要翻译： 在用于在基板上形成光致抗蚀剂图案的光学系统中，诸如全息光学元件和孔板的光学元件提供具有六极的离轴照明光束。 形成光致抗蚀剂图案以形成诸如接触焊盘的结构，并且包括重复地布置在基板上的第一孔和第二孔。 六极包括相对于x轴和y轴对称设置的四个第一极和设置在x轴上以相对于y轴对称的两个第二极。 离轴照明光束可以提高光致抗蚀剂图案的分辨率和要投影到基板上的光束的焦深（DOF）。
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5.发明申请Method of Aligning a Wafer and Method of Monitoring a Lithography Process Including the Same 审中-公开晶圆对准方法和包括其的平版印刷术的监控方法公开(公告)号：US20110317163A1
公开(公告)日：2011-12-29
申请号：US13166327
申请日：2011-06-22
申请人： Seung-Yoon Lee , Jeong-Ho Yeo , Chan Hwang
发明人： Seung-Yoon Lee , Jeong-Ho Yeo , Chan Hwang
IPC分类号： G01B11/14
CPC分类号： G03F9/7046
摘要： A method of aligning a wafer includes irradiating light onto a plurality of alignment marks of a wafer, detecting signals outputted from the alignment marks to obtain alignment position offsets, selecting a set of the alignment marks corresponding to the alignment position offsets having a same or similar distribution, and aligning the wafer based the selected alignment marks.
摘要翻译： 对准晶片的方法包括将光照射到晶片的多个对准标记上，检测从对准标记输出的信号以获得对准位置偏移，选择与具有相同或相似的对准位置偏移对应的一组对准标记 分布和基于所选择的对准标记对齐晶片。
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6.发明授权Diffractive optical element, illumination system comprising the same, and method of manufacturing semiconductor device using illumination system 失效衍射光学元件，包括该衍射光学元件的照明系统以及使用照明系统制造半导体器件的方法公开(公告)号：US07336420B2
公开(公告)日：2008-02-26
申请号：US11697143
申请日：2007-04-05
申请人： Chan Hwang
发明人： Chan Hwang
CPC分类号： G02B27/0944 , G02B5/1866 , G02B5/32 , G02B27/09 , G02B27/425 , G03F7/70091 , G03F7/70158
摘要： An illumination system including a diffractive optical element (DOE) having an uneven surface that produces an illumination shape. The DOE comprising an uneven surface that produces a multipole illumination shape having angular scope element, wherein the angular scope element is a function of a radius and an angle of the produced multipole illumination shape, and wherein a position of the poles and sizes of the poles in an angular scope vary with a radial scope used in producing the multipole illumination shape, and a method of manufacturing a semiconductor device using the system.
摘要翻译： 一种包括衍射光学元件（DOE）的照明系统，其具有产生照明形状的不平坦表面。 DOE包括产生具有角度范围元件的多极照明形状的不平坦表面，其中角度范围元件是所产生的多极照明形状的半径和角度的函数，并且其中极点的位置和极的尺寸 角度范围随着用于制造多极照明形状的径向范围而变化，以及使用该系统制造半导体器件的方法。
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7.发明授权Method of correcting overlay and semiconductor device manufacturing method using the same 有权使用该方法校正覆盖层和半导体器件制造方法公开(公告)号：US08773153B2
公开(公告)日：2014-07-08
申请号：US13029633
申请日：2011-02-17
申请人： Chan Hwang
发明人： Chan Hwang
IPC分类号： G01R31/00
CPC分类号： G03F7/70633
摘要： A method of correcting an overlay includes setting a reference map having information relating to predetermined positions of a substrate. An overlay value is measured at each of the predetermined positions to obtain a plurality of overlay measurement values. The plurality of overlay measurement values is applied to a polar coordinate function to calculate a correlation coefficient of the polar coordinate function. The polar coordinate function uses coordinate values of the predetermined positions as parameters.
摘要翻译： 校正覆盖物的方法包括设置具有与基板的预定位置相关的信息的参考图。 在每个预定位置处测量覆盖值以获得多个覆盖测量值。 将多个覆盖测量值应用于极坐标函数以计算极坐标函数的相关系数。 极坐标函数使用预定位置的坐标值作为参数。
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公开(公告)号：US20100112466A1
公开(公告)日：2010-05-06
申请号：US12686093
申请日：2010-01-12
申请人： Chan Hwang , Suk-Joo Lee , Han-Ku Cho , Sang-Gyun Woo
发明人： Chan Hwang , Suk-Joo Lee , Han-Ku Cho , Sang-Gyun Woo
IPC分类号： G03F1/00
摘要： An optical mask for use with an exposure beam includes a mask substrate adapted to be placed on a traveling path of the exposure beam. A reference pattern is formed on the mask substrate. The reference pattern is adapted to direct the exposure beam to travel in a predetermined reference direction. A comparative pattern is formed on the mask substrate. The comparative pattern is adapted to direct the exposure beam to travel in a direction inclined at a predetermined angle with respect to the reference direction.
摘要翻译： 用于曝光光束的光学掩模包括适于放置在曝光光束的行进路径上的掩模基板。 在掩模基板上形成参考图案。 参考图案适于引导曝光光束在预定的参考方向上行进。 在掩模基板上形成比较图案。 比较图案适于引导曝光光束相对于参考方向在以预定角度倾斜的方向上行进。
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公开(公告)号：US07670725B2
公开(公告)日：2010-03-02
申请号：US11311109
申请日：2005-12-19
申请人： Chan Hwang , Suk-Joo Lee , Han-Ku Cho , Sang-Gyun Woo
发明人： Chan Hwang , Suk-Joo Lee , Han-Ku Cho , Sang-Gyun Woo
IPC分类号： G03F1/00
摘要： An optical mask for use with an exposure beam includes a mask substrate adapted to be placed on a traveling path of the exposure beam. A reference pattern is formed on the mask substrate. The reference pattern is adapted to direct the exposure beam to travel in a predetermined reference direction. A comparative pattern is formed on the mask substrate. The comparative pattern is adapted to direct the exposure beam to travel in a direction inclined at a predetermined angle with respect to the reference direction.
摘要翻译： 用于曝光光束的光学掩模包括适于放置在曝光光束的行进路径上的掩模基板。 在掩模基板上形成参考图案。 参考图案适于引导曝光光束在预定的参考方向上行进。 在掩模基板上形成比较图案。 比较图案适于引导曝光光束相对于参考方向在以预定角度倾斜的方向上行进。
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10.发明授权Diffractive optical element, illumination system comprising the same, and method of manufacturing semiconductor device using illumination system 失效衍射光学元件，包括该衍射光学元件的照明系统以及使用照明系统制造半导体器件的方法公开(公告)号：US07215471B2
公开(公告)日：2007-05-08
申请号：US10874786
申请日：2004-06-22
申请人： Chan Hwang
发明人： Chan Hwang
CPC分类号： G02B27/0944 , G02B5/1866 , G02B5/32 , G02B27/09 , G02B27/425 , G03F7/70091 , G03F7/70158
摘要： An illumination system including a diffractive optical element (DOE) having an uneven surface that produces an illumination shape. The DOE comprising an uneven surface that produces a multipole illumination shape having angular scope element, wherein the angular scope element is a function of a radius and an angle of the produced multipole illumination shape, and wherein a position of the poles and sizes of the poles in an angular scope vary with a radial scope used in producing the multipole illumination shape, and a method of manufacturing a semiconductor device using the system.
摘要翻译： 一种包括衍射光学元件（DOE）的照明系统，其具有产生照明形状的不平坦表面。 DOE包括产生具有角度范围元件的多极照明形状的不平坦表面，其中角度范围元件是所产生的多极照明形状的半径和角度的函数，并且其中极点的位置和极的尺寸 角度范围随着用于制造多极照明形状的径向范围而变化，以及使用该系统制造半导体器件的方法。
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