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    Method for processing dynamic database in distributed processing system based on corba platform
    5.
    发明授权
    Method for processing dynamic database in distributed processing system based on corba platform 失效
    基于corba平台的分布式处理系统动态数据库处理方法

    公开(公告)号：US07162490B2

    公开(公告)日：2007-01-09

    申请号：US10026538

    申请日：2001-12-27

    申请人： Sang Wook Kim ,  Young Wook Jun

    发明人： Sang Wook Kim ,  Young Wook Jun

    IPC分类号： G06F17/00 ,  G06F13/00 ,  G06F17/30

    CPC分类号： G06F9/465 ,  G06F9/4484 ,  G06F17/30575 ,  Y10S707/99944

    摘要： A method of processing a dynamic database in a distributed processing system based on CORBA platform includes calling a generic method in a server, detecting data by the called generic method, storing the detected data, and returning the detected data to a client, in the distributed processing system. The detected data is initially stored in a local memory of the database. The generic method then creates a dynamic storage area in the database for the data based on the number of data units that were detected, and based on the size of the detected data unit. In this manner, there is no need to pre-define the structure of the storage area before performing the query.

    摘要翻译： 在基于CORBA平台的分布式处理系统中处理动态数据库的方法包括：在服务器中调用通用方法，通过被叫通用方法检测数据，存储检测到的数据，并将检测到的数据返回给客户端， 处理系统。 检测到的数据最初存储在数据库的本地存储器中。 然后，通用方法基于检测到的数据单元的数量，并且基于检测到的数据单元的大小，在数据库中为数据创建动态存储区域。 以这种方式，在执行查询之前不需要预定义存储区域的结构。

    Grade control apparatus of display set for tapestry
    6.
    发明授权
    Grade control apparatus of display set for tapestry 失效
    挂毯展示台等级控制装置

    公开(公告)号：US06554242B2

    公开(公告)日：2003-04-29

    申请号：US10160157

    申请日：2002-06-04

    申请人： Sang Wook Kim

    发明人： Sang Wook Kim

    IPC分类号： E04G300

    CPC分类号： F16M13/02 ,  F16M11/10 ,  F16M11/18 ,  Y10S248/923

    摘要： A grade control apparatus of display set for tapestry. The apparatus includes at least two guide brackets attached to a wall; holding-down brackets for holding a display device, each having one end being pivotably connected to one end of the corresponding guide bracket; adjusting link transmission shafts installed within each guide bracket, each having one end on which a bevel gear is installed and the other end on which a shifting boss is installed; an angle adjustable shaft being installed between the guide brackets and having gears for being engaged with each bevel gear; and an angle adjustable hand lever for receiving an external force, the angle adjustable hand lever being formed on at least one angle adjustable shaft. The present invention easily adjusts the angle of the display device so as to comply with a user's wishes, and finely adjusts the angle of the display device by a small force.

    摘要翻译： 一种用于挂毯的显示器的档次控制装置。 该装置包括至少两个连接到墙壁上的引导支架; 用于保持显示装置的按压支架，每个具有一端可枢转地连接到相应导向支架的一端; 调整安装在每个引导支架内的连杆传动轴，每个引导支架的一端安装有锥齿轮，另一端安装有换档凸台; 角度可调轴安装在引导支架之间并具有与每个锥齿轮啮合的齿轮; 以及用于接受外力的角度可调节手柄，所述角度可调手柄形成在至少一个角度可调轴上。 本发明可以容易地调整显示装置的角度以符合用户的愿望，并且通过较小的力精细地调整显示装置的角度。

    Method for fabricating a semiconductor device having a tapered contact hole
    7.
    发明授权
    Method for fabricating a semiconductor device having a tapered contact hole 失效
    一种具有锥形接触孔的半导体器件的制造方法

    公开(公告)号：US6107138A

    公开(公告)日：2000-08-22

    申请号：US744805

    申请日：1996-11-06

    申请人： Ei Sam Jeong ,  Sang Wook Kim ,  Byung Suk Lee ,  Yong Hyeock Yoon

    发明人： Ei Sam Jeong ,  Sang Wook Kim ,  Byung Suk Lee ,  Yong Hyeock Yoon

    IPC分类号： H01L21/302 ,  H01L21/02 ,  H01L21/28 ,  H01L21/3065 ,  H01L21/768 ,  H01L21/8242 ,  H01L23/522 ,  H01L27/108

    CPC分类号： H01L27/10852 ,  H01L28/91

    摘要： A semiconductor device includes: a field oxide layer formed on a semiconductor substrate; a transistor having an active region formed on a semiconductor substrate; an interlayer insulating layer formed on the transistor and the field oxide; and a tapered contact hole exposing the active region adjacent to the field oxide layer, wherein an upper portion of the tapered contact hole is wider than a lower portion thereof so that the field oxide is not etched during the contact hole etching process. A method for fabricating a semiconductor device includes the steps for: forming a field oxide layer on a semiconductor substrate; forming a transistor having an active region on a semiconductor substrate; forming an interlayer insulating layer on the resulting structure; and forming a tapered contact hole exposing the active region adjacent to the field oxide layer, wherein an upper portion of the tapered contact hole is wider than a lower portion thereof so that the field oxide is not etched during the contact hole etching process.

    摘要翻译： 半导体器件包括：形成在半导体衬底上的场氧化物层; 具有形成在半导体衬底上的有源区的晶体管; 形成在晶体管和场氧化物上的层间绝缘层; 以及使所述有源区域与所述场氧化物层相邻露出的锥形接触孔，其中所述锥形接触孔的上部比其下部宽，使得在所述接触孔蚀刻工艺期间不会蚀刻所述场氧化物。 一种制造半导体器件的方法包括以下步骤：在半导体衬底上形成场氧化物层; 在半导体衬底上形成具有有源区的晶体管; 在所得结构上形成层间绝缘层; 以及形成露出与所述场氧化物层相邻的所述有源区的锥形接触孔，其中所述锥形接触孔的上部比其下部宽，使得在所述接触孔蚀刻处理期间不会蚀刻所述场氧化物。

    Image processing apparatus and method
    8.
    发明授权
    Image processing apparatus and method 有权
    图像处理装置及方法

    公开(公告)号：US09165211B2

    公开(公告)日：2015-10-20

    申请号：US13251782

    申请日：2011-10-03

    申请人： Seon Min Rhee ,  Yong Beom Lee ,  Sang Wook Kim

    发明人： Seon Min Rhee ,  Yong Beom Lee ,  Sang Wook Kim

    IPC分类号： G06K9/00 ,  G06K9/46

    CPC分类号： G06K9/4671 ,  G06K9/00201

    摘要： Provided is an image processing apparatus for extracting a three-dimensional (3D) feature point from a depth image. An input processing unit may receive a depth image and may receive, via a user interface, selection information of at least one region that is selected as a target region in the depth image. A geometry information analyzer of the image processing apparatus may analyze geometry information of the target region within the input depth image, and a feature point extractor may extract at least one feature point from the target region based on the geometry information of the target region.

    摘要翻译： 提供了一种用于从深度图像提取三维（3D）特征点的图像处理装置。 输入处理单元可以接收深度图像，并且可以经由用户界面接收在深度图像中被选择为目标区域的至少一个区域的选择信息。 图像处理装置的几何信息分析器可以分析输入深度图像内的目标区域的几何信息，并且特征点提取器可以基于目标区域的几何信息从目标区域提取至少一个特征点。

    HIGH CURRENT SOLID TARGET FOR RADIOISOTOPE PRODUCTION AT CYCLOTRON USING METAL FOAM
    10.
    发明申请
    HIGH CURRENT SOLID TARGET FOR RADIOISOTOPE PRODUCTION AT CYCLOTRON USING METAL FOAM 有权
    使用金属泡沫的CYCLOTRON生产射电光电子的高电流固体靶

    公开(公告)号：US20110091001A1

    公开(公告)日：2011-04-21

    申请号：US12821949

    申请日：2010-06-23

    申请人： Min Goo Hur ,  Seung Dae Yang ,  Sang Wook Kim ,  In Jong Kim ,  Sang Mu Choi

    发明人： Min Goo Hur ,  Seung Dae Yang ,  Sang Wook Kim ,  In Jong Kim ,  Sang Mu Choi

    IPC分类号： H05H6/00

    CPC分类号： H05H6/00

    摘要： Disclosed herein is a high current solid target for radioisotope production at a cyclotron using a metal foam, and more specifically, a high current solid target for isotope production, which attaches a metal foam to the rear surface of the solid target plate. A high current solid target for isotope production including a metal foam according to the present invention may exhibit excellent cooling performances to increase the amount of proton beam current irradiated on the solid target compared to conventional planar-type solid targets. Because the irradiation of the increased proton beam current may increase the amount of an isotope produced per unit time and even an irradiation of proton beam in a short time may allow for production of a desired amount of an isotope, the solid target may be usefully used for production of medical cyclotron nuclides.

    摘要翻译： 本文公开了用于使用金属泡沫的回旋加速器的放射性同位素生产的高电流固体靶，更具体地，用于同位素产生的高电流固体靶，其将金属泡沫附着到固体靶板的后表面。 与现有的平面型固体靶相比，含有根据本发明的金属泡沫的高电流固体靶可以表现出优异的冷却性能，以增加照射在固体靶上的质子束电流的量。 因为增加的质子束电流的照射可以增加每单位时间产生的同位素的量，甚至在短时间内甚至照射质子束可以允许产生所需量的同位素，所以可以有用地使用固体靶 用于生产医用回旋加速器核素。