公开(公告)号：US07098876B2

公开(公告)日：2006-08-29

申请号：US10222909

申请日：2002-08-19

Applicant: Jae-Seok Jeong ,  Tae-Kyong Kwon ,  Nam-Sung Jung ,  Cheol-Hong Kim

Inventor： Jae-Seok Jeong ,  Tae-Kyong Kwon ,  Nam-Sung Jung ,  Cheol-Hong Kim

IPC: G09G3/28

CPC classification number: G09G3/2029 ,  G09G3/2059 ,  G09G3/288 ,  G09G2320/0247 ,  G09G2320/0261 ,  G09G2320/0266 ,  G09G2320/0276

Abstract: An image of each field displayed on a plasma display panel corresponding to input image signals is divided into sub-fields of different weights, the sub-fields being divided into two continuous sub-field groups having a different weighting value, and in which the weighting values of the sub-fields combine to display grays. The method includes generating original grays; determining a diffusion filter value; generating final grays by applying the diffusion filter value to the original grays; generating gray data corresponding to the final grays, the gray data being distributed over the two sub-field groups; and displaying an image on the PDP according to the gray data. The disclosed method and system reduce flicker and contour noise and other display problems associated with the display of 50 Hz Phase Alternating by Line image signals.

Abstract translation: 将与输入图像信号对应的等离子体显示面板上显示的各场的图像划分为不同权重的子场，将该子场分割成具有不同加权值的2个连续子场组， 子域的值组合显示灰度。 该方法包括生成原始灰度; 确定扩散滤波器值; 通过将扩散滤波器值应用于原始灰度来产生最终灰度; 产生对应于最终灰度的灰度数据，灰色数据分布在两个子场组上; 并根据灰度数据在PDP上显示图像。 所公开的方法和系统减少闪烁和轮廓噪声以及与显示50Hz相位逐行图像信号相关联的其他显示问题。

公开(公告)号：US20120092638A1

公开(公告)日：2012-04-19

申请号：US13221360

申请日：2011-08-30

Applicant: Tae-Jin Park ,  Cheol-Hong Kim

Inventor： Tae-Jin Park ,  Cheol-Hong Kim

IPC: G03B27/58

CPC classification number: G03B27/58 ,  G03B27/53 ,  G03F7/70775 ,  G03F9/7088

Abstract: In a method of aligning a wafer stage, the wafer stage may be moved in an X-axis direction. A first coordinate of the wafer stage may be measured from a first measurement position inclined to the X-axis. The wafer stage may be moved in a Y-axis direction. A second coordinate of the wafer stage may be measured from a second measurement position inclined to the Y-axis. Thus, a movement distance of the wafer stage may be increased, so that the interferometers may accurately measure the position of the wafer stage.

Abstract translation: 在对准晶片台的方法中，晶片台可以在X轴方向上移动。 可以从倾斜于X轴的第一测量位置测量晶片台的第一坐标。 晶片载物台可沿Y轴方向移动。 可以从与Y轴倾斜的第二测量位置测量晶片台的第二坐标。 因此，可以增加晶片台的移动距离，使得干涉仪可以精确地测量晶片台的位置。

公开(公告)号：US09230866B2

公开(公告)日：2016-01-05

申请号：US14140775

申请日：2013-12-26

Applicant: Jae-Han Lee ,  Hoo-Sung Cho ,  Cheol-Hong Kim ,  Seung-Hak Park

Inventor： Jae-Han Lee ,  Hoo-Sung Cho ,  Cheol-Hong Kim ,  Seung-Hak Park

IPC: H01L21/027 ,  H01L21/66 ,  H01L21/311 ,  G03F1/70 ,  H01L27/115 ,  G03F1/84

CPC classification number: H01L22/12 ,  G03F1/70 ,  G03F1/84 ,  H01L21/31144 ,  H01L27/11556 ,  H01L27/11582

Abstract: A fabricating method of a customized mask includes forming first patterns in a mold structure, forming second patterns in the mold structure using initial masks, the mold structure having the first patterns formed therein, measuring overlap failure between the first patterns and the second patterns, and fabricating customized masks by compensating for pattern positions of the initial masks based on the measuring results, wherein compensating for the pattern positions of the initial masks includes shifting positions of at least some patterns of the initial masks according to shift directions and sizes of at least some of the first patterns.

Abstract translation: 定制掩模的制造方法包括在模具结构中形成第一图案，使用初始掩模在模具结构中形成第二图案，其中形成有第一图案的模具结构，测量第一图案与第二图案之间的重叠故障，以及 通过基于测量结果补偿初始掩模的图案位置来制造定制掩模，其中补偿初始掩模的图案位置包括根据至少一些的移动方向和尺寸的初始掩模的至少某些图案的移位位置 的第一种模式。

公开(公告)号：US09007567B2

公开(公告)日：2015-04-14

申请号：US13221360

申请日：2011-08-30

Applicant: Tae-Jin Park ,  Cheol-Hong Kim

Inventor： Tae-Jin Park ,  Cheol-Hong Kim

IPC: G03B27/32 ,  G03B27/58 ,  G03B27/53 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03B27/58 ,  G03B27/53 ,  G03F7/70775 ,  G03F9/7088

Abstract: In a method of aligning a wafer stage, the wafer stage may be moved in an X-axis direction. A first coordinate of the wafer stage may be measured from a first measurement position inclined to the X-axis. The wafer stage may be moved in a Y-axis direction. A second coordinate of the wafer stage may be measured from a second measurement position inclined to the Y-axis. Thus, a movement distance of the wafer stage may be increased, so that the interferometers may accurately measure the position of the wafer stage.

Abstract translation: 在对准晶片台的方法中，晶片台可以在X轴方向上移动。 可以从倾斜于X轴的第一测量位置测量晶片台的第一坐标。 晶片载物台可沿Y轴方向移动。 可以从与Y轴倾斜的第二测量位置测量晶片台的第二坐标。 因此，可以增加晶片台的移动距离，使得干涉仪可以精确地测量晶片台的位置。

公开(公告)号：US20050083264A1

公开(公告)日：2005-04-21

申请号：US10942782

申请日：2004-09-17

Applicant: Cheol-Hong Kim

Inventor： Cheol-Hong Kim

IPC: G09F9/313 ,  G09G3/20 ,  G09G3/28 ,  G09G3/288 ,  H01J17/49

CPC classification number: G09G3/2948 ,  G09G3/2018 ,  G09G3/2022 ,  G09G3/2037 ,  G09G3/2062 ,  G09G2320/0238

Abstract: A method of driving a flat-panel display, to which k bits of gray-scale data consisting of first through j-th bits, each having a low weighted value, and (j+1)-th through k-th bits, each having a high weighted value, are input during each frame. The method includes time-dividing a unit frame into a plurality of sub-fields, displaying the first through j-th bits (j is an integer greater than 2) of the gray-scale data by a plurality of frames and displaying the (j+1)-th through k-th bits (k is an integer greater than 4) of the gray scale data by the plurality of sub-fields.

Abstract translation: 一种驱动平板显示器的方法，每个具有低加权值的第一至第j位的第k位灰度数据和第（j + 1）至第k位， 在每个帧期间输入具有高加权值。 该方法包括将单位帧时分为多个子场，通过多个帧显示灰度数据的第一至第j位（j大于2的整数），并显示（j +1个第k个比特（k是大于4的整数）的多个子场的灰度数据。