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    Process for production of synthetic quartz glass
    3.
    发明授权
    Process for production of synthetic quartz glass 有权
    合成石英玻璃生产工艺

    公开(公告)号：US08240172B2

    公开(公告)日：2012-08-14

    申请号：US13080704

    申请日：2011-04-06

    申请人： Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

    发明人： Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

    IPC分类号： C03B37/018

    CPC分类号： C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/42

    摘要： The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F2) or a mixed gas comprising elemental fluorine (F2) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.

    摘要翻译： 本发明涉及一种氟浓度为1000质量ppm以上的合成石英玻璃的制造方法，其特征在于，包括：（a）沉积和生长通过玻璃成形的火焰水解得到的石英玻璃微粒子的工序 原料在基板上，从而形成多孔玻璃体; （b）将多孔玻璃体保持在填充有元素氟（F2）的反应容器或包含用惰性气体稀释的元素氟（F2）的混合气体并含有固体金属氟化物的步骤，从而获得 含氟多孔玻璃体; 和（c）将含氟多孔质玻璃体加热至透明玻璃化温度的步骤，得到含氟透明玻璃体。

    METHOD FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS
    4.
    发明申请
    METHOD FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS 审中-公开
    合成石英玻璃的生产方法

    公开(公告)号：US20110239707A1

    公开(公告)日：2011-10-06

    申请号：US13078427

    申请日：2011-04-01

    申请人： Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

    发明人： Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

    IPC分类号： C03B20/00

    CPC分类号： C03B19/1461 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/42

    摘要： The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F2)-containing atmosphere of a pressure of Pb1 and a temperature of 400° C. or lower, and followed by maintaining in the reaction vessel under condition of a pressure Pb2 lower than the pressure Pb1 and a temperature of 400° C. or lower, to thereby obtain a fluorine-containing porous glass body; and (c) heating the fluorine-containing porous glass body in a vitrification furnace to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.

    摘要翻译： 本发明涉及一种氟浓度为1000质量ppm以上的合成石英玻璃的制造方法，其特征在于，包括以下工序（a）〜（c）：（a）沉积和生长石英玻璃微粒，其由 将玻璃形成材料火焰水解成基材，从而形成多孔玻璃体; （b）在Pb1的压力和温度为400℃以下的元素含氟（F2）的气氛下，将多孔玻璃体保持在反应容器中，然后在反应容器的保持条件 压力Pb2低于压力Pb1，温度为400℃以下，得到含氟多孔玻璃体; 和（c）将玻璃化炉中的含氟多孔质玻璃体加热至透明玻璃化温度，得到含氟透明玻璃体。

    Method for treating surface of oxide glass with fluorinating agent
    6.
    发明授权
    Method for treating surface of oxide glass with fluorinating agent 有权
    用氟化剂处理氧化物玻璃表面的方法

    公开(公告)号：US08656735B2

    公开(公告)日：2014-02-25

    申请号：US12640199

    申请日：2009-12-17

    申请人： Chikaya Tamitsuji ,  Kunio Watanabe

    发明人： Chikaya Tamitsuji ,  Kunio Watanabe

    IPC分类号： C03C15/00

    CPC分类号： G02B1/18 ,  C03C3/06 ,  C03C15/00 ,  C03C21/007 ,  C03C2201/12 ,  C03C2203/54 ,  C03C2204/08 ,  G02B1/105 ,  G02B1/12

    摘要： To provide a novel fluorination treatment method whereby the surface of oxide glass can be treated for fluorination at low cost and with excellent adhesiveness.A method for treating the surface of oxide glass, which comprises contacting the surface of oxide glass with a gas of a fluorinating agent or a mixed gas having a fluorinating agent diluted with an inert gas, wherein the fluorinating agent is an elemental fluorine, or a fluorine compound capable of cleaving a bond between an oxygen atom and a metal atom in the framework of the oxide glass and forming a bond between a fluorine atom and the metal atom; and the concentration of hydrogen fluoride at the surface of oxide glass with which the fluorinating agent is in contact, is controlled to be at most 1 mol %.

    摘要翻译： 为了提供一种新颖的氟化处理方法，可以将氧化物玻璃的表面以低成本和优异的粘合性处理氟化。 一种处理氧化物玻璃表面的方法，包括使氧化物玻璃的表面与氟化剂的气体或具有用惰性气体稀释的氟化剂的混合气体接触，其中氟化剂是元素氟，或 氟化合物，其能够在氧化物玻璃的骨架中切割氧原子和金属原子之间的键，并在氟原子和金属原子之间形成键; 并且与氟化剂接触的氧化物玻璃表面的氟化氢浓度控制在1摩尔％以下。

    METHOD FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS
    7.
    发明申请
    METHOD FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS 审中-公开
    合成石英玻璃的生产方法

    公开(公告)号：US20110239706A1

    公开(公告)日：2011-10-06

    申请号：US13078426

    申请日：2011-04-01

    申请人： Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

    发明人： Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

    IPC分类号： C03B20/00

    CPC分类号： C03B19/1461 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/42

    摘要： The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following processes steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F2)-containing atmosphere of 400° C. or lower, to thereby obtain a fluorine-containing porous glass body; and (c) heating the fluorine-containing porous glass body in a vitrification furnace to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body, wherein, in step (b), elemental fluorine (F2) is continuously or intermittently supplied to the reaction vessel and the gas in the reaction vessel is continuously or intermittently discharged from the reaction vessel.

    摘要翻译： 本发明涉及氟浓度为1000质量ppm以上的合成石英玻璃的制造方法，其特征在于，包括以下工序（a）〜（c）：（a）沉积并生长获得的石英玻璃微粒 通过将玻璃形成材料火焰水解成基材，从而形成多孔玻璃体; （b）在400℃以下的元素含氟（F2）的气氛下将多孔玻璃体保持在反应容器中，得到含氟多孔玻璃体; （c）将玻璃化炉中的含氟多孔质玻璃体加热至透明玻璃化温度，得到含氟透明玻璃体，其中，在步骤（b）中，元素氟（F2）连续或间歇地 供给反应容器，反应容器内的气体从反应容器连续地或间歇地排出。

    Method for production of an ethylene/tetrafluorideethylene copolymer molded product
    9.
    发明授权
    Method for production of an ethylene/tetrafluorideethylene copolymer molded product 有权
    乙烯/四氟乙烯共聚物成型体的制造方法

    公开(公告)号：US08043668B2

    公开(公告)日：2011-10-25

    申请号：US12431906

    申请日：2009-04-29

    申请人： Seiji Higashi ,  Chikaya Tamitsuji

    发明人： Seiji Higashi ,  Chikaya Tamitsuji

    IPC分类号： H05H1/24

    CPC分类号： C23C16/401 ,  C08J7/06 ,  C08J2327/18 ,  C23C16/509

    摘要： Provided is a method for depositing a fluorine-doped silicon oxide film on the surface of a substrate made of a material comprising at least 50 mass % of an ethylene/tetrafluoroethylene copolymer. This method comprises flowing a mixed gas into between electrodes, exposing the mixed gas to electric power applied between the electrodes so that the electrical power density between the electrodes becomes from 0.5 to 1.1 W/cm3 to cause discharge, and forming plasma of the mixed gas and depositing the fluorine-doped silicon oxide film on the surface of the substrate. In this method, the mixed gas for forming the fluorine-doped silicon oxide film comprises silicon tetrafluoride, oxygen and a hydrocarbon, the atomic ratio of oxygen atoms to carbon atoms (O/C) is from 1 to 10, and the atomic ratio of oxygen atoms to silicon atoms (O/Si) is from 1.7 to 25 in the mixed gas.

    摘要翻译： 提供一种在由包括至少50质量％的乙烯/四氟乙烯共聚物的材料制成的基板的表面上沉积氟掺杂的氧化硅膜的方法。 该方法包括将混合气体流入电极之间，将混合气体暴露于施加在电极之间的电力，使得电极之间的电功率密度变为0.5〜1.1W / cm 3，进行放电，形成混合气体的等离子体 以及在衬底的表面上沉积氟掺杂的氧化硅膜。 在该方法中，用于形成氟掺杂氧化硅膜的混合气体包括四氟化硅，氧和烃，氧原子与碳原子的原子比（O / C）为1〜10，原子比 氧原子与硅原子（O / Si）在混合气体中为1.7〜25。

    FLUOROCARBON FILM AND PROCESS FOR ITS PRODUCTION
    10.
    发明申请
    FLUOROCARBON FILM AND PROCESS FOR ITS PRODUCTION 审中-公开
    荧光膜及其生产工艺

    公开(公告)号：US20070202340A1

    公开(公告)日：2007-08-30

    申请号：US11743260

    申请日：2007-05-02

    申请人： Chikaya Tamitsuji ,  Seiji Higashi ,  Shin Tatematsu ,  Satoshi Oki

    发明人： Chikaya Tamitsuji ,  Seiji Higashi ,  Shin Tatematsu ,  Satoshi Oki

    IPC分类号： B32B27/00 ,  B32B27/16

    CPC分类号： B05D3/142 ,  B05D1/62 ,  B05D5/083 ,  C08J7/123 ,  C23C16/26 ,  C23C16/30 ,  Y10T428/3154

    摘要： To provide a process for producing a fluorocarbon film, which is capable of constantly forming a fluorocarbon film excellent in durability and functionality. The process for producing a fluorocarbon film of the present invention is a process for producing a fluorocarbon film at least a part of which is chemically bonded to a substrate surface, and is characterized by conducting, in sequence, step (a) for applying plasma to a substrate surface in a continuous or pulse manner to form active points on the substrate surface and step (b) for applying plasma to the substrate surface in a continuous or pulse manner in the presence of a gas of a fluorocompound represented by the formula CxFy and/or CxFyOz under such a condition that active species impinge on the substrate surface at a relatively lower collision energy than in step (a).

    摘要翻译： 提供能够不断形成耐久性和功能性优异的碳氟化合物膜的碳氟化合物膜的制造方法。 本发明的氟碳膜的制造方法是将氟化碳膜的至少一部分与基材表面进行化学键合的制造方法，其特征在于，依次进行将等离子体施加的步骤（a） 基板表面，以连续或脉冲的方式在基板表面上形成有效点，并且步骤（b）用于在存在由式C'表示的氟化合物的气体的情况下以连续或脉冲的方式将等离子体施加到基板表面， 在这种条件下，在这种条件下， 该活性物质以比步骤（a）中相对较低的碰撞能量撞击在基底表面上。