Process for the preparation of mixed parylene dimers free of
alpha-halogens
    1.
    发明授权
    Process for the preparation of mixed parylene dimers free of alpha-halogens 失效
    制备不含α-卤素的混合聚对二甲苯二聚体的方法

    公开(公告)号:US5110903A

    公开(公告)日:1992-05-05

    申请号:US630548

    申请日:1990-12-20

    摘要: A process is provided for the preparation of a mixture of parylene dimers wherein the distribution of dimers within the mixture is predetermined by the proper selection of halogenated and non-halogenated 2,2-paracyclophane starting material. Since the dimers are free of alpha-halogens, the formation of environmentally undesirable acid halides during the deposition of parylene films and coatings is avoided. Since the dimers are useful in the preparation of inert, transparent, conformal coatings of parylene, desirable chemical and/or physical properties can be imparted to such coating by formation of a dimer mixture of a predetermined composition. The parylene film properties, composition and deposition conditions will be different by varying dimer distribution.

    摘要翻译: 提供了一种制备聚对二甲苯二聚体混合物的方法,其中混合物中二聚体的分布通过适当选择卤代和非卤化的2,2-对环烷烃原料预先确定。 由于二聚体不含α-卤素,所以避免了在聚对二甲苯薄膜和涂层沉积期间形成环境不利的酰卤。 由于二聚体可用于制备聚对二甲苯的惰性,透明,保形涂层,因此通过形成预定组成的二聚体混合物可以赋予这种涂层所需的化学和/或物理性能。 聚对二甲苯膜的性质,组成和沉积条件将通过改变二聚体分布而不同。

    Process for the preparation of the parylene dimer
    3.
    发明授权
    Process for the preparation of the parylene dimer 失效
    制备聚对二甲苯二聚体的方法

    公开(公告)号:US4769505A

    公开(公告)日:1988-09-06

    申请号:US74777

    申请日:1987-07-17

    IPC分类号: C07C1/32 C07C2/72 C07C1/00

    CPC分类号: C07C1/323 C07C2103/92

    摘要: An improved process is provided for the preparation of the dimer, 2,2-paracyclophane, which is useful as the starting material for parylene conformal coatings used in the electronics industry for the protection of various sensitive electronic components.The process comprises optimization of the normally low yield of dimer formed by the Hofmann elimination reaction of p-methylbenzyltrimethylammonium hydroxide by conducting the elimination reaction in the presence of a cosolvent and certain reaction promoters.

    Process for the preparation of dichloro-[2,2]paracyclophane
    4.
    发明授权
    Process for the preparation of dichloro-[2,2]paracyclophane 失效
    制备二氯 - [2,2]对环烷酸的方法

    公开(公告)号:US4849559A

    公开(公告)日:1989-07-18

    申请号:US050016

    申请日:1987-05-15

    CPC分类号: C07C17/263

    摘要: A process is provided for the preparation of the dimer, dichloro-[2,2]paracyclophane, which is useful as the starting material for the deposition of conformal parylene coatings employed, for example, in the electronics industry for the protection of various sensitive electronic components.The process avoids the normally low yields of chlorinated dimer formed by the chlorination of 2,2-paracyclophane and instead utilizes the Hofmann elimination of 2(3)-chloro-p-methylbenzyltrimethylammonium hydroxide by conducting the elimination reaction under carefully controlled conditions of reaction temperature and profile, reaction feed configuration, water concentration in the reactor and the use of a cosolvent, certain reaction promoters, or a combination thereof.

    Aminopolyol stabilizers
    6.
    发明授权
    Aminopolyol stabilizers 失效
    氨基多酚稳定剂

    公开(公告)号:US4906723A

    公开(公告)日:1990-03-06

    申请号:US276747

    申请日:1988-11-28

    摘要: A method is described for producing dispersions of polyurea and the like in polyols of increased stability by polymerizing an amine and an isocyanate in the presence of an aminoalcohol, typically an aminopolyol, having the following formula: ##STR1## wherein A and A' are individually connective atoms which may be same or different, and are selected from the group consisting of carbon and oxygen or combinations thereof with hydrogen atoms or the like satisfying the valences; B is a member selected from the group consisting of nitrogen, NR, R being alkyl or aryl, or CR', R' being hydrogen, alkyl or aryl; D is a member selected from the group consisting of ##STR2## wherein a has a value of one to four; X is a member selected from the group consisting of OH, NH.sub.2 or H; X' is a member selected from the group consisting of H or NHR' where R' is hydrogen, alkyl or aryl; n and d are individually integers of 0 to 10 and the sum of n and d is at least one and does not exceed 10; s is either 0 or 1; y is an integer of 0 to 4; and m is an integer of at least about 16, with the proviso that when B is nitrogen and either n or d is zero, X and X' are not both H. The dispersions are useful for the production of polyurethane foams.

    Chemical reaction suppression system
    7.
    发明授权
    Chemical reaction suppression system 失效
    化学反应抑制系统

    公开(公告)号:US5387619A

    公开(公告)日:1995-02-07

    申请号:US93308

    申请日:1993-07-16

    摘要: A process for inhibiting chemical reactions of a fluid functionally reactive organic material by mixing it with supercritical fluid ("SCF") or near supercritical fluid, especially carbon dioxide maintained under supercritical fluid conditions. The process includes the ability to restrain a chemical reaction that occurs otherwise between functionally compatible organic molecules by the inclusion of supercritical fluid, particularly CO.sub.2, with the molecules, so that the reaction can be made to occur according to a predetermined but different from normal pattern.

    摘要翻译: 通过将流体功能反应性有机材料与超临界流体(“SCF”)或接近超临界流体,特别是在超临界流体条件下保持的二氧化碳混合来抑制流体功能反应性有机材料的化学反应的方法。 该方法包括通过将超临界流体(特别是CO 2)与分子相结合来限制在功能相容的有机分子之间发生的化学反应的能力,使得可以根据预定但不同于正常模式进行反应 。