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    Illumination apparatus and a method of assembling the illumination apparatus
    1.
    发明授权
    Illumination apparatus and a method of assembling the illumination apparatus 有权
    照明装置和照明装置的组装方法

    公开(公告)号：US08664838B2

    公开(公告)日：2014-03-04

    申请号：US13989483

    申请日：2011-12-08

    申请人： Chuan Yuan ,  Xiaoqing Duan ,  Yan Xiong

    发明人： Chuan Yuan ,  Xiaoqing Duan ,  Yan Xiong

    IPC分类号： H01J1/02

    CPC分类号： F21V29/20 ,  F21K9/00 ,  F21V17/00 ,  F21V29/67 ,  F21V29/677 ,  F21V29/70 ,  F21V29/85 ,  F21Y2115/10 ,  Y10T29/49826

    摘要： The invention provides an illumination apparatus (10) and a method of assembling the illumination apparatus. The illumination apparatus comprises a light source (101) having a plurality of LED arrays, wherein at least two of the plurality of LED arrays have different lumen degradations as a function of junction temperature of the respective LED arrays; and a heat dissipation unit (102) configured to be capable of dissipating heat generated by the light source, wherein the heat dissipation unit is mounted on a first surface of the light source in such a way that there is a gap between the first surface and the heat dissipation unit when the light source is not in operation, and the gap is narrowed or can be deemed to disappear when the light source reaches a preset temperature, so that the heat dissipation efficiency of the heat dissipation unit is improved.

    摘要翻译： 本发明提供一种照明装置（10）和组装照明装置的方法。 所述照明装置包括具有多个LED阵列的光源（101），其中所述多个LED阵列中的至少两个LED阵列具有作为各个LED阵列的结温的函数的不同的流明退化; 以及散热单元（102），其能够散发由所述光源产生的热量，其中所述散热单元以所述第一表面和所述第一表面之间存在间隙的方式安装在所述光源的第一表面上， 当光源不工作时的散热单元，并且当光源达到预设温度时间隙变窄或可以认为消失，从而提高了散热单元的散热效率。

    ILLUMINATION APPARATUS AND A METHOD OF ASSEMBLING THE ILLUMINATION APPARATUS
    2.
    发明申请
    ILLUMINATION APPARATUS AND A METHOD OF ASSEMBLING THE ILLUMINATION APPARATUS 有权
    照明装置和组装照明装置的方法

    公开(公告)号：US20130257261A1

    公开(公告)日：2013-10-03

    申请号：US13989483

    申请日：2011-12-08

    申请人： Chuan Yuan ,  Xiaoqing Duan ,  Yan Xiong

    发明人： Chuan Yuan ,  Xiaoqing Duan ,  Yan Xiong

    IPC分类号： F21V29/00 ,  F21V17/00

    CPC分类号： F21V29/20 ,  F21K9/00 ,  F21V17/00 ,  F21V29/67 ,  F21V29/677 ,  F21V29/70 ,  F21V29/85 ,  F21Y2115/10 ,  Y10T29/49826

    摘要： The invention provides an illumination apparatus (10) and a method of assembling the illumination apparatus. The illumination apparatus comprises a light source (101) having a plurality of LED arrays, wherein at least two of the plurality of LED arrays have different lumen degradations as a function of junction temperature of the respective LED arrays; and a heat dissipation unit (102) configured to be capable of dissipating heat generated by the light source, wherein the heat dissipation unit is mounted on a first surface of the light source in such a way that there is a gap between the first surface and the heat dissipation unit when the light source is not in operation, and the gap is narrowed or can be deemed to disappear when the light source reaches a preset temperature, so that the heat dissipation efficiency of the heat dissipation unit is improved.

    摘要翻译： 本发明提供一种照明装置（10）和组装照明装置的方法。 所述照明装置包括具有多个LED阵列的光源（101），其中所述多个LED阵列中的至少两个LED阵列具有作为各个LED阵列的结温的函数的不同的流明退化; 以及散热单元（102），其能够散发由所述光源产生的热量，其中所述散热单元以所述第一表面和所述第一表面之间存在间隙的方式安装在所述光源的第一表面上， 当光源不工作时的散热单元，并且当光源达到预设温度时间隙变窄或可以认为消失，从而提高了散热单元的散热效率。

    Methods and systems for generating an inspection process for a wafer
    5.
    发明授权
    Methods and systems for generating an inspection process for a wafer 有权
    用于产生晶片检查过程的方法和系统

    公开(公告)号：US08112241B2

    公开(公告)日：2012-02-07

    申请号：US12403905

    申请日：2009-03-13

    申请人： Yan Xiong

    发明人： Yan Xiong

    IPC分类号： G01R27/28 ,  G06K9/00

    CPC分类号： G01N21/9501 ,  G01N2021/8854

    摘要： Methods and systems for generating an inspection process for a wafer are provided. One computer-implemented method includes separately determining a value of a local attribute for different locations within a design for a wafer based on a defect that can cause at least one type of fault mechanism at the different locations. The method also includes determining a sensitivity with which defects will be reported for different locations on the wafer corresponding to the different locations within the design based on the value of the local attribute. In addition, the method includes generating an inspection process for the wafer based on the determined sensitivity. Groups may be generated based on the value of the local attribute thereby assigning pixels that will have at least similar noise statistics to the same group, which can be important for defect detection algorithms. Better segmentation may lead to better noise statistics estimation.

    摘要翻译： 提供了用于产生晶片检查过程的方法和系统。 一种计算机实现的方法包括基于可能在不同位置处引起至少一种类型的故障机制的缺陷单独地确定用于晶片的设计中不同位置的局部属性的值。 该方法还包括基于局部属性的值来确定对于与设计中的不同位置相对应的晶片上的不同位置将报告缺陷的灵敏度。 另外，该方法包括基于所确定的灵敏度产生晶片的检查处理。 可以基于本地属性的值生成组，从而将具有至少相似噪声统计的像素分配给同一组，这对缺陷检测算法可能是重要的。 更好的分割可以导致更好的噪声统计估计。

    Process Excursion Detection
    6.
    发明申请
    Process Excursion Detection 审中-公开
    过程偏移检测

    公开(公告)号：US20100067781A1

    公开(公告)日：2010-03-18

    申请号：US12626021

    申请日：2009-11-25

    申请人： Patrick Y. Huet ,  Robinson Piramuthu ,  Martin Plihal ,  Christopher W. Lee ,  Cho H. Teh ,  Yan Xiong

    发明人： Patrick Y. Huet ,  Robinson Piramuthu ,  Martin Plihal ,  Christopher W. Lee ,  Cho H. Teh ,  Yan Xiong

    IPC分类号： G06K9/00

    CPC分类号： G01N21/8851 ,  G01N21/9501 ,  G01N2021/8854 ,  G01N2021/8864 ,  G06T7/0004 ,  G06T2207/30148

    摘要： A method for analyzing defect information on a substrate, including logically dividing the substrate into zones, and detecting defects on the substrate to produce the defect information. The defect information from the substrate is analyzed on a zone by zone basis to produce defect level classifications for the defects within each zone. The zonal defect level classifications are analyzed according to at least one analysis method. The defect level classifications are preferably selected from a group of defect level classifications that is specified by a recipe. Preferably, the at least one analysis method includes at least one of zonal defect distribution, automatic defect classification, spatial signature analysis, and excursion detection. The defect level classifications preferably include at least one of individual defect, defect cluster, and spatial signature analysis signature. In one embodiment the defect information is logically divided into configurable zones after the defects on the substrate have been detected.

    摘要翻译： 一种用于分析衬底上的缺陷信息的方法，包括将衬底逻辑划分为区域，以及检测衬底上的缺陷以产生缺陷信息。 在逐个区域的基础上分析来自基板的缺陷信息，以产生每个区域内的缺陷的缺陷水平分类。 根据至少一种分析方法分析区域缺陷水平分类。 缺陷级分类优选地从由食谱指定的一组缺陷级别分类中选择。 优选地，所述至少一个分析方法包括区域缺陷分布，自动缺陷分类，空间签名分析和偏移检测中的至少一个。 缺陷级分类优选地包括个体缺陷，缺陷簇和空间签名分析签名中的至少一个。 在一个实施例中，在检测到衬底上的缺陷之后，将缺陷信息在逻辑上划分为可配置区域。

    Housing of electronic product
    7.
    发明申请
    Housing of electronic product 审中-公开
    电子产品住房

    公开(公告)号：US20060215361A1

    公开(公告)日：2006-09-28

    申请号：US11262529

    申请日：2005-10-27

    申请人： Yung-Chi Yang ,  Yan Xiong

    发明人： Yung-Chi Yang ,  Yan Xiong

    IPC分类号： H05K7/20

    CPC分类号： G06F1/203

    摘要： A housing of electronic product includes an accommodating space and at least one heat dissipating opening, wherein the heat dissipating opening is formed on an upper surface of the housing so as to allow a heat dissipating device received in the accommodating space to dissipate heat generated by operation of electronic components received in the accommodating space to improve heat dissipating efficiency.

    摘要翻译： 电子产品的壳体包括容纳空间和至少一个散热开口，其中散热开口形成在壳体的上表面上，以便允许容纳在容纳空间中的散热装置散发由操作产生的热量 的电子部件容纳在容纳空间中以提高散热效率。

    Method and system for transferring time division multiplexing service data
    8.
    发明授权
    Method and system for transferring time division multiplexing service data 有权
    传输时分复用业务数据的方法和系统

    公开(公告)号：US08107415B2

    公开(公告)日：2012-01-31

    申请号：US11592489

    申请日：2006-11-02

    申请人： Yan Xiong ,  Jun Zhao ,  Wanwan Wang

    发明人： Yan Xiong ,  Jun Zhao ,  Wanwan Wang

    IPC分类号： H04W4/00

    CPC分类号： H04J3/1694 ,  H04J3/0682

    摘要： The present invention discloses a method and system for transferring TDM services in GPON, the method includes the steps of: in the case of performing the GPON ranging process, buffering the uplink TDM service data received by an optical signal transceiver in an Input Buffer, reading out and transferring the uplink TDM service data buffered in an Output Buffer. The present invention eliminates the possible interruption of TDM services during the GPON ranging process by buffering the uplink services at the OLT and ONU/ONT side and relevant processes, and therefore realizes the TDM service transmission without any loss during the GPON system ranging process.

    摘要翻译： 本发明公开了一种在GPON中传输TDM业务的方法和系统，该方法包括以下步骤：在执行GPON测距过程的情况下，缓存由光信号收发器在输入缓冲器中接收的上行TDM业务数据， 输出并传送缓冲在输出缓冲器中的上行TDM业务数据。 本发明通过在OLT和ONU / ONT侧缓存上行链路业务和相关过程，消除了GPON测距过程中TDM业务可能的中断，从而在GPON系统测距过程中实现了TDM业务传输，没有任何损失。

    Process Excursion Detection
    9.
    发明申请
    Process Excursion Detection 有权
    过程偏移检测

    公开(公告)号：US20110137576A1

    公开(公告)日：2011-06-09

    申请号：US13024471

    申请日：2011-02-10

    申请人： Patrick Y. Huet ,  Robinson Piramuthu ,  Martin Plihal ,  Christopher W. Lee ,  Cho H. Teh ,  Yan Xiong

    发明人： Patrick Y. Huet ,  Robinson Piramuthu ,  Martin Plihal ,  Christopher W. Lee ,  Cho H. Teh ,  Yan Xiong

    IPC分类号： G06F19/00

    CPC分类号： G01N21/8851 ,  G01N21/9501 ,  G01N2021/8854 ,  G01N2021/8864 ,  G06T7/0004 ,  G06T2207/30148

    摘要： A method for analyzing defect information on a substrate, including logically dividing the substrate into zones, and detecting defects on the substrate to produce the defect information. The defect information from the substrate is analyzed on a zone by zone basis to produce defect level classifications for the defects within each zone. The zonal defect level classifications are analyzed according to at least one analysis method. The defect level classifications are preferably selected from a group of defect level classifications that is specified by a recipe. Preferably, the at least one analysis method includes at least one of zonal defect distribution, automatic defect classification, spatial signature analysis, and excursion detection. The defect level classifications preferably include at least one of individual defect, defect cluster, and spatial signature analysis signature. In one embodiment the defect information is logically divided into configurable zones after the defects on the substrate have been detected.

    摘要翻译： 一种用于分析衬底上的缺陷信息的方法，包括将衬底逻辑划分为区域，以及检测衬底上的缺陷以产生缺陷信息。 在逐个区域的基础上分析来自基板的缺陷信息，以产生每个区域内的缺陷的缺陷水平分类。 根据至少一种分析方法分析区域缺陷水平分类。 缺陷级分类优选地从由食谱指定的一组缺陷级别分类中选择。 优选地，所述至少一个分析方法包括区域缺陷分布，自动缺陷分类，空间签名分析和偏移检测中的至少一个。 缺陷级分类优选地包括个体缺陷，缺陷簇和空间签名分析签名中的至少一个。 在一个实施例中，在检测到衬底上的缺陷之后，将缺陷信息在逻辑上划分为可配置区域。

    Process excursion detection
    10.
    发明授权
    Process excursion detection 有权
    过程偏移检测

    公开(公告)号：US07646476B2

    公开(公告)日：2010-01-12

    申请号：US12117823

    申请日：2008-05-09

    申请人： Patrick Y. Huet ,  Robinson Piramuthu ,  Martin Plihal ,  Christopher W. Lee ,  Cho H. Teh ,  Yan Xiong

    发明人： Patrick Y. Huet ,  Robinson Piramuthu ,  Martin Plihal ,  Christopher W. Lee ,  Cho H. Teh ,  Yan Xiong

    IPC分类号： G01N21/00

    CPC分类号： G01N21/8851 ,  G01N21/9501 ,  G01N2021/8854 ,  G01N2021/8864 ,  G06T7/0004 ,  G06T2207/30148

    摘要： A method for analyzing defect information on a substrate, including logically dividing the substrate into zones, and detecting defects on the substrate to produce the defect information. The defect information from the substrate is analyzed on a zone by zone basis to produce defect level classifications for the defects within each zone. The zonal defect level classifications are analyzed according to at least one analysis method. The defect level classifications are preferably selected from a group of defect level classifications that is specified by a recipe. Preferably, the at least one analysis method includes at least one of zonal defect distribution, automatic defect classification, spatial signature analysis, and excursion detection. The defect level classifications preferably include at least one of individual defect, defect cluster, and spatial signature analysis signature. In one embodiment the defect information is logically divided into configurable zones after the defects on the substrate have been detected.

    摘要翻译： 一种用于分析衬底上的缺陷信息的方法，包括将衬底逻辑划分为区域，以及检测衬底上的缺陷以产生缺陷信息。 在逐个区域的基础上分析来自基板的缺陷信息，以产生每个区域内的缺陷的缺陷水平分类。 根据至少一种分析方法分析区域缺陷水平分类。 缺陷级分类优选地从由食谱指定的一组缺陷级别分类中选择。 优选地，所述至少一个分析方法包括区域缺陷分布，自动缺陷分类，空间签名分析和偏移检测中的至少一个。 缺陷级分类优选地包括个体缺陷，缺陷簇和空间签名分析签名中的至少一个。 在一个实施例中，在检测到衬底上的缺陷之后，将缺陷信息在逻辑上划分为可配置区域。