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    METHODS FOR REPAIRING PATTERNED STRUCTURES OF ELECTRONIC DEVICES
    3.
    发明申请
    METHODS FOR REPAIRING PATTERNED STRUCTURES OF ELECTRONIC DEVICES 审中-公开
    修复电子设备图案结构的方法

    公开(公告)号：US20080099429A1

    公开(公告)日：2008-05-01

    申请号：US11828321

    申请日：2007-07-25

    申请人： Chao-Kai Cheng ,  Chieh-Yi Huang ,  Wan-Wen Chiu ,  Chun-Hung Lin ,  Chia-Chang Chang

    发明人： Chao-Kai Cheng ,  Chieh-Yi Huang ,  Wan-Wen Chiu ,  Chun-Hung Lin ,  Chia-Chang Chang

    IPC分类号： H01B13/00

    CPC分类号： G02B5/201 ,  G03F7/0007 ,  G03F7/405

    摘要： Methods for repairing patterned structure of electronic devices. A first substrate with a patterned structure thereon is provided, wherein the patterned structure includes at least one defect. The defect corresponds to a defect region while the patterned structure corresponds to a main region. A first surface treatment is performed on the defect region such that the surface characteristics on the defect region are different from those on the main region. The defect region is repaired by inkjet printing. A second surface treatment is performed on the defect region such that the surface characteristics on the defect region are the same as those on the main region.

    摘要翻译： 修复电子设备图案化结构的方法。 提供其上具有图案化结构的第一衬底，其中所述图案化结构包括至少一个缺陷。 缺陷对应于缺陷区域，而图案化结构对应于主要区域。 对缺陷区域进行第一表面处理，使得缺陷区域上的表面特性与主区域上的表面特性不同。 缺陷区域通过喷墨印刷修复。 对缺陷区域进行第二表面处理，使得缺陷区域上的表面特性与主区域上的表面特性相同。

    Plasma deposition apparatus and deposition method utilizing same
    4.
    发明授权
    Plasma deposition apparatus and deposition method utilizing same 有权
    等离子体沉积设备及其沉积方法

    公开(公告)号：US08281741B2

    公开(公告)日：2012-10-09

    申请号：US13019269

    申请日：2011-02-01

    申请人： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Shin-Chih Liaw ,  Chun-Hung Lin

    发明人： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Shin-Chih Liaw ,  Chun-Hung Lin

    IPC分类号： C23C16/455 ,  C23C16/452 ,  C23C16/50 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06 ,  C23C16/22

    CPC分类号： C23C16/402 ,  C23C16/345 ,  C23C16/45563 ,  C23C16/45595 ,  C23C16/513

    摘要： A plasma deposition apparatus is provided. The plasma deposition apparatus comprises a chamber. A pedestal is placed in the chamber. A plasma generator is placed in the chamber and over the pedestal. The plasma generator comprises a plasma jet for plasma thin film deposition having a discharge direction angle θ1 larger than 0° and less than 90° between a normal direction of the pedestal and the discharge direction of the plasma jet. A gas-extracting pipe extends into the chamber and over the pedestal. The gas-extracting pipe provides a pumping path for particles and side-products having a pumping direction angle θ2 larger than 0° and less than 90° between the normal direction of the pedestal and the pumping direction of the gas-extracting pipe. The chamber is kept at an ambient atmospheric pressure.

    摘要翻译： 提供了一种等离子体沉积装置。 等离子体沉积设备包括一个室。 底座放置在腔室中。 等离子体发生器放置在腔室中并在基座上方。 等离子体发生器包括用于等离子体薄膜沉积的等离子体射流，其具有放电方向角度θ;在基座的法线方向与等离子体射流的排出方向之间大于0°且小于90°的1。 气体提取管延伸到腔室中并且在基座上。 气体提取管为具有泵送方向角度的颗粒和副产物提供泵送路径; 2在基座的法线方向与气体提取管的泵送方向之间大于0°且小于90°。 室保持在环境大气压力。

    Plasma deposition apparatus and deposition method utilizing same
    5.
    发明授权
    Plasma deposition apparatus and deposition method utilizing same 有权
    等离子体沉积设备及其沉积方法

    公开(公告)号：US07923076B2

    公开(公告)日：2011-04-12

    申请号：US11644861

    申请日：2006-12-21

    申请人： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Shin-Chih Liaw ,  Chun-Hung Lin

    发明人： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Shin-Chih Liaw ,  Chun-Hung Lin

    IPC分类号： H05H1/24 ,  C23C16/00

    CPC分类号： C23C16/402 ,  C23C16/345 ,  C23C16/45563 ,  C23C16/45595 ,  C23C16/513

    摘要： A plasma deposition apparatus is provided. The plasma deposition apparatus comprises a chamber. A pedestal is placed in the chamber. A plasma generator is placed in the chamber and over the pedestal. The plasma generator comprises a plasma jet for plasma thin film deposition having a discharge direction angle θ1 of 0° to 90° between a normal direction of the pedestal and the discharge direction of the plasma jet. A gas-extracting apparatus is placed in the chamber and over the pedestal. The gas-extracting apparatus comprises a gas-extracting pipe providing a pumping path for particles and side-products having a pumping direction angle θ2 of 0° to 90° between the normal direction of the pedestal and the pumping direction of the gas-extracting pipe.

    摘要翻译： 提供了一种等离子体沉积装置。 等离子体沉积设备包括一个室。 底座放置在腔室中。 等离子体发生器放置在腔室中并在基座上方。 等离子体发生器包括用于等离子体薄膜沉积的等离子体射流，其具有在基座的法线方向与等离子体射流的排出方向之间的0°至90°之间的放电方向角度θ。 气体提取装置放置在腔室中并且在基座上方。 气体提取装置包括：气体提取管，其提供用于颗粒的泵送路径和具有泵送方向角度的副产物;在基座的法线方向和气体提取装置的泵送方向之间为0°至90°的2°; 抽管。

    Film removal method and apparatus
    6.
    发明授权
    Film removal method and apparatus 有权
    薄膜去除方法和装置

    公开(公告)号：US07507313B2

    公开(公告)日：2009-03-24

    申请号：US11527443

    申请日：2006-09-27

    申请人： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Chen-Der Tsai ,  Chun-Hung Lin

    发明人： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Chen-Der Tsai ,  Chun-Hung Lin

    IPC分类号： C23F1/00 ,  H01L21/306

    CPC分类号： H01J37/32825 ,  G02F1/1303 ,  G02F2001/1316 ,  G03F7/427 ,  H01J37/32366 ,  H01J37/32623 ,  H05H2001/3463

    摘要： A film removal method and apparatus for removing a film from a substrate are disclosed. The method comprises the steps of disposing a plasma generator and a sucking apparatus over the substrate, projecting a plasma beam from the plasma generator onto the film obliquely, disposing the sucking apparatus on a reflection path of plasma projected by the plasma generator, and sucking a by-product of an incomplete plasma reaction occurring to the film so as to keep a surface of the substrate clean, with a view to overcoming the drawbacks of deposition of the by-product which results from using the plasma as a surface cleansing means under atmospheric conditions.

    摘要翻译： 公开了一种从基板上去除膜的膜去除方法和装置。 该方法包括以下步骤：将等离子体发生器和吸附装置设置在衬底上，将等离子体发生器的等离子体束倾斜地投射到膜上，将吸引装置设置在由等离子体发生器投射的等离子体的反射路径上， 为了克服在大气压下使用等离子体作为表面清洁装置产生的副产物沉积的缺点，膜的发生不完全等离子体反应的副产物是保持基板的表面清洁的副产物 条件。

    Film removal method and apparatus
    7.
    发明授权
    Film removal method and apparatus 有权
    薄膜去除方法和装置

    公开(公告)号：US08075790B2

    公开(公告)日：2011-12-13

    申请号：US12078505

    申请日：2008-04-01

    申请人： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Chen-Der Tsai ,  Chun-Hung Lin

    发明人： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Chen-Der Tsai ,  Chun-Hung Lin

    IPC分类号： B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

    CPC分类号： H01J37/32825 ,  G02F1/1303 ,  G02F2001/1316 ,  G03F7/427 ,  H01J37/32366 ,  H01J37/32623 ,  H05H2001/3463

    摘要： A film removal method and apparatus for removing a film from a substrate are disclosed. The method comprises the steps of disposing a plasma generator and a sucking apparatus over the substrate, projecting a plasma beam from the plasma generator onto the film obliquely, disposing the sucking apparatus on a reflection path of plasma projected by the plasma generator, and sucking a by-product of an incomplete plasma reaction occurring to the film so as to keep a surface of the substrate clean, with a view to overcoming the drawbacks of deposition of the by-product which results from using the plasma as a surface cleansing means under atmospheric conditions.

    摘要翻译： 公开了一种从基板上去除膜的膜去除方法和装置。 该方法包括以下步骤：将等离子体发生器和吸附装置设置在衬底上，将等离子体发生器的等离子体束倾斜地投射到膜上，将吸引装置设置在由等离子体发生器投射的等离子体的反射路径上， 为了克服在大气压下使用等离子体作为表面清洁装置产生的副产物沉积的缺点，膜的发生不完全等离子体反应的副产物是保持基板的表面清洁的副产物 条件。

    Water-Repellent Structure and Method for Making the Same
    9.
    发明申请
    Water-Repellent Structure and Method for Making the Same 审中-公开
    防水结构及其制作方法

    公开(公告)号：US20070148407A1

    公开(公告)日：2007-06-28

    申请号：US11616260

    申请日：2006-12-26

    申请人： Chih-Wei Chen ,  Chun-Hung Lin ,  Tsung-Hui Cheng ,  Chih-Yuan Chen ,  Te-Hui Yang ,  Chen-Der Tsai ,  Chin-Jyi Wu ,  Yun-Chuan Tu ,  Chia-Chiang Chang

    发明人： Chih-Wei Chen ,  Chun-Hung Lin ,  Tsung-Hui Cheng ,  Chih-Yuan Chen ,  Te-Hui Yang ,  Chen-Der Tsai ,  Chin-Jyi Wu ,  Yun-Chuan Tu ,  Chia-Chiang Chang

    IPC分类号： G11B5/64

    CPC分类号： B05D5/086 ,  B05D1/62 ,  Y10T428/24355

    摘要： A water-repellent structure and a method for fabricating the same are provided. The method adopts an atmospheric pressure plasma deposition (APPD) technique to form a hardened coating having a rough surface on a substrate, and form a water-repellent coating on the rough surface. Because the water-repellent structure includes the hardened coating and the water-repellent coating, hardness, abrasion-resistance, transparency and hydrophobicity of the water-repellent structure are improved. The hard water-repellent structure protects the substrate from friction. Moreover, because the present invention adopts the APPD technique to form the water-repellent structure, the cost of production is reduced dramatically. Thus, the present invention can solve drawbacks of prior art.

    摘要翻译： 提供了一种拒水结构及其制造方法。 该方法采用大气压等离子体沉积（APPD）技术，在基体上形成具有粗糙表面的硬化涂层，并在粗糙表面上形成防水涂层。 由于防水结构包括硬化涂层和防水涂层，所以提高了防水结构的硬度，耐磨性，透明性和疏水性。 坚硬的防水结构保护基材免受摩擦。 此外，由于本发明采用APPD技术形成防水结构，所以生产成本显着降低。 因此，本发明可以解决现有技术的缺点。

    Solid-state light emitting display and fabrication method thereof
    10.
    发明授权
    Solid-state light emitting display and fabrication method thereof 有权
    固态发光显示器及其制造方法

    公开(公告)号：US07897974B2

    公开(公告)日：2011-03-01

    申请号：US11295504

    申请日：2005-12-07

    申请人： Chia-Hung Hung ,  Chia-Chiang Chang ,  Chun-Hung Lin

    发明人： Chia-Hung Hung ,  Chia-Chiang Chang ,  Chun-Hung Lin

    IPC分类号： H01L29/04

    CPC分类号： G09F9/30 ,  G09F9/33

    摘要： A solid-state light emitting display and a fabrication method thereof are proposed. The light emitting display includes a metallic board formed with conductive circuits, and a plurality of luminous microcrystals disposed on a surface of the metallic board and electrically connected to the conductive circuits. The metallic board provides the features of lightness and thinness, and flexibility, and the luminous microcrystals are in the form of light emitting components, so as to improve the luminous efficiency of display and attain the effect of environmental protection and energy saving, thereby providing display technology with performance satisfactory for various display requirements.

    摘要翻译： 提出了一种固态发光显示器及其制造方法。 发光显示器包括形成有导电电路的金属板和设置在金属板的表面上并电连接到导电电路的多个发光微晶。 金属板提供了轻薄，柔软的特征，发光微晶是发光元件的形式，以提高显示的发光效率，达到环保节能的效果，从而提供显示 技术性能满足各种显示要求。