公开(公告)号：US20050248754A1

公开(公告)日：2005-11-10

申请号：US10839625

申请日：2004-05-05

申请人： Chun-Sheng Wang ,  Louie Liu ,  Li-Kong Turn ,  Heng-Hsin Liu ,  Chi-Hung Liao ,  Hsin-Chun Chiang

发明人： Chun-Sheng Wang ,  Louie Liu ,  Li-Kong Turn ,  Heng-Hsin Liu ,  Chi-Hung Liao ,  Hsin-Chun Chiang

IPC分类号： G01B11/00 ,  G03F9/00

CPC分类号： G03F9/7088 ,  G03F9/7011

摘要： An improved photo resist coating and developing system comprising a track unit and a scanner unit is disclosed. The track unit has a coating unit for coating photo resist on a wafer. The scanner unit includes an enhanced wafer pre-alignment module, an expose stage, and a develop module. The enhanced wafer pre-alignment module is capable of performing wafer edge exposure (WEE) which conventionally required a separate WEE module as part of the track unit. By incorporating the WEE function into the wafer pre-alignment module of the scanner unit, the WEE module of the track unit is no longer required and duplication of wafer alignment and centering performed by the WEE module is eliminated.

摘要翻译： 公开了一种包括轨道单元和扫描器单元的改进的光致抗蚀剂涂覆和显影系统。 轨道单元具有用于在晶片上涂覆光致抗蚀剂的涂层单元。 扫描器单元包括增强的晶片预对准模块，曝光台和显影模块。 增强的晶片预校准模块能够执行通常需要单独的WEE模块作为轨道单元的一部分的晶片边缘曝光（WEE）。 通过将WEE功能结合到扫描器单元的晶片预对准模块中，轨道单元的WEE模块不再需要，并且消除了由WEE模块执行的晶片对准和定心的复制。

公开(公告)号：US07301604B2

公开(公告)日：2007-11-27

申请号：US10786495

申请日：2004-02-25

申请人： Chun-Hung Lin ,  Louie Liu ,  Li-Kong Turn ,  Chi-Hung Liao ,  Ham-Ming Hsieh ,  Yi-Chang Sung ,  Hsin-Chun Chiang

发明人： Chun-Hung Lin ,  Louie Liu ,  Li-Kong Turn ,  Chi-Hung Liao ,  Ham-Ming Hsieh ,  Yi-Chang Sung ,  Hsin-Chun Chiang

IPC分类号： G01B11/00 ,  G03B27/52

CPC分类号： G03F9/7026 ,  G01N2021/8416 ,  G03F7/70533

摘要： A method and system for identifying a defocus wafer by mapping a topography of each wafer in a first wafer batch using a level sensor apparatus (100); calculating a focus spot deviation (402) from the data, the focus spot deviation (402) corresponding to a height by which a focus spot of a photo exposure module would be defocused by the topography; converting the focus spot deviation (402) to a corresponding wafer stage set point to which the photo exposure module is set, to focus the focus spot on each wafer in the wafer batch; and identifying a defocus wafer in the wafer batch, as a wafer having a topography that would defocus the focus spot, even when the photo exposure module is set to the wafer stage set point.

摘要翻译： 一种用于通过使用液位传感器装置（100）在第一晶片批次中映射每个晶片的形貌来识别散焦晶片的方法和系统; 从所述数据计算焦点偏差（402），所述焦点偏差（402）对应于所述照相曝光模块的焦点将由所述形貌散焦的高度; 将聚焦点偏差（402）转换为设置有曝光模块的对应的晶片台设定点，以将聚焦点聚焦在晶片批次中的每个晶片上; 并且即使当将曝光模块设置到晶片台设定点时，将晶片批中的散焦晶片识别为具有将焦点聚焦的形貌的晶片。

公开(公告)号：US20050185170A1

公开(公告)日：2005-08-25

申请号：US10786495

申请日：2004-02-25

申请人： Chun-Hung Lin ,  Louie Liu ,  Li-Kong Turn ,  Chi-Hung Liao ,  Ham-Ming Hsieh ,  Yi-Chang Sung ,  Hsin-Chun Chiang

发明人： Chun-Hung Lin ,  Louie Liu ,  Li-Kong Turn ,  Chi-Hung Liao ,  Ham-Ming Hsieh ,  Yi-Chang Sung ,  Hsin-Chun Chiang

IPC分类号： G01B9/00 ,  G01N21/88 ,  G03F7/20 ,  G03F9/00 ,  H01L21/00

CPC分类号： G03F9/7026 ,  G01N2021/8416 ,  G03F7/70533

摘要： A method and system for identifying a defocus wafer by mapping a topography of each wafer in a first wafer batch using a level sensor apparatus (100); calculating a focus spot deviation (402) from the data, the focus spot deviation (402) corresponding to a height by which a focus spot of a photo exposure module would be defocused by the topography; converting the focus spot deviation (402) to a corresponding wafer stage set point to which the photo exposure module is set, to focus the focus spot on each wafer in the wafer batch; and identifying a defocus wafer in the wafer batch, as a wafer having a topography that would defocus the focus spot, even when the photo exposure module is set to the wafer stage set point.

摘要翻译： 一种用于通过使用液位传感器装置（100）在第一晶片批次中映射每个晶片的形貌来识别散焦晶片的方法和系统; 从所述数据计算焦点偏差（402），所述焦点偏差（402）对应于所述照相曝光模块的焦点将由所述形貌散焦的高度; 将聚焦点偏差（402）转换为设置有曝光模块的对应的晶片台设定点，以将聚焦点聚焦在晶片批次中的每个晶片上; 并且即使当将曝光模块设置到晶片台设定点时，将晶片批中的散焦晶片识别为具有将焦点聚焦的形貌的晶片。

公开(公告)号：US20050078249A1

公开(公告)日：2005-04-14

申请号：US10944774

申请日：2004-09-21

申请人： Yang-Yi Fan ,  Hsin-Chun Chiang ,  Ing Lin ,  Yi-Chun Wong ,  Tsan-Yu Ho ,  Lung-Pin Hsin ,  Kang-Hung Liu ,  Chung-Wen Wu ,  Yi-An Sha

发明人： Yang-Yi Fan ,  Hsin-Chun Chiang ,  Ing Lin ,  Yi-Chun Wong ,  Tsan-Yu Ho ,  Lung-Pin Hsin ,  Kang-Hung Liu ,  Chung-Wen Wu ,  Yi-An Sha

IPC分类号： G02F1/13 ,  G02F1/1333 ,  G02F1/1335 ,  G02F1/1337 ,  G02F1/1368

CPC分类号： G02F1/133753 ,  G02F1/133784 ,  G02F2001/133761

摘要： A fabrication method for a liquid crystal display. A pair of substrates is provided. An alignment layer is formed on the respective substrates. An energy beam is irradiated on a predetermined area of at least one of the alignment layers. The alignment layer is rubbed to form a first pretilt-angle area in the predetermined area exposed to the energy beam, and a second pretilt-angle area not exposed to the energy beam. The pair of substrates are bonded with a preset gap therebetween, and a liquid crystal layer is inserted between the substrates. The liquid crystals corresponding to the first pretilt angle area have a first pretilt angle of θ1, while those corresponding to the second pretilt angle area have a second pretilt angle of θ2.

摘要翻译： 一种液晶显示器的制造方法。 提供一对基板。 在各个基板上形成取向层。 能量束被照射在至少一个对准层的预定区域上。 对准层被摩擦以在暴露于能量束的预定区域中形成第一预倾角区域，以及未暴露于能量束的第二预倾角区域。 一对基板之间以预定的间隙粘合，并且在基板之间插入液晶层。 对应于第一预倾角区域的液晶具有第一预倾角θ1，而对应于第二预倾角区域的液晶具有第二预倾角θ2。

公开(公告)号：US08778602B2

公开(公告)日：2014-07-15

申请号：US12562248

申请日：2009-09-18

申请人： Hung-Ting Pan ,  Jing-Huan Chen ,  Wei-Chung Ma ,  Hsin-Chun Chiang ,  Po-Chung Cheng ,  Szu-An Wu

发明人： Hung-Ting Pan ,  Jing-Huan Chen ,  Wei-Chung Ma ,  Hsin-Chun Chiang ,  Po-Chung Cheng ,  Szu-An Wu

IPC分类号： G03F7/30

CPC分类号： G03F7/30 ,  G03F7/38 ,  H01L21/0273

摘要： A method of lithography patterning includes coating a resist layer on a substrate; performing an exposing process to the resist layer using a lithography tool with a numerical aperture tuned between about 0.5 and about 0.6; baking the resist layer; thereafter performing a first developing process to the resist layer for a first period of time; and performing a second developing process to the resist layer for a second period of time.

摘要翻译： 光刻图案的方法包括在基板上涂覆抗蚀剂层; 使用数值孔径调节在约0.5和约0.6之间的光刻工具对抗蚀剂层进行曝光处理; 烘烤抗蚀剂层; 然后对所述抗蚀剂层进行第一显影处理第一时间; 以及对所述抗蚀剂层进行第二显影处理第二时间段。

公开(公告)号：US08773412B2

公开(公告)日：2014-07-08

申请号：US13104341

申请日：2011-05-10

申请人： Wei-Kuo Lee ,  Hsin-Chun Chiang

发明人： Wei-Kuo Lee ,  Hsin-Chun Chiang

IPC分类号： G09G5/00

CPC分类号： G09G5/395 ,  G09G3/3611 ,  G09G3/3674 ,  G09G5/06 ,  G09G2320/0252

摘要： An overdrive apparatus applied to a display system is provided. The overdrive apparatus includes an indication unit, an access circuit and a plurality of memories. The indication unit provides an indication signal corresponding to a scan line of an image frame. The access unit reads a first overdrive table from a first memory among the memories, and loads a second overdrive table to a second memory among the memories according to the indication signal. The first overdrive table and the second overdrive table respectively correspond to a first region and a second region of the image frame.

摘要翻译： 提供了应用于显示系统的过驱动装置。 过驱动装置包括指示单元，访问电路和多个存储器。 指示单元提供与图像帧的扫描线对应的指示信号。 访问单元从存储器中的第一存储器读取第一过驱动表，并且根据指示信号将第二过驱动表加载到存储器中的第二存储器。 第一超速表和第二超速表分别对应于图像帧的第一区域和第二区域。

公开(公告)号：US07060420B2

公开(公告)日：2006-06-13

申请号：US10944774

申请日：2004-09-21

申请人： Yang-Yi Fan ,  Hsin-Chun Chiang ,  Ing Jer Lin ,  Yi-Chun Wong ,  Tsan-Yu Ho ,  Lung-Pin Hsin ,  Kang-Hung Liu ,  Chung-Wen Wu ,  Yi-An Sha

发明人： Yang-Yi Fan ,  Hsin-Chun Chiang ,  Ing Jer Lin ,  Yi-Chun Wong ,  Tsan-Yu Ho ,  Lung-Pin Hsin ,  Kang-Hung Liu ,  Chung-Wen Wu ,  Yi-An Sha

IPC分类号： G02F1/1337

CPC分类号： G02F1/133753 ,  G02F1/133784 ,  G02F2001/133761

摘要： A fabrication method for a liquid crystal display. A pair of substrates is provided. An alignment layer is formed on the respective substrates. An energy beam is irradiated on a predetermined area of at least one of the alignment layers. The alignment layer is rubbed to form a first pretilt-angle area in the predetermined area exposed to the energy beam, and a second pretilt-angle area not exposed to the energy beam. The pair of substrates are bonded with a preset gap therebetween, and a liquid crystal layer is inserted between the substrates. The liquid crystals corresponding to the first pretilt angle area have a first pretilt angle of θ1, while those corresponding to the second pretilt angle area have a second pretilt angle of θ2.

摘要翻译： 一种液晶显示器的制造方法。 提供一对基板。 在各个基板上形成取向层。 能量束被照射在至少一个对准层的预定区域上。 对准层被摩擦以在暴露于能量束的预定区域中形成第一预倾角区域，以及未暴露于能量束的第二预倾角区域。 一对基板之间以预定的间隙粘合，并且在基板之间插入液晶层。 对应于第一预倾角区域的液晶具有第一预倾斜角θ1，而对应于第二预倾角区域的液晶具有第二倾斜角θθ， 。

公开(公告)号：US20050064116A1

公开(公告)日：2005-03-24

申请号：US10780711

申请日：2004-02-19

申请人： Yi-An Sha ,  Ing Jer Lin ,  Yi-Chun Wong ,  Lung-Pin Hsin ,  Chi-Chang Liao ,  Hsin-Chun Chiang ,  Yang-Yi Fan ,  Chung-Wen Wu

发明人： Yi-An Sha ,  Ing Jer Lin ,  Yi-Chun Wong ,  Lung-Pin Hsin ,  Chi-Chang Liao ,  Hsin-Chun Chiang ,  Yang-Yi Fan ,  Chung-Wen Wu

IPC分类号： G02F1/167 ,  B32B17/06 ,  B32B17/10 ,  G02B26/02 ,  E06B3/24

CPC分类号： G02B26/02 ,  B32B17/06 ,  B32B17/10036 ,  B32B17/10339 ,  B32B17/10908

摘要： A polymer gel display, fabrication method and operating structure thereof. Display is enabled by utilizing the flexing characteristic of a polymer-gel sheet. A pair of substrates is separated by a predetermined gap, and a polymer-gel sheet of a first color disposed therebetween, having two ends fixed, a center area flexible and contacting no more than one of the substrates. A fluid layer of a second color is disposed between the substrates, displaying its color via the substrate not contacting the polymer-gel sheet. An external electric field is applied to the polymer-gel sheet, flexing the polymer-gel sheet toward the substrate until making contact and the first color of the polymer-gel sheet is displayed via the substrate.

摘要翻译： 聚合物凝胶显示器，其制造方法和操作结构。 通过利用聚合物凝胶片的弯曲特性来实现显示。 一对基板以预定的间隙分开，并且在其间设置有第一颜色的聚合物凝胶片，其两端被固定，中心区域是柔性的，并且接触不超过一个基底。 第二颜色的流体层设置在基板之间，经由不与聚合物 - 凝胶片接触的基板显示其颜色。 将外部电场施加到聚合物凝胶片上，使聚合物凝胶片向基材弯曲直到接触，并且通过基材显示聚合物 - 凝胶片的第一颜色。

公开(公告)号：US08284360B2

公开(公告)日：2012-10-09

申请号：US13409012

申请日：2012-02-29

申请人： Tsan-Yu Ho ,  Ding-Jen Chen ,  Hsin-Chun Chiang ,  Mei-Ju Lee ,  Bang-Hao Wu

发明人： Tsan-Yu Ho ,  Ding-Jen Chen ,  Hsin-Chun Chiang ,  Mei-Ju Lee ,  Bang-Hao Wu

IPC分类号： G02F1/1337

CPC分类号： G02F1/133711 ,  G02F2001/133715 ,  G02F2001/133726

摘要： A liquid crystal display (LCD) panel and a fabricating method thereof are described. First, a first substrate and a second substrate are provided. A liquid crystal monomer layer is then formed on the surface of at least one of the first and second substrates. Next, a curing step is performed to the liquid crystal monomer layer to induce a polymerization reaction, so as to form a liquid crystal polymer layer. Thereafter, the first and second substrates are assembled and a liquid crystal layer is filled between the first and second substrates.

摘要翻译： 描述了液晶显示器（LCD）面板及其制造方法。 首先，提供第一基板和第二基板。 然后在第一和第二基板中的至少一个的表面上形成液晶单体层。 接着，对液晶单体层进行固化工序，引发聚合反应，形成液晶聚合物层。 此后，组装第一和第二基板，并且在第一和第二基板之间填充液晶层。

公开(公告)号：US20110070546A1

公开(公告)日：2011-03-24

申请号：US12562248

申请日：2009-09-18

申请人： Hung-Ting Pan ,  Jing-Huan Chen ,  Wei-Chung Ma ,  Hsin-Chun Chiang ,  Po-Chung Cheng ,  Szu-An Wu

发明人： Hung-Ting Pan ,  Jing-Huan Chen ,  Wei-Chung Ma ,  Hsin-Chun Chiang ,  Po-Chung Cheng ,  Szu-An Wu

IPC分类号： G03F7/20

CPC分类号： G03F7/30 ,  G03F7/38 ,  H01L21/0273

摘要： A method of lithography patterning includes coating a resist layer on a substrate; performing an exposing process to the resist layer using a lithography tool with a numerical aperture tuned between about 0.5 and about 0.6; baking the resist layer; thereafter performing a first developing process to the resist layer for a first period of time; and performing a second developing process to the resist layer for a second period of time.

摘要翻译： 光刻图案的方法包括在基板上涂覆抗蚀剂层; 使用数值孔径调节在约0.5和约0.6之间的光刻工具对抗蚀剂层进行曝光处理; 烘烤抗蚀剂层; 然后对所述抗蚀剂层进行第一显影处理第一时间; 以及对所述抗蚀剂层进行第二显影处理第二时间段。