Device for treating gases using surface plasma
    3.
    发明授权
    Device for treating gases using surface plasma 有权
    使用表面等离子体处理气体的装置

    公开(公告)号:US08974741B2

    公开(公告)日:2015-03-10

    申请号:US14062181

    申请日:2013-10-24

    IPC分类号: B01J19/08 B01D53/32 B01D53/86

    摘要: A device for treating gases using surface plasma, including: at least one dielectric substrate having two opposite main surfaces, at least one first electrode, and at least one second electrode being respectively deposited on the two opposite main surfaces of the substrate, the first and second electrodes being connected to the two terminals of an electric power supply source; at least one catalytic support independent from the dielectric substrate and from the electrodes, and integrating a catalyst.

    摘要翻译: 一种用于使用表面等离子体处理气体的装置,包括:具有两个相对的主表面的至少一个电介质基底,至少一个第一电极和至少一个第二电极,其分别沉积在所述基板的两个相对的主表面上,所述第一和 第二电极连接到电源的两个端子; 至少一个独立于电介质基底和电极的催化剂载体,并整合催化剂。