摘要:
Water soluble, gelatin-free dip coatings for pharmaceutical solid dosage forms such as tablets comprising HPMC and xanthan gum, carrageenan, and mixtures thereof, or HPMC and castor oil or maltodextrin.
摘要:
A method for making a rigid polyurethane foam by reacting a polyisocyanate and a polyol in the presence of a urethane catalyst, a blowing agent and a silicone surfactant characterized by employing a blowing agent comprising a C4 or C5 hydrocarbon, or mixtures thereof, with an average molecular weight of ≦72 g/mole and a boiling point in the range of 27.8 to 50 ° C., and a silicone surfactant comprising a polyether-polysiloxane copolymer represented by the following formula: (CH3)3—Si—O—(Si(CH3)2—O)x—(Si(CH3)(R)O)y—Si(CH3)3 where R═(CH2)3—O—(—CH2—CH2—O)a—(CH2—CH(CH3)—O)b—R″, and where R″ is H, (CH2)ZCH3, or C(O)CH3; x+y+2 is 60-130; x/y is 5-14; z is 0-4; the total surfactant molecular weight, based on the formula, is 7000-30,000 g/mole, the wt % siloxane in the surfactant is 32-70 wt %, the blend average molecular weight (BAMW) of the polyether portion is 450-1000 g/mole, and the mole % of ethylene oxide in the polyether portion is 70-100 mole %.
摘要:
Disclosed herein is a fluorinated bridged carbocyclic compound that can be polymerized by itself or with at least one other ethylenically unsaturated monomer to provide a polymer. The polymer may be used, for example, within a sub-300 nm photoresist composition. Also disclosed is a method to make the bridged carbocyclic compound.
摘要:
A photodefinable, organosilicate material having a dielectric constant (κ) of 3.5 or below and a method for making and using same, for example, in an electronic device, is described herein. In one aspect, there is provided a composition for preparing a photodefinable material comprising: a silica source capable of being sol-gel processed and having a molar ratio of carbon to silicon within the silica source contained therein of at least 0.5 or greater; a photoactive compound; optionally a solvent; and water provided the composition contains 0.1% by weight or less of an added acid where the acid has a molecular weight of 500 or less.
摘要:
Traditionally, sol-gel silicates have been reported as being high temperature processable at 400 C to give reasonably dense films that showed good leakage current densities (
摘要翻译:传统上,已经报道了溶胶 - 凝胶硅酸盐在400℃下是高温可加工的,以产生相当致密的膜,其表现出良好的漏电流密度(<5×10 -8 -8 A / cm 2 / >)。 最近我们已经发现,我们能够从135℃至250℃固化的溶胶 - 凝胶硅酸盐前体的特定组合制备薄膜,并提供良好的漏电流密度值(9×10 -9 -9) A / cm 2至1×10 -10 A / cm 2),尽管处理温度降低。 这些是在较低温度下固化的硅酸盐的一些例子,其中泄漏电流密度足够低以用作柔性或轻质薄膜晶体管的低温处理或可加工或可印刷的栅极电介质。 这些制剂也可用于薄膜晶体管和其它电子器件的不锈钢箔的平面化。
摘要:
The use of a poly(arylene ether) polymer as a passivation or gate dielectric layer in thin film transistors. This poly(arylene ether) polymer includes polymer repeat units of the following structure: —(O—Ar1—O—Ar2—O—)m—(—O—Ar3—O—Ar4—O)n— where Ar1, Ar2, Ar3, and Ar4 are identical or different aryl radicals, m is 0 to 1, n is 1−m, and at least one of the aryl radicals is grafted to the backbone of the polymer