利索-全球专利检索

  1. Login
  2. Sign Up

Search Results

11 records (took 0.018 seconds)

    METHOD FOR MANUFACTURING METAL PLATE
    1.
    发明申请
    METHOD FOR MANUFACTURING METAL PLATE 有权

    公开(公告)号：US20210102268A1

    公开(公告)日：2021-04-08

    申请号：US16940791

    申请日：2020-07-28

    Applicant: Dai Nippon Printing Co., Ltd.

    Inventor： Hiroki OKA ,  Chikao IKENAGA ,  Sachiyo MATSUURA ,  Shogo ENDO ,  Chiaki HATSUTA ,  Asako NARITA

    IPC: C21D8/02 ,  C22C38/08 ,  C23F1/02 ,  C23F1/28 ,  H01L51/56 ,  H01L51/00

    Abstract: A method for manufacturing a metal plate, the metal plate including a first surface and a second surface positioned on the opposite side of the first surface, may include a step of rolling a base metal having an iron alloy containing nickel to produce the metal plate. The metal plate may include particles containing as a main component an element other than iron and nickel. In a sample including the first surface and the second surface of the metal plate, the following conditions (1) and (2) regarding the particles may be satisfied: (1) The number of the particles having an equivalent circle diameter of 1 μm or more is 50 or more and 3000 or less per 1 mm3 in the sample, and (2) The number of the particles having an equivalent circle diameter of 3 μm or more is 50 or less per 1 mm3 in the sample.

    DEPOSITION MASK AND METHOD OF MANUFACTURING DEPOSITION MASK
    4.
    发明申请
    DEPOSITION MASK AND METHOD OF MANUFACTURING DEPOSITION MASK 有权

    公开(公告)号：US20210340665A1

    公开(公告)日：2021-11-04

    申请号：US17305731

    申请日：2021-07-14

    Applicant: Dai Nippon Printing Co., Ltd.

    Inventor： Yasuhiro UCHIDA ,  Sachiyo MATSUURA ,  Chikao IKENAGA

    IPC: C23C14/04 ,  H01L51/00 ,  H01L51/56

    Abstract: A deposition mask includes: a first surface and a second surface, in which a plurality of through-holes are formed; a pair of long side surfaces connected to the first and second surfaces, and defining a profile of the deposition mask in a longitudinal direction of the deposition mask; and a pair of short side surfaces connected to the first and second surfaces, and defining a profile of the deposition mask in a width direction of the deposition mask. The long side surface includes a first portion that is recessed inside and includes a first end portion positioned along the first surface, and a second end portion positioned along the second surface and positioned inside the first end portion. The through-hole includes a first recess formed on the first surface, and a second recess formed on the second surface and connected to the first recess through a hole connection portion.

    DEPOSITION MASK AND METHOD OF MANUFACTURING DEPOSITION MASK
    6.
    发明公开
    DEPOSITION MASK AND METHOD OF MANUFACTURING DEPOSITION MASK 审中-公开

    公开(公告)号：US20230203638A1

    公开(公告)日：2023-06-29

    申请号：US18175596

    申请日：2023-02-28

    Applicant: Dai Nippon Printing Co., Ltd.

    Inventor： Yasuhiro UCHIDA ,  Sachiyo MATSUURA ,  Chikao IKENAGA

    IPC: C23C14/04 ,  C23F1/02 ,  H10K71/00 ,  H10K71/16

    CPC classification number: C23C14/042 ,  C23F1/02 ,  H10K71/00 ,  H10K71/166 ,  B05C21/005

    Abstract: A deposition mask includes: a first surface and a second surface, in which a plurality of through-holes are formed; a pair of long side surfaces connected to the first and second surfaces, and defining a profile of the deposition mask in a longitudinal direction of the deposition mask; and a pair of short side surfaces connected to the first and second surfaces, and defining a profile of the deposition mask in a width direction of the deposition mask. The long side surface includes a first portion that is recessed inside and includes a first end portion positioned along the first surface, and a second end portion positioned along the second surface and positioned inside the first end portion. The through-hole includes a first recess formed on the first surface, and a second recess formed on the second surface and connected to the first recess through a hole connection portion.

    METHOD OF MANUFACTURING DEPOSITION MASK, INTERMEDIATE PRODUCT TO WHICH DEPOSITION MASK IS ALLOCATED, AND DEPOSITION MASK
    8.
    发明申请
    METHOD OF MANUFACTURING DEPOSITION MASK, INTERMEDIATE PRODUCT TO WHICH DEPOSITION MASK IS ALLOCATED, AND DEPOSITION MASK 审中-公开

    公开(公告)号：US20190256965A1

    公开(公告)日：2019-08-22

    申请号：US16372661

    申请日：2019-04-02

    Applicant: Dai Nippon Printing Co., Ltd.

    Inventor： Chikao IKENAGA ,  Takanori MARUOKA ,  Sachiyo MATSUURA

    IPC: C23C14/04 ,  C23F1/28

    Abstract: A deposition mask in which deformation of long sides is restrained is manufactured. A manufacturing method of a deposition mask includes a step of preparing a metal plate; a processing step of processing the metal plate into an intermediate product comprising: a plurality of deposition mask portions each including a pair of long sides and a pair of short sides, and having a plurality of through-holes formed therein; and a support portion that surrounds the plurality of deposition mask portions, and is partially connected to the short sides of the plurality of deposition mask portions; and a separation step of separating the deposition mask portions from the support portion to obtain the deposition mask. In the intermediate product, the long sides of the deposition mask portions are not connected to the support portion.

Patent Agency Ranking