SILVER-PLATED PRODUCT AND METHOD FOR PRODUCING SAME
    2.
    发明申请
    SILVER-PLATED PRODUCT AND METHOD FOR PRODUCING SAME 审中-公开
    镀银产品及其生产方法

    公开(公告)号:US20160265127A1

    公开(公告)日:2016-09-15

    申请号:US15034320

    申请日:2014-10-31

    摘要: A silver-plated product, wherein the preferred orientation plane of a surface layer of silver is {111} plane and wherein the ratio of the full-width at half maximum of an X-ray diffraction peak on {111} plane after heating the silver-plated product at 50° C. for 168 hours to the full-width at half maximum of an X-ray diffraction peak on {111} plane before the heating of the silver-plated product is not less than 0.5, is produced by forming the surface layer on a base material by electroplating at a liquid temperature of 12 to 24° C. and a current density of 3 to 8 A/dm2 in a silver plating solution which contains 80 to 110 g/L of silver, 70 to 160 g/L of potassium cyanide and 55 to 70 mg/L of selenium, so as to cause the product of the concentration of potassium cyanide and the current density to be 840 g·A/L·dm2 or less.

    摘要翻译: 一种镀银产品,其中银的表面层的优选取向平面为{111}面,并且其中在加热银之后{111}面上的X射线衍射峰的半峰全宽之比 在镀银制品的加热之前,在{111}面上,在50℃下放置168小时至半高X射线衍射峰全宽为不小于0.5, 在含有80〜110g / L银的镀银溶液中,通过在12〜24℃的液温下电镀电流密度为3〜8A / dm 2的基材上的表层,70〜160 氰化钾的g / L和硒的55〜70mg / L,使氰化钾的浓度和电流密度的乘积为840g·A / L·dm 2以下。