公开(公告)号：US06395101B1

公开(公告)日：2002-05-28

申请号：US09416225

申请日：1999-10-08

申请人： Dana Scranton ,  Gary L. Curtis

发明人： Dana Scranton ,  Gary L. Curtis

IPC分类号： B08B300

CPC分类号： H01L21/67034 ,  Y10S134/902

摘要： In a method of processing or drying a semiconductor wafer, the wafer is withdrawn from a fluid bath at an inclined angle, and at a selected withdrawal speed. A solvent vapor is provided at the surface of the bath, to create a surface tension gradient and promote drying, or removal of the fluid from the wafer surface. After the wafer is entirely withdrawn from the rinsing liquid, the wafer is rotated briefly, to remove any remaining fluid via centrifugal force, without the fluid drying on the wafer. The wafer is held onto a rotor assembly which rotates the wafer within an enclosed chamber, and which is also pivoted within the chamber, to position the wafer at the incline angle.

摘要翻译： 在半导体晶片的处理或干燥的方法中，将晶片以倾斜角度从流体槽中以选定的退出速度取出。 在浴的表面处提供溶剂蒸气，以产生表面张力梯度并促进干燥或从晶片表面去除流体。 在晶片完全从冲洗液体中取出之后，晶片短暂旋转，通过离心力除去任何剩余的流体，而不会在晶片上流体干燥。 将晶片保持在转子组件上，转子组件使晶片在封闭的腔室内旋转，并且还在腔室内枢转，以便以倾斜角定位晶片。

公开(公告)号：US06374837B2

公开(公告)日：2002-04-23

申请号：US09859930

申请日：2001-05-17

申请人： Dana Scranton ,  Gary L. Curtis

发明人： Dana Scranton ,  Gary L. Curtis

IPC分类号： B08B300

CPC分类号： H01L21/67034 ,  Y10S134/902

摘要： An apparatus for processing or drying a semiconductor wafer includes a rotor for holding a wafer and for spinning the wafer about a first axis. A pivot arm supports the rotor, so that the rotor can pivot about a second axis that is substantially perpendicular to the first axis. A basin holding a processing fluid is located below the rotor, with the rotor vertically movable into and out of the processing fluid via an elevator supporting the pivot arm. The rotor is pivotable into a position where it holds the wafer at an inclined angle so that the wafer may be withdrawn from the processing fluid at said inclined angle to facilitate drying of the wafer.

摘要翻译： 用于处理或干燥半导体晶片的装置包括用于保持晶片并围绕第一轴旋转晶片的转子。 枢转臂支撑转子，使得转子可围绕基本上垂直于第一轴线的第二轴线枢转。 保持加工流体的盆地位于转子下方，其中转子可通过支撑枢转臂的电梯竖直移动和移出加工流体。 转子可枢转到其以倾斜角度保持晶片的位置，使得晶片可以以所述倾斜角度从处理流体中取出，以促进晶片的干燥。

公开(公告)号：US07048527B2

公开(公告)日：2006-05-23

申请号：US11009904

申请日：2004-12-10

申请人： Randy S. Bay ,  Cristina U. Thomas ,  David F. Slama ,  Richard T. Paxton ,  Gary L. Curtis ,  Jonathan J. Mattson

发明人： Randy S. Bay ,  Cristina U. Thomas ,  David F. Slama ,  Richard T. Paxton ,  Gary L. Curtis ,  Jonathan J. Mattson

IPC分类号： B29C43/46

CPC分类号： B24D11/02 ,  A44B18/0049 ,  B29C67/0044 ,  B29L2031/729 ,  B65H37/00 ,  B65H2301/511 ,  B65H2301/512

摘要： An apparatus for capping a stem web including a cooled roll, a first heated nip roll positioned to form a first nip with the cooled roll, and a second heated nip roll positioned to form a second nip with the cooled roll. The cooled roll has a diameter that is at least 30% larger than a diameter of the first or second heated nip roll. In an embodiment, the two nips are on opposite sides of a larger central cooled roll positioned between the heated rolls. In an embodiment, the reaction forces between the rolls are measured and controlled at each end of each of the heated rolls. The invention is particularly adapted to making abrasive particles that are attached to a driving mechanism via headed stem fasteners formed by the method.

摘要翻译： 一种用于封盖包括冷却辊的杆腹板的装置，被定位成与冷却的辊形成第一辊隙的第一加热辊隙以及与冷却的辊形成第二辊隙的第二加热夹辊。 冷却辊的直径比第一或第二加热夹辊的直径大至少30％。 在一个实施例中，两个压头位于位于加热辊之间的较大中心冷却辊的相对侧上。 在一个实施例中，在每个加热的辊的每个端部处测量和控制辊之间的反作用力。 本发明特别适用于通过由该方法形成的头部杆紧固件制造附着于驱动机构的磨料颗粒。

公开(公告)号：US06833035B1

公开(公告)日：2004-12-21

申请号：US09575551

申请日：2000-05-22

申请人： Raymond F. Thompson ,  Robert W. Berner ,  Gary L. Curtis ,  Stephen P. Culliton ,  Blaine G. Wright

发明人： Raymond F. Thompson ,  Robert W. Berner ,  Gary L. Curtis ,  Stephen P. Culliton ,  Blaine G. Wright

IPC分类号： B65G4907

CPC分类号： H01L21/67781 ,  H01L21/67173 ,  H01L21/67313 ,  H01L21/67326 ,  H01L21/67742 ,  H01L21/67754 ,  H01L21/67766 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67778 ,  Y10S134/902 ,  Y10S414/138 ,  Y10S414/14

摘要： A processor for processing integrated circuit wafers, semiconductor substrates, data disks and similar units requiring very low contamination levels. The processor has an interface section which receives wafers in standard wafer carriers. The interface section transfers the wafers from carriers onto novel trays for improved processing. The interface unit can hold multiple groups of multiple trays. A conveyor having an automated arm assembly moves wafers supported on a tray. The conveyor moves the trays from the interface along a track to several processing stations. The processing stations are accessed from an enclosed area adjoining the interface section.

摘要翻译： 用于处理集成电路晶片，半导体衬底，数据盘以及需要非常低的污染水平的类似单元的处理器。 处理器具有在标准晶片载体中接收晶片的接口部分。 接口部分将晶片从载体转移到新的托盘上以改进处理。 接口单元可以容纳多组多个托盘。 具有自动臂组件的输送机移动支撑在托盘上的晶片。 输送机将托盘从接口沿轨道移动到多个处理站。 处理站从与接口部分相邻的封闭区域进行访问。

公开(公告)号：US06447232B1

公开(公告)日：2002-09-10

申请号：US08994737

申请日：1997-12-19

申请人： Jeffry A. Davis ,  Kert L. Dolechek ,  Gary L. Curtis

发明人： Jeffry A. Davis ,  Kert L. Dolechek ,  Gary L. Curtis

IPC分类号： B65G4907

CPC分类号： H01L21/67754 ,  H01L21/67126 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/67313 ,  H01L21/67326 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S134/902 ,  Y10S414/139 ,  Y10S414/14

摘要： A processor for processing articles, such as semiconductor wafers, in a substantially clean atmosphere is set forth. The processor includes an enclosure defining a substantially enclosed clean processing chamber and at least one processing station disposed in the processing chamber. An interface section is disposed adjacent an interface end of the enclosure. The interface section includes at least one interface port through which a pod containing articles for processing are loaded or unloaded to or from the processor. The interface section is hygienically separated from the processing chamber since the interface section is generally not as clean as the highly hygienic processing chamber. An article extraction mechanism adapted to seal with the pod is employed. The mechanism is disposed to allow extraction of the articles contained within the pod into the processing chamber without exposing the articles to ambient atmospheric conditions in the interface section. The article processor also preferably includes an article insertion mechanism that is adapted to seal with a pod disposed in the interface section. The article insertion mechanism is disposed to allow insertion of the articles into the pod after processing by the at least one processing station. The article insertion mechanism allows the insertion of the articles without exposing the articles to ambient atmospheric conditions in the interface section.

摘要翻译： 阐述了一种用于在基本上清洁的气氛中处理诸如半导体晶片的制品的处理器。 处理器包括限定基本封闭的清洁处理室的外壳和设置在处理室中的至少一个处理站。 接口部分设置在外壳的接口端附近。 接口部分包括至少一个接口端口，通过该至少一个接口端口将包含用于处理的物品的容器装载或者从处理器卸载。 接口部分与处理室卫生地分开，因为界面部分通常不像高度卫生的处理室那么干净。 采用适于与荚密封的物品提取机构。 该机构被设置为允许将容纳在容器内的物品提取到处理室中，而不会使物品暴露于接口部分中的环境大气条件。 物品处理器还优选地包括物品插入机构，其适于与设置在界面部分中的容器密封。 物品插入机构设置成允许在由至少一个处理站处理之后将物品插入容器中。 物品插入机构允许物品的插入，而不会使物品暴露在界面部分中的环境大气条件下。

公开(公告)号：US06652219B2

公开(公告)日：2003-11-25

申请号：US10205158

申请日：2002-07-25

申请人： Jeffry A. Davis ,  Kert L. Dolechek ,  Gary L. Curtis

发明人： Jeffry A. Davis ,  Kert L. Dolechek ,  Gary L. Curtis

IPC分类号： B65G4907

CPC分类号： H01L21/67754 ,  H01L21/67126 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/67313 ,  H01L21/67326 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S134/902 ,  Y10S414/139 ,  Y10S414/14

摘要： A processor for processing articles, such as semiconductor wafers, includes an enclosure defining a substantially enclosed clean processing chamber and at least one processing station disposed in the processing chamber. An interface section is disposed adjacent an interface end of the enclosure. The interface section includes at least one interface port through which a pod containing articles for processing are loaded or unloaded to or from the processor. An article extraction mechanism adapted to seal with the pod removes articles from the pod without exposing the articles to ambient atmospheric conditions in the interface section. The article processor also preferably includes an article insertion mechanism adapted to seal with a pod in the interface section. The article insertion mechanism allows insertion of the articles into the pod after processing by at least one processing station.

摘要翻译： 用于处理诸如半导体晶片的制品的处理器包括限定基本封闭的清洁处理室的外壳和设置在处理室中的至少一个处理站。 接口部分设置在外壳的接口端附近。 接口部分包括至少一个接口端口，通过该至少一个接口端口将包含用于处理的物品的容器装载或者从处理器卸载。 适于与容器密封的物品提取机构将物品从物料盒中取出，而不会使物品暴露在界面部分的环境大气条件下。 物品处理器还优选地包括适于与接口部分中的容器密封的物品插入机构。 物品插入机构允许在由至少一个处理站处理之后将物品插入到容器中。

公开(公告)号：US06599075B2

公开(公告)日：2003-07-29

申请号：US10180793

申请日：2002-06-25

申请人： Jeffry A. Davis ,  Kert L. Dolechek ,  Gary L. Curtis

发明人： Jeffry A. Davis ,  Kert L. Dolechek ,  Gary L. Curtis

IPC分类号： B65G4907

CPC分类号： H01L21/67754 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/67313 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S414/137 ,  Y10S414/139

摘要： A processor for processing articles, such as semiconductor wafers, in a substantially clean atmosphere is set forth. The processor includes an enclosure defining a substantially enclosed clean processing chamber and at least one processing station disposed in the processing chamber. An interface section is disposed adjacent an interface end of the enclosure. The interface section includes at least one interface port through which a pod containing articles for processing are loaded or unloaded to or from the processor. The interface section is hygienically separated from the processing chamber since the interface section is generally not as clean as the highly hygienic processing chamber. An article extraction mechanism adapted to seal with the pod is employed. The mechanism is disposed to allow extraction of the articles contained within the pod into the processing chamber without exposing the articles to ambient atmospheric conditions in the interface section. The article processor also preferably includes an article insertion mechanism that is adapted to seal with a pod disposed in the interface section. The article insertion mechanism is disposed to allow insertion of the articles into the pod after processing by the at least one processing station. The article insertion mechanism allows the insertion of the articles without exposing the articles to ambient atmospheric conditions in the interface section.

公开(公告)号：US06318385B1

公开(公告)日：2001-11-20

申请号：US09041649

申请日：1998-03-13

申请人： Gary L. Curtis ,  Raymon F. Thompson

发明人： Gary L. Curtis ,  Raymon F. Thompson

IPC分类号： B08B302

CPC分类号： H01L21/67017 ,  B08B3/04 ,  H01L21/32134 ,  H01L21/67075 ,  H01L21/6708 ,  Y10S134/902

摘要： An apparatus for rinsing and drying a semiconductor workpiece in a micro-environment is set forth. The apparatus includes a rotor motor and a rinser/dryer housing. The rinser/dryer housing is connected to be rotated by the rotor motor. The rinser/dryer housing further defines a substantially closed rinser/dryer chamber therein in which rinsing and drying fluids are distributed across at least one face of the semiconductor workpiece by the action of centripetal acceleration generated during rotation of the housing. A fluid supply system is connected to sequentially supply a rinsing fluid followed by a drying fluid to the chamber as the housing is rotated.

摘要翻译： 阐述了在微环境中冲洗和干燥半导体工件的装置。 该装置包括转子电动机和冲洗机/烘干机壳体。 洗衣机/烘干机壳体通过转子电动机连接而旋转。 洗衣机/干燥器壳体还限定了其中的基本上封闭的洗衣机/干燥器室，其中冲洗和干燥流体通过壳体旋转期间产生的向心加速度的作用而分布在半导体工件的至少一个面上。 液体供应系统被连接以在壳体旋转时依次供应冲洗流体，然后将干燥流体提供给腔室。

公开(公告)号：US5836736A

公开(公告)日：1998-11-17

申请号：US698034

申请日：1996-08-15

申请人： Raymon F. Thompson ,  Robert W. Berner ,  Gary L. Curtis ,  Stephen P. Culliton ,  Blaine G. Wright ,  Darryl S. Byle

发明人： Raymon F. Thompson ,  Robert W. Berner ,  Gary L. Curtis ,  Stephen P. Culliton ,  Blaine G. Wright ,  Darryl S. Byle

IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/673 ,  H01L21/677

CPC分类号： H01L21/67781 ,  H01L21/67173 ,  H01L21/67313 ,  H01L21/67326 ,  H01L21/67742 ,  H01L21/67754 ,  H01L21/67766 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  Y10S414/138

摘要： A processor for processing integrated circuit wafers, semiconductor substrates, data disks and similar units requiring very low contamination levels. The processor has an interface section which receives wafers in standard wafer carriers. The interface section transfers the wafers from carriers onto novel trays for improved processing. The interface unit can hold multiple groups of multiple trays. A conveyor having an automated arm assembly moves wafers supported on a tray. The conveyor moves the trays from the interface along a track to several processing stations. The processing stations are accessed from an enclosed area adjoining the interface section.

公开(公告)号：US5784797A

公开(公告)日：1998-07-28

申请号：US622349

申请日：1996-03-26

申请人： Gary L. Curtis ,  Raymon F. Thompson ,  Robert W. Berner ,  Ed Fix

发明人： Gary L. Curtis ,  Raymon F. Thompson ,  Robert W. Berner ,  Ed Fix

IPC分类号： H01L21/00 ,  H01L21/673 ,  H01L21/677 ,  F26B17/24

CPC分类号： H01L21/67754 ,  H01L21/67173 ,  H01L21/67313 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781

摘要： A centrifugal semiconductor processing system having a rotor which holds articles for centrifugal processing. The rotor includes a rotor frame with a receiver for holding the wafers or other articles in a spaced array without a wafer carrier to improve fluid access to the wafers. The rotor also has one or more retainers which are pivoted relative to the rotor to controllably urge the wafers into their desired processing positions. The retainers are preferably constructed to provide initial spring biasing with added restraining forces being generated during rotation. The processing system also preferably includes an implement mounted on a robot for loading the rotor, and a vision system to aid in the loading operation.

摘要翻译： 一种离心半导体处理系统，具有保持用于离心处理的物品的转子。 转子包括具有接收器的转子框架，用于将晶片或其它制品保持为间隔开的阵列而不具有晶片载体，以改善对晶片的流体通路。 转子还具有一个或多个保持器，其相对于转子枢转以可控地将晶片推入其期望的加工位置。 保持器优选地构造成提供初始弹簧偏置，并且在旋转期间产生附加的约束力。 处理系统还优选地包括安装在机器人上用于装载转子的工具和用于辅助装载操作的视觉系统。