公开(公告)号：US20050197798A1

公开(公告)日：2005-09-08

申请号：US10794991

申请日：2004-03-05

申请人： Daniel Avery ,  Michael Smith ,  Joel Bailey ,  Jerry Schumacher

发明人： Daniel Avery ,  Michael Smith ,  Joel Bailey ,  Jerry Schumacher

IPC分类号： G06F7/38

CPC分类号： G06F3/0481

摘要： A circuit testing and control approach involves configurable switch control for automatically detecting and routing test signals along a plurality of test circuit paths. According to an example embodiment of the present invention, graphical user interface (GUI) (240) includes stored computer-executable code that, when executed, causes a micro-computer circuit to send configuration signals to a microcontroller (220). A configurable circuit (215) coupled to the microcontroller is then configured by the microcontroller, in response to the configuration signals, for routing test signals using controllable switches. In one implementation, the configurable circuit includes circuits on inter-connectable circuit boards (210, 250, 260), with sense nodes for detecting the presence of an inter-connectable circuit board coupled to another. In response to the detected presence (or lack thereof), the controllable switches control the routing of the test signals between the inter-connectable circuit boards. The configuration signals are used for one or more of actively controlling the microcontroller, programming the microcontroller (e.g., storing program code therein) or requesting data from the microcontroller. With these approaches, automatic switching of test signal paths, on an individual circuit and in connection with other circuits, is achieved without necessarily physically accessing the configurable circuit.

摘要翻译： 电路测试和控制方法涉及可配置的开关控制，用于沿多个测试电路路径自动检测和路由测试信号。 根据本发明的示例实施例，图形用户界面（GUI）（240）包括存储的计算机可执行代码，其在被执行时使微计算机电路向微控制器（220）发送配置信号。 然后，耦合到微控制器的可配置电路（215）由微控制器响应于配置信号被配置用于使用可控开关路由测试信号。 在一个实现中，可配置电路包括可互连电路板（210,250,260）上的电路，其中感测节点用于检测耦合到另一电路板的可连接电路板的存在。 响应于检测到的存在（或不存在），可控开关控制可连接的电路板之间的测试信号的路由。 配置信号用于主动控制微控制器，编程微控制器（例如，其中存储程序代码）或从微控制器请求数据的一个或多个。 利用这些方法，实现了测试信号路径在各个电路上以及与其它电路的连接的自动切换，而不必物理地访问可配置电路。

公开(公告)号：US20060200715A1

公开(公告)日：2006-09-07

申请号：US10548993

申请日：2004-02-28

申请人： Daniel Avery ,  Joel Bailey

发明人： Daniel Avery ,  Joel Bailey

IPC分类号： G01R31/28

CPC分类号： G01R31/318558 ,  H04L43/50

摘要： A circuit testing approach involves configurable switch control for automatically detecting and routing test signals along a plurality of test circuit paths (240, 242, 244). According to an example embodiment of the present invention, a microcontroller (205) is programmed to monitor input nodes (210) using an interrupt routine for automatically detecting test signals (i.e., digital and/or JTAG test signals). Upon the detection of the test signals, the microcontroller controls a controllable switch (220) for routing the test data along one of the test circuit paths. With this approach, manual switching for routing the test signals is not necessary, which has been found to be useful in applications where access to the circuit paths for switching is difficult or impossible.

摘要翻译： 电路测试方法涉及可配置的开关控制，用于沿多个测试电路路径（240,242,244）自动检测和路由测试信号。 根据本发明的示例实施例，微控制器（205）被编程为使用用于自动检测测试信号（即，数字和/或JTAG测试信号）的中断程序监视输入节点（210）。 在检测到测试信号时，微控制器控制用于沿着测试电路路径之一路由测试数据的可控开关（220）。 使用这种方法，不需要用于路由测试信号的手动切换，这已经被发现在对于切换电路路径的访问困难或不可能的应用中是有用的。

公开(公告)号：US20080011332A1

公开(公告)日：2008-01-17

申请号：US11825676

申请日：2007-07-06

申请人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

发明人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

IPC分类号： B08B3/02

CPC分类号： H01L21/6708 ,  G01C25/00 ,  H01J37/32366 ,  H01L21/31116 ,  H01L21/31612 ,  H01L21/67069 ,  H01L21/681

摘要： An edge area of the substrate processing device is disclosed. The edge area being processed is isolated from the remainder of the substrate by directing a flow of an inert gas through a plenum near the area to be processed thus forming a barrier while directing a flow of reactive species at an angle relative to the top surface of the substrate towards the substrate edge area thus processing the substrate edge area. A flow of oxygen containing gas into the processing chamber together with a negative exhaust pressure may contribute to the biasing of reactive species and other gases away from the non-processing areas of the substrate.

摘要翻译： 公开了一种基板处理装置的边缘区域。 正在处理的边缘区域与基板的其余部分分离，通过使惰性气体流通过待处理区域附近的增压室，从而形成屏障，同时将反应物流的流动相对于顶部表面成一定角度 基板朝向基板边缘区域，从而处理基板边缘区域。 含氧气体流入处理室和负排气压力可能有助于使反应物质和其他气体偏离基板的非处理区域。

公开(公告)号：US20070066076A1

公开(公告)日：2007-03-22

申请号：US11230261

申请日：2005-09-19

申请人： Joel Bailey ,  Johnny Ortiz ,  Michael Robbins ,  Richard Rock

发明人： Joel Bailey ,  Johnny Ortiz ,  Michael Robbins ,  Richard Rock

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： H01L21/32136 ,  H01L21/02087 ,  H01L21/0209 ,  H01L21/3065 ,  H01L21/31116 ,  H01L21/31138 ,  H01L21/6708

摘要： A substrate processing method and apparatus using a combustion flame of a gaseous mixture of hydrogen and a non-oxygen oxidizer is described. The method uses the hydrogen and non-oxygen oxidizer combustion flame to impinge upon a substrate surface for chemically reacting with a thin film on the surface and thus etching the substrate. The method is performed in a substantially inert and non-ionized environment at a substantially atmospheric pressure. An apparatus for processing a substrate with the method has a processing chamber for containing the inert environment and a nozzle head for directing the combustion flame towards a substrate retained upon a substrate holder. In an embodiment, an edge nozzle assembly is angled towards the edge of the wafer for treating the near-edge and edge of the wafer. In this embodiment, a heater preheats the substrate in the near-edge region to be processed.

摘要翻译： 描述了使用氢气和非氧氧化剂的气体混合物的燃烧火焰的衬底处理方法和装置。 该方法使用氢和非氧氧化剂燃烧火焰撞击在衬底表面上以与表面上的薄膜发生化学反应，从而蚀刻衬底。 该方法在基本上为惰性和非电离的环境中在基本上大气压下进行。 用该方法处理衬底的装置具有用于容纳惰性环境的处理室和用于将燃烧火焰引向保持在衬底保持器上的衬底的喷嘴头。 在一个实施例中，边缘喷嘴组件朝向晶片的边缘成角度，用于处理晶片的近边缘和边缘。 在该实施例中，加热器预热待加工的近边缘区域中的基板。

公开(公告)号：US20080011421A1

公开(公告)日：2008-01-17

申请号：US11825669

申请日：2007-07-06

申请人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

发明人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

IPC分类号： C23F1/00

CPC分类号： G01C25/00 ,  H01L21/67069 ,  H01L21/681

摘要： An edge area of the substrate processing device is disclosed. The edge area being processed is isolated from the remainder of the substrate by directing a flow of an inert gas through a plenum near the area to be processed thus forming a barrier while directing a flow of reactive species at an angle relative to the top surface of the substrate towards the substrate edge area thus processing the substrate edge area. A flow of oxygen containing gas into the processing chamber together with a negative exhaust pressure may contribute to the biasing of reactive species and other gases away from the non-processing areas of the substrate. A seal arrangement is provided for the processing chamber.

摘要翻译： 公开了一种基板处理装置的边缘区域。 正在处理的边缘区域与基板的其余部分分离，通过使惰性气体流通过待处理区域附近的增压室，从而形成屏障，同时将反应物流的流动相对于顶部表面成一定角度 基板朝向基板边缘区域，从而处理基板边缘区域。 含氧气体流入处理室和负排气压力可能有助于使反应物质和其他气体偏离基板的非处理区域。 为处理室提供密封装置。

公开(公告)号：US20070062647A1

公开(公告)日：2007-03-22

申请号：US11230263

申请日：2005-09-19

申请人： Joel Bailey ,  Jonathan Doan ,  Paul Forderhase ,  Johnny Ortiz ,  Michael Robbins

发明人： Joel Bailey ,  Jonathan Doan ,  Paul Forderhase ,  Johnny Ortiz ,  Michael Robbins

IPC分类号： H01L21/306 ,  C23F1/00

CPC分类号： H01L21/67063 ,  G03F7/168 ,  H01L21/02087 ,  H01L21/6708

摘要： An isolative substrate edge area processing method and apparatus is described. The apparatus has an isolator for isolating and processing by dry chemical technique a portion of a substrate including a substrate edge region. The isolator has nozzles for directing a flow of reactive species towards the edge area of the substrate and a purge plenum for biasing flow of reactive species towards an exhaust plenum while the substrate rotates on a chuck. Tuned flow control prevents migration of reactive species and reaction byproducts out of the processing area. A method for processing a substrate with the isolator involves directing a flow of reactive species at an angle towards an edge area of the substrate while forming a boundary around the processing area with flow control provided by the purge plenum, and exhaust plenum.

摘要翻译： 描述了隔离衬底边缘区域处理方法和装置。 该装置具有用于通过干化学技术隔离和处理包括衬底边缘区域的衬底的一部分的隔离器。 隔离器具有用于将反应物质流引导到基底的边缘区域的喷嘴和用于在衬底在卡盘上旋转的同时将反应物质的流动偏向排气室的吹扫气室。 调节流量控制可防止反应物质和反应副产物迁离加工区域。 用隔离器处理衬底的方法包括以一定角度朝向衬底的边缘区域引导反应物种的流动，同时通过由净化气室和排气室提供的流动控制在处理区域周围形成边界。

公开(公告)号：US20070258085A1

公开(公告)日：2007-11-08

申请号：US11417297

申请日：2006-05-02

申请人： Michael Robbins ,  Paul Forderhase ,  Joel Bailey ,  Kevin Nguyen

发明人： Michael Robbins ,  Paul Forderhase ,  Joel Bailey ,  Kevin Nguyen

IPC分类号： G01N21/00

CPC分类号： G01N21/9503 ,  G01N21/4738

摘要： A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. The optic is held at an angle from a surface normal to avoid reflective artifacts from the specular surface of the substrate. The optic can be rotated radially relative to a center point of the substrate edge to allow for focused inspection of all surfaces of the substrate edge. The plurality of lights can modulate color and intensity of light to enhance inspection of the substrate for defects.

摘要翻译： 衬底照明和检查系统提供用于照明和检查衬底，特别是衬底边缘。 该系统使用具有设置在其外部或内部的多个光的光漫射器，用于提供衬底的均匀漫射照明。 光扩散器的光学和成像系统外部用于检查包括镜面的基板的多个表面。 光学元件保持与表面法线成一定角度，以避免来自基板的镜面的反射伪影。 光学元件可以相对于基板边缘的中心点径向旋转，以允许对基板边缘的所有表面进行聚焦检查。 多个光可以调制光的颜色和强度，以增强基板对缺陷的检查。

公开(公告)号：US20080017316A1

公开(公告)日：2008-01-24

申请号：US11825671

申请日：2007-07-06

申请人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

发明人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

IPC分类号： C23F1/00 ,  F23Q7/22

CPC分类号： H01L21/67069 ,  G01C25/00 ,  H01J37/32366 ,  H01L21/31116 ,  H01L21/31612 ,  H01L21/6708 ,  H01L21/681

摘要： An edge area of the substrate processing device is disclosed. The edge area being processed is isolated from the remainder of the substrate by directing a flow of an inert gas through a plenum near the area to be processed thus forming a barrier while directing a flow of reactive species at an angle relative to the top surface of the substrate towards the substrate edge area thus processing the substrate edge area. A flow of oxygen containing gas into the processing chamber together with a negative exhaust pressure may contribute to the biasing of reactive species and other gases away from the non-processing areas of the substrate. A clean ignition system is used to ignite the combustion flame.

摘要翻译： 公开了一种基板处理装置的边缘区域。 正在处理的边缘区域与基板的其余部分分离，通过使惰性气体流通过待处理区域附近的增压室，从而形成屏障，同时将反应物流的流动相对于顶部表面成一定角度 基板朝向基板边缘区域，从而处理基板边缘区域。 含氧气体流入处理室和负排气压力可能有助于使反应物质和其他气体偏离基板的非处理区域。 使用干净的点火系统点燃燃烧火焰。

公开(公告)号：US20080010845A1

公开(公告)日：2008-01-17

申请号：US11825670

申请日：2007-07-06

申请人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

发明人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

IPC分类号： G01C25/00 ,  G01D21/00 ,  G06F17/17 ,  H01L21/68

CPC分类号： G01C25/00 ,  H01J37/32366 ,  H01L21/31116 ,  H01L21/31612 ,  H01L21/67069 ,  H01L21/6708 ,  H01L21/681

摘要： A method and apparatus for dry chemical processing a wafer at atmospheric pressure is disclosed. The edge area of a substrate is placed in isolation from the remainder of the substrate. According to the present teachings, a method for centering a wafer on a rotatable chuck is provided. The method includes the steps of positioning a wafer adjacent to a micrometer. The wafer is then rotated and a plurality of wafer edge locations and rotational increments are measured. A center offset value for the value of the wafer center with respect to a chuck is calculated. The wafer is then moved with respect to a center position of the chuck.

摘要翻译： 公开了一种用于在大气压下干燥化学处理晶片的方法和装置。 将衬底的边缘区域与衬底的其余部分隔离放置。 根据本教导，提供了一种用于将晶片定心在可旋转卡盘上的方法。 该方法包括将晶片定位在与千分尺相邻的步骤。 然后旋转晶片，并且测量多个晶片边缘位置和旋转增量。 计算晶片中心相对于卡盘的值的中心偏移值。 然后晶片相对于卡盘的中心位置移动。