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公开(公告)号：US06859258B2
公开(公告)日：2005-02-22
申请号：US10369569
申请日：2003-02-21
摘要： An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.
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公开(公告)号：US07164463B2
公开(公告)日：2007-01-16
申请号：US10369569
申请日：2003-02-21
CPC分类号： G03F7/70833 , G03F7/709
摘要： An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.
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公开(公告)号：US06538720B2
公开(公告)日：2003-03-25
申请号：US09794133
申请日：2001-02-28
IPC分类号： G03B2742
CPC分类号： G03F7/70833 , G03F7/709
摘要： An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.
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4.发明授权Lithographic tool with dual isolation system and method for configuring the same 有权具有双隔离系统的平版印刷工具及其配置方法公开(公告)号：US07158213B2
公开(公告)日：2007-01-02
申请号：US11248141
申请日：2005-10-13
CPC分类号： G03F7/70833 , G03F7/709
摘要： An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.
摘要翻译： 描述了用于配置双隔离系统光刻工具的装置，系统和方法。 隔离的基框架由非隔离的工具结构支持。 晶片台部件由隔离的基架支撑。 晶片台部件提供用于半导体晶片的安装。 分隔板架组件由隔离的底架支撑。 标线片级组件为掩模版提供了一个安装座。 隔离桥提供投影光学装置。 隔离的桥梁由隔离的基架支撑。 或者，隔离桥由非隔离基架支撑。 晶片台组件由非隔离基架支撑。 标线片载物台由非隔离基座支撑。 隔离的光学继电器由非隔离基座支撑。 隔离的光学继电器包括一个或多个单独的伺服控制的框架叶片。
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公开(公告)号：US09669984B2
公开(公告)日：2017-06-06
申请号：US14233923
申请日：2012-05-14
CPC分类号： B65D81/02 , B65B5/04 , G03F1/24 , G03F1/66 , G03F7/70716 , G03F7/70741 , H01L21/67359
摘要： An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device.
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6.发明申请Lithographic Apparatus and Method for Illumination Uniformity Correction and Uniformity Drift Compensation 有权平版印刷设备和照明方法均匀性校正和均匀漂移补偿公开(公告)号：US20100302525A1
公开(公告)日：2010-12-02
申请号：US12789795
申请日：2010-05-28
申请人： Richard Carl ZIMMERMAN , Hendrikus Robertus Marie Van Greevenbroek , Peter C. Kochersperger , Todd R. Downey , Elizabeth Stone , Szilard Istvan Csiszar , Frederick Kubick , Olga Vladimirsky
发明人： Richard Carl ZIMMERMAN , Hendrikus Robertus Marie Van Greevenbroek , Peter C. Kochersperger , Todd R. Downey , Elizabeth Stone , Szilard Istvan Csiszar , Frederick Kubick , Olga Vladimirsky
CPC分类号： G03F7/70191 , G03F7/70058 , G03F7/70133
摘要： A lithographic apparatus including a uniformity correction system is disclosed. Fingers move into and out of intersection with a radiation beam to correct an intensity of the radiation beam. Actuating devices are coupled to the fingers. A width of a tip of each of the fingers is half that of a width of the actuating devices. Systems and methods compensate for uniformity drift. An illumination slit uniformity caused by system drift is measured. First positions of uniformity compensators are determined based on the uniformity. Uniformity compensators are moved to the first respective positions. A substrate is exposed.
摘要翻译： 公开了一种包括均匀性校正系统的光刻设备。 手指进入和离开与辐射束的交叉，以校正辐射束的强度。 驱动装置连接到手指。 每个手指的尖端的宽度是致动装置的宽度的一半。 系统和方法补偿均匀性漂移。 测量由系统漂移引起的照明狭缝均匀度。 均匀性补偿器的第一位置基于均匀性来确定。 均匀性补偿器被移动到第一各个位置。 将基材曝光。
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公开(公告)号：US07549321B2
公开(公告)日：2009-06-23
申请号：US11646612
申请日：2006-12-28
CPC分类号： G01B13/12
摘要： A choked-flow orifice gas gauge proximity sensor for sensing a difference between a reference surface standoff and a measurement surface standoff is disclosed. Unlike existing proximity sensors, the gas gauge proximity sensor of the present invention replaces the use of a mass flow controller with a choked flow orifice. The use of a choked flow orifice provides for reduced equipment cost and improved system reliability. A gas supply forces gas into the proximity sensor. The gas is forced through the choked flow orifice to achieve sonic conditions at which time the mass flow rate becomes largely independent of pressure variations. The flow of gas proceeds from the choked flow orifice into a sensor channel system. A mass flow sensor within the sensor channel system monitors flow rates to detect measurement standoffs that can be used to initiate a control action.
摘要翻译： 公开了一种用于感测参考表面间隔和测量表面间隔之间的差异的扼流流量孔式气体计量计接近传感器。 与现有的接近传感器不同，本发明的气体计量接近传感器替代了具有扼流流量孔口的质量流量控制器的使用。 使用扼流流量孔口可以降低设备成本并提高系统的可靠性。 气体供应迫使气体进入接近传感器。 气体被迫通过扼流流量孔，以实现声音条件，此时质量流量变得很大程度上与压力变化无关。 气流从阻塞流动孔进入传感器通道系统。 传感器通道系统内的质量流量传感器监测流量，以检测可用于启动控制动作的测量间隔。
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公开(公告)号：US09457947B2
公开(公告)日：2016-10-04
申请号：US13651274
申请日：2012-10-12
申请人： Robert Gabriël Maria Lansbergen , Peter C. Kochersperger , David Ramirez , Xugang Xiong , George Hilary Harrold , Arindam Sinharoy
发明人： Robert Gabriël Maria Lansbergen , Peter C. Kochersperger , David Ramirez , Xugang Xiong , George Hilary Harrold , Arindam Sinharoy
CPC分类号： B65D81/02 , B65B5/04 , G03F1/24 , G03F1/66 , G03F7/70716 , G03F7/70741 , H01L21/67359
摘要： An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device.
摘要翻译： 一种用于保持图案形成装置的装置和方法，其被配置成在其横截面中赋予具有图案的辐射束。 该装置包括：基座，其被配置为支撑图案形成装置;以及内罩，其可连接到底座。 所述内盖包括约束机构，所述约束机构在施加所述内盖外部的力时被配置为向所述图案形成装置提供面内力以限制所述图案形成装置的移动，所述面内力基本上平行 到图案形成装置的图案化表面。
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公开(公告)号：US08159647B2
公开(公告)日：2012-04-17
申请号：US12170120
申请日：2008-07-09
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Peter C. Kochersperger , Kars Zeger Troost
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Peter C. Kochersperger , Kars Zeger Troost
CPC分类号： G03F7/707 , G03F7/70283 , G03F7/70291 , G03F7/703 , G03F7/70783
摘要： A maskless lithography system has a patterning array assembly formed by a plurality of patterning arrays, each patterning array having a substrate. Each patterning array has a plurality of individually controllable elements to endow an incoming radiation beam with a patterned cross-section. To reduce the global unflatness of the patterning array assembly that is oriented in a first plane, the position of at least one substrate of a patterning array is adjusted to a second orientation. Reduction of the global unflatness of the patterning array assembly reduces a telecentricity error without introducing additional error into the maskless lithography system.
摘要翻译： 无掩模光刻系统具有由多个图案化阵列形成的图案阵列组件，每个图案阵列具有衬底。 每个图案阵列具有多个可独立控制的元件，以赋予具有图案化横截面的入射辐射束。 为了减小在第一平面中定向的图案阵列组件的全局不平坦度，将图案化阵列的至少一个衬底的位置调整到第二取向。 降低图形阵列组件的全局不平坦性减少了远心误差，而不会在无掩模光刻系统中引入额外的误差。
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公开(公告)号：US20140144805A1
公开(公告)日：2014-05-29
申请号：US14233923
申请日：2012-05-14
CPC分类号： B65D81/02 , B65B5/04 , G03F1/24 , G03F1/66 , G03F7/70716 , G03F7/70741 , H01L21/67359
摘要： An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device.
摘要翻译： 一种用于保持图案形成装置的装置和方法，其被配置成在其横截面中赋予具有图案的辐射束。 该装置包括：基座，其被配置为支撑图案形成装置;以及内罩，其可连接到底座。 所述内盖包括约束机构，所述约束机构在施加所述内盖外部的力时被配置为向所述图案形成装置提供面内力以限制所述图案形成装置的移动，所述面内力基本上平行 到图案形成装置的图案化表面。
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