-
公开(公告)号：US06859258B2
公开(公告)日：2005-02-22
申请号：US10369569
申请日：2003-02-21
摘要： An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.
-
公开(公告)号：US07164463B2
公开(公告)日：2007-01-16
申请号：US10369569
申请日：2003-02-21
CPC分类号： G03F7/70833 , G03F7/709
摘要： An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.
-
公开(公告)号：US06538720B2
公开(公告)日：2003-03-25
申请号：US09794133
申请日：2001-02-28
IPC分类号： G03B2742
CPC分类号： G03F7/70833 , G03F7/709
摘要： An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.
-
4.发明授权Lithographic tool with dual isolation system and method for configuring the same 有权具有双隔离系统的平版印刷工具及其配置方法公开(公告)号：US07158213B2
公开(公告)日：2007-01-02
申请号：US11248141
申请日：2005-10-13
CPC分类号： G03F7/70833 , G03F7/709
摘要： An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.
摘要翻译： 描述了用于配置双隔离系统光刻工具的装置，系统和方法。 隔离的基框架由非隔离的工具结构支持。 晶片台部件由隔离的基架支撑。 晶片台部件提供用于半导体晶片的安装。 分隔板架组件由隔离的底架支撑。 标线片级组件为掩模版提供了一个安装座。 隔离桥提供投影光学装置。 隔离的桥梁由隔离的基架支撑。 或者，隔离桥由非隔离基架支撑。 晶片台组件由非隔离基架支撑。 标线片载物台由非隔离基座支撑。 隔离的光学继电器由非隔离基座支撑。 隔离的光学继电器包括一个或多个单独的伺服控制的框架叶片。
-
5.发明授权Method and system for operating an air gauge at programmable or constant standoff 有权用于在可编程或恒定间距下操作气压计的方法和系统公开(公告)号：US07797985B2
公开(公告)日：2010-09-21
申请号：US12209487
申请日：2008-09-12
IPC分类号： G01B13/08
CPC分类号： G03F7/70775 , G01B13/02 , G03F9/7023 , G03F9/7057 , G03F9/7088
摘要： Provided are a methods and systems for determining a topography of an object. In an embodiment, a system includes a reference probe configured to measure a surface of a reference surface and to generate a reference signal, a measuring probe configured to measure a surface of an object and to generate a measurement signal, a sensor configured to sense a position of the measuring probe and to generate a sensor signal, and a combiner configured to receive the sensor signal and the measurement signal and to generate a combination signal therefrom. A desired distance between the measuring probe and the object is substantially maintained by adjusting the position of the measuring probe based on the measurement signal. A topography of the object is determined based at least on a comparison of the reference signal and the combination signal.
摘要翻译： 提供了一种用于确定对象的形貌的方法和系统。 在一个实施例中，系统包括被配置为测量参考表面的表面并产生参考信号的参考探针，配置成测量物体的表面并产生测量信号的测量探针，被配置为感测 测量探针的位置并产生传感器信号，以及组合器，被配置为接收传感器信号和测量信号并从其产生组合信号。 通过基于测量信号调整测量探针的位置，基本上保持了测量探针和物体之间的期望距离。 至少基于参考信号和组合信号的比较来确定对象的地形。
-
6.发明授权Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors 有权利用传感器的计量系统的光刻设备和设备制造方法公开(公告)号：US07369214B2
公开(公告)日：2008-05-06
申请号：US11201162
申请日：2005-08-11
申请人： Daniel N. Galburt
发明人： Daniel N. Galburt
IPC分类号： G03B27/52
CPC分类号： G03F9/7003 , G03F9/7034 , G03F9/7088
摘要： A system and method include an object supported on a moveable support, an optical system that transmits radiation onto the object, a support having an aperture therethrough, a sensor system coupled to the support, and a control system coupled to the sensor system and the moveable support. The sensor system is arranged with respect to the aperture to measure a surface of the object and send measurement signals to the control system, such that the control system generates control signals received and used by the moveable support to ensure that the surface of the object receiving light transmitted by the optical system through the aperture is in a focus plane of the optical system.
摘要翻译： 系统和方法包括支撑在可移动支撑件上的物体，将辐射透射到物体上的光学系统，具有穿过其中的孔的支撑件，耦合到支撑件的传感器系统以及耦合到传感器系统的控制系统和可移动的 支持。 传感器系统相对于孔布置以测量物体的表面并将测量信号发送到控制系统，使得控制系统产生由可移动支撑件接收和使用的控制信号，以确保物体的表面接收 由光学系统通过孔传播的光在光学系统的聚焦平面内。
-
公开(公告)号：US07196775B2
公开(公告)日：2007-03-27
申请号：US10922862
申请日：2004-08-23
申请人： Daniel N. Galburt
发明人： Daniel N. Galburt
CPC分类号： G03F7/707 , G03F7/70708
摘要： A system and method that eliminate or substantially reduce slippage of a pattern generator with respect to a pattern generator holding device during a scanning portion of an exposure operation. In first and second examples, this is done by either (a) continuously or (b) when needed concurrently using first and second pattern generator holding systems to hold the pattern generator to the pattern generator holding device. In these examples, the first pattern generator holding systems utilizes an electrostatic system to attract the pattern generator to the pattern generator holding device and the second pattern generator holding system utilizes a vacuum system to attract the pattern generator to the pattern generator holding device.
摘要翻译： 一种在曝光操作的扫描部分期间消除或显着地减少图案发生器相对于图案发生器保持装置的滑动的系统和方法。 在第一和第二示例中，这可以通过（a）连续地或（b）同时使用第一和第二图案发生器保持系统将图案发生器保持到图案发生器保持装置来完成。 在这些示例中，第一图案发生器保持系统利用静电系统将图案发生器吸引到图案发生器保持装置，并且第二图案发生器保持系统利用真空系统将图案发生器吸引到图案发生器保持装置。
-
公开(公告)号：US07021121B2
公开(公告)日：2006-04-04
申请号：US10854429
申请日：2004-05-27
IPC分类号： G01B13/08
CPC分类号： G01B13/12
摘要： A gas gauge proximity sensor modulates a gas stream that is used to feed reference and measurement air gauges, respectively, in a reference portion proximate a reference surface and a measurement portion proximate a measurement surface. The gas stream can be modulated at a frequency at which there is minimal acoustical interference energy (e.g., minimal noise) in demodulated output signal. The sensor output can be filtered so that a measurement signal includes only the modulated frequency and side bands of that frequency to include the desired response band of the device as a whole. The filtered signal can be demodulated using a demodulator operating at a same frequency as the modulator to produce the demodulated output signal. In this embodiment, substantially only ambient acoustical energy in the band pass region may interfere with the device operation. Alternatively, the modulation can be introduced through the reference portion. A reference nozzle sets up a pressure field with the reference surface. A carrier frequency can be generated by mechanical motion of the reference surface. For example, this motion can be introduced by a mechanism like a piezoelectric device or a voice coil coupled to the reference surface. The modulated gas flow combines with the other gas flows to produce a modulated combined gas flow.
摘要翻译： 气体计量接近传感器调节用于分别在靠近参考表面的参考部分和靠近测量表面的测量部分供给参考和测量气量计的气流。 气体流可以在解调输出信号中具有最小声学干扰能量（例如最小噪声）的频率下进行调制。 可以对传感器输出进行滤波，使得测量信号仅包括该频率的调制频率和边带，以包括整个设备的期望响应频带。 可以使用与调制器工作在相同频率的解调器来解调经滤波的信号，以产生解调的输出信号。 在该实施例中，带通区域中基本上只有环境声能可能会干扰器件操作。 或者，可以通过参考部分引入调制。 参考喷嘴与参考表面建立一个压力场。 可以通过参考表面的机械运动来产生载波频率。 例如，该运动可以通过耦合到参考表面的压电装置或音圈等机构引入。 经调制的气流与其他气流结合以产生调制的组合气流。
-
公开(公告)号：US06989889B2
公开(公告)日：2006-01-24
申请号：US11110903
申请日：2005-04-21
申请人： Daniel N. Galburt
发明人： Daniel N. Galburt
CPC分类号： G03F7/70758 , G03F7/70833 , G03F7/709
摘要： A method, system, and apparatus for management of reaction loads in a lithography system is described. An isolated structure is supported by a non-isolated structure. The isolated structure supports a moveable stage. A linear motor includes a first linear motor element and a second linear motor element. The first linear motor element is coupled to the moveable stage. A plurality of parallel flexure plates mount the second linear motor element on the isolated structure. A flexure rod is coupled between the non-isolated structure and the second linear motor element.
-
公开(公告)号：US06784978B2
公开(公告)日：2004-08-31
申请号：US10095070
申请日：2002-03-12
申请人： Daniel N. Galburt
发明人： Daniel N. Galburt
IPC分类号： G03B2758
CPC分类号： G03F7/70758 , G03F7/70833 , G03F7/709
摘要： A method, system, and apparatus for management of reaction loads in a lithography system is described. An isolated structure is supported by a non-isolated structure. The isolated structure supports a moveable stage. A linear motor includes a first linear motor element and a second linear motor element. The first linear motor element is coupled to the moveable stage. A plurality of parallel flexure plates mount the second linear motor element on the isolated structure. A flexure rod is coupled between the non-isolated structure and the second linear motor element.
-
-
-
-
-
-
-
-
-
搜索结果
39 条记录 (耗时 0.024 秒)
