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    Lithographic apparatus and device manufacturing method
    1.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US08159647B2

    公开(公告)日：2012-04-17

    申请号：US12170120

    申请日：2008-07-09

    申请人： Arno Jan Bleeker ,  Dominicus Jacobus Petrus Adrianus Franken ,  Peter C. Kochersperger ,  Kars Zeger Troost

    发明人： Arno Jan Bleeker ,  Dominicus Jacobus Petrus Adrianus Franken ,  Peter C. Kochersperger ,  Kars Zeger Troost

    IPC分类号： G03B27/68 ,  G03B27/42

    CPC分类号： G03F7/707 ,  G03F7/70283 ,  G03F7/70291 ,  G03F7/703 ,  G03F7/70783

    摘要： A maskless lithography system has a patterning array assembly formed by a plurality of patterning arrays, each patterning array having a substrate. Each patterning array has a plurality of individually controllable elements to endow an incoming radiation beam with a patterned cross-section. To reduce the global unflatness of the patterning array assembly that is oriented in a first plane, the position of at least one substrate of a patterning array is adjusted to a second orientation. Reduction of the global unflatness of the patterning array assembly reduces a telecentricity error without introducing additional error into the maskless lithography system.

    摘要翻译： 无掩模光刻系统具有由多个图案化阵列形成的图案阵列组件，每个图案阵列具有衬底。 每个图案阵列具有多个可独立控制的元件，以赋予具有图案化横截面的入射辐射束。 为了减小在第一平面中定向的图案阵列组件的全局不平坦度，将图案化阵列的至少一个衬底的位置调整到第二取向。 降低图形阵列组件的全局不平坦性减少了远心误差，而不会在无掩模光刻系统中引入额外的误差。

    Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus
    8.
    发明授权
    Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus 有权
    光刻设备，设备制造方法和用于光刻设备的投影元件

    公开(公告)号：US07474384B2

    公开(公告)日：2009-01-06

    申请号：US10994201

    申请日：2004-11-22

    申请人： Arno Jan Bleeker ,  Dominicus Jacobus Petrus Adrianus Franken ,  Stephen Roux ,  Michael L. Nelson

    发明人： Arno Jan Bleeker ,  Dominicus Jacobus Petrus Adrianus Franken ,  Stephen Roux ,  Michael L. Nelson

    IPC分类号： G03B27/54 ,  G03B27/52

    CPC分类号： G03F7/709 ,  G03F7/70258 ,  G03F7/70308

    摘要： A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and a projection system having a projection element for projecting the patterned beam onto a target portion of a substrate. The apparatus further comprises an actuator for moving the projection element for shifting the patterned beam that is projected onto the substrate during at least one pulse of the radiation system. This can be done to compensate for a positional error between a substrate table holding the substrate and an aerial image of the projection system. The positional error could occur due to mechanical vibrations in the frame system of the lithographic apparatus.

    摘要翻译： 公开了一种用于光刻设备的光刻设备，设备制造方法和投影元件。 光刻设备具有用于提供脉冲辐射束的辐射系统，用于将光束赋予图案以形成图案化辐射束的图案形成装置，以及具有用于将图案化光束投影到目标部分的投影元件的投影系统 底物。 该装置还包括用于移动投影元件的致动器，用于移动在辐射系统的至少一个脉冲期间投影到基板上的图案化光束。 这可以进行以补偿保持基板的基板台与投影系统的空中图像之间的位置误差。 位置误差可能由于光刻设备的框架系统中的机械振动而发生。

    Assembly
    9.
    发明授权
    Assembly 有权
    部件

    公开(公告)号：US07525637B2

    公开(公告)日：2009-04-28

    申请号：US12073127

    申请日：2008-02-29

    申请人： Dominicus Jacobus Petrus Adrianus Franken

    发明人： Dominicus Jacobus Petrus Adrianus Franken

    IPC分类号： G03B27/42 ,  G02B26/08 ,  G02B7/02 ,  G03B27/54

    CPC分类号： G03F7/70825

    摘要： An assembly includes a first element having a predetermined functionality that is to be positioned with respect to a second element. The elements are arranged in a spaced relationship on a support frame. The support frame is provided with an interface surface formed on or in the support frame for receiving the first element. The interface surface determines the position of the first element with respect to the second element, and is configured in accordance with the predetermined functionality so that the first element is positionable with respect to the second element with at least three degrees of freedom.

    摘要翻译： 组件包括具有相对于第二元件定位的预定功能的第一元件。 元件在支撑框架上以间隔的关系布置。 支撑框架设置有形成在支撑框架上或其中的接口表面，用于接收第一元件。 界面表面确定第一元件相对于第二元件的位置，并且根据预定的功能来配置，使得第一元件可相对于具有至少三个自由度的第二元件定位。

    Lithographic apparatus and device manufacturing method
    10.
    发明授权
    Lithographic apparatus and device manufacturing method 失效
    光刻设备和器件制造方法

    公开(公告)号：US07397531B2

    公开(公告)日：2008-07-08

    申请号：US10960784

    申请日：2004-10-08

    申请人： Dominicus Jacobus Petrus Adrianus Franken

    发明人： Dominicus Jacobus Petrus Adrianus Franken

    IPC分类号： G03B27/52 ,  G03B27/68 ,  G02B7/02

    CPC分类号： G03F7/70891 ,  G21K1/06 ,  G21K2201/065

    摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the projection beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one of the patterning device, or the projection system, and the illumination system includes a reflector assembly that includes a reflector substrate with a reflective surface for reflecting part of incident radiation, and a heat exchanger system that is constructed and arranged to exchange heat with the reflector substrate. The heat exchanger system includes a thermally active element that is disposed in a recess of the reflector substrate at a side of the reflector substrate that is different from the reflective surface.

    摘要翻译： 光刻设备包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于使投影光束在其横截面上具有图案。 该装置还包括用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 图案形成装置或投影系统中的至少一个以及照明系统包括反射器组件，该反射器组件包括具有用于反射入射辐射的一部分的反射表面的反射器基板，以及构造和布置成交换热量的热交换器系统 与反射器基板。 热交换器系统包括热活性元件，该热活性元件设置在反射器基板的与反射表面不同的一侧的凹部中。