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公开(公告)号：US08642232B2
公开(公告)日：2014-02-04
申请号：US13678692
申请日：2012-11-16
CPC分类号： G03B27/522 , G03F7/2051 , G03F7/70383
摘要： Direct-write lithography apparatus and methods are disclosed in which a transducer image and an image of crossed interference fringe patterns are superimposed on a photoresist layer supported by a substrate. The transducer image has an exposure wavelength and contains bright spots, each corresponding to an activated pixel. The interference image has an inhibition wavelength and contains dark spots where the null points in the crossed interference fringes coincide. The dark spots are aligned with and trim the peripheries of the corresponding bright spot to form sub-resolution photoresist pixels having a size smaller than would be formed in the absence of the dark spots.
摘要翻译： 公开了直接写入光刻设备和方法，其中传感器图像和交叉干涉条纹图案的图像叠加在由衬底支撑的光致抗蚀剂层上。 换能器图像具有曝光波长并且包含亮点，每个对应于激活的像素。 干涉图像具有抑制波长，并且包含交叉干涉条纹中的零点重合的暗点。 黑点与对应的亮点的周边对准并修剪，以形成尺寸小于在不存在黑点的情况下形成的分辨率的光致抗蚀剂像素。
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公开(公告)号：US09304410B2
公开(公告)日：2016-04-05
申请号：US14143139
申请日：2013-12-30
CPC分类号： G03F7/7045 , G03F7/70191 , G03F7/70291 , G03F7/70375 , G03F7/70383 , G03F7/70408 , G03F7/70466
摘要： Direct-write lithography apparatus and methods are disclosed in which a transducer image and an image of crossed interference fringe patterns are superimposed on a photoresist layer supported by a substrate. The transducer image has an exposure wavelength and contains bright spots, each corresponding to an activated pixel. The interference image has an inhibition wavelength and contains dark spots where the null points in the crossed interference fringes coincide. The dark spots are aligned with and trim the peripheries of the corresponding bright spot to form sub-resolution photoresist pixels having a size smaller than would be formed in the absence of the dark spots.
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公开(公告)号：US20130130182A1
公开(公告)日：2013-05-23
申请号：US13678692
申请日：2012-11-16
CPC分类号： G03B27/522 , G03F7/2051 , G03F7/70383
摘要： Direct-write lithography apparatus and methods are disclosed in which a transducer image and an image of crossed interference fringe patterns are superimposed on a photoresist layer supported by a substrate. The transducer image has an exposure wavelength and contains bright spots, each corresponding to an activated pixel. The interference image has an inhibition wavelength and contains dark spots where the null points in the crossed interference fringes coincide. The dark spots are aligned with and trim the peripheries of the corresponding bright spot to form sub-resolution photoresist pixels having a size smaller than would be formed in the absence of the dark spots.
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4.发明申请Apparatus and method of direct writing with photons beyond the diffraction limit 审中-公开用光子直接写入超过衍射极限的装置和方法公开(公告)号：US20150331330A1
公开(公告)日：2015-11-19
申请号：US14143139
申请日：2013-12-30
IPC分类号： G03F7/20
CPC分类号： G03F7/7045 , G03F7/70191 , G03F7/70291 , G03F7/70375 , G03F7/70383 , G03F7/70408 , G03F7/70466
摘要： Direct-write lithography apparatus and methods are disclosed in which a transducer image and an image of crossed interference fringe patterns are superimposed on a photoresist layer supported by a substrate. The transducer image has an exposure wavelength and contains bright spots, each corresponding to an activated pixel. The interference image has an inhibition wavelength and contains dark spots where the null points in the crossed interference fringes coincide. The dark spots are aligned with and trim the peripheries of the corresponding bright spot to form sub-resolution photoresist pixels having a size smaller than would be formed in the absence of the dark spots.
摘要翻译： 公开了直接写入光刻设备和方法，其中传感器图像和交叉干涉条纹图案的图像叠加在由衬底支撑的光致抗蚀剂层上。 换能器图像具有曝光波长并且包含亮点，每个对应于激活的像素。 干涉图像具有抑制波长，并且包含交叉干涉条纹中的零点重合的暗点。 黑点与对应的亮点的周边对准并修剪，以形成尺寸小于在不存在黑点的情况下形成的分辨率的光致抗蚀剂像素。
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公开(公告)号：US09195139B2
公开(公告)日：2015-11-24
申请号：US14244942
申请日：2014-04-04
申请人： David A. Markle , John S. Petersen
发明人： David A. Markle , John S. Petersen
CPC分类号： G03F7/26 , G03F7/2022 , G03F7/203 , G03F7/2051 , G03F7/7015 , G03F7/70383 , G03F7/70466
摘要： Methods of and apparatus for performing direct-write lithography in a two-color photoresist layer are disclosed. The method includes exposing the two-color photoresist layer with transducer and inhibition images that respectively define bright spots and dark spots. The transducer image generates excited-state photo-molecules while the inhibition image converts the exited-state photo-molecules to an unexcited state that is not susceptible to conversion to an irreversible exposed state. The dark spots and bright spots are aligned, with the dark spots being smaller than the bright spots so that a portion of the excited-state photo-molecules adjacent the periphery of the bright spots absorb the inhibition radiation and transition to the unexcited state while a portion of the excited photo-molecules at the center of bright spots are not exposed to the inhibition light and transition to an irreversible exposed state. This forms in the two-color photoresist layer a pattern of sub-resolution photoresist pixels.
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6.发明申请Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist 有权使用双色光刻胶直接写入光子超过衍射极限的装置和方法公开(公告)号：US20150185617A1
公开(公告)日：2015-07-02
申请号：US14244942
申请日：2014-04-04
申请人： David A. Markle , John S. Petersen
发明人： David A. Markle , John S. Petersen
IPC分类号： G03F7/20
CPC分类号： G03F7/26 , G03F7/2022 , G03F7/203 , G03F7/2051 , G03F7/7015 , G03F7/70383 , G03F7/70466
摘要： Methods of and apparatus for performing direct-write lithography in a two-color photoresist layer are disclosed. The method includes exposing the two-color photoresist layer with transducer and inhibition images that respectively define bright spots and dark spots. The transducer image generates excited-state photo-molecules while the inhibition image converts the exited-state photo-molecules to an unexcited state that is not susceptible to conversion to an irreversible exposed state. The dark spots and bright spots are aligned, with the dark spots being smaller than the bright spots so that a portion of the excited-state photo-molecules adjacent the periphery of the bright spots absorb the inhibition radiation and transition to the unexcited state while a portion of the excited photo-molecules at the center of bright spots are not exposed to the inhibition light and transition to an irreversible exposed state. This forms in the two-color photoresist layer a pattern of sub-resolution photoresist pixels.
摘要翻译： 公开了在双色光致抗蚀剂层中进行直写光刻的方法和装置。 该方法包括用分别限定亮点和暗点的换能器和抑制图像曝光双色光致抗蚀剂层。 换能器图像产生激发态光分子，而抑制图像将退出状态的光分子转换为不易转化为不可逆的暴露状态的未激发状态。 黑点和亮点对准，暗点小于亮点，使得与亮点周边相邻的激发态光分子的一部分吸收抑制辐射并转变到未激发状态，而 在亮点中心处的激发的光分子的一部分不暴露于抑制光并转变到不可逆的暴露状态。 这在双色光致抗蚀剂层中形成了次分辨光致抗蚀剂像素的图案。
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7.发明授权公开(公告)号：US08559014B2
公开(公告)日：2013-10-15
申请号：US12924244
申请日：2010-09-23
申请人： Hwan J. Jeong , David A. Markle
发明人： Hwan J. Jeong , David A. Markle
IPC分类号： G01B9/02
CPC分类号： G02B27/58 , A61B6/5282
摘要： High-resolution, common-path interferometric imaging systems and methods are described, wherein a light source generates and directs light toward a sample from different directions. An optical imaging system collects the resultant scattered and unscattered components. A variable phase shifting system adjusts the relative phase of the components. The interfered components are sensed by an image sensing system. The process is repeated multiple times with different phase shifts to form corresponding multiple electronic signals representative of raw sample images, which are processed by a signal processor to form a processed image. Multiple processed images, each corresponding to a different illumination azimuth angle, are combined to extend the system resolution.
摘要翻译： 描述了高分辨率，公共路径干涉成像系统和方法，其中光源从不同的方向产生并指向样品。 光学成像系统收集所得的散射和未散射的部件。 可变相移系统调整组件的相对相位。 受干扰的部件由图像感测系统感测。 该过程以不同的相移重复多次以形成表示原始样本图像的对应的多个电子信号，其由信号处理器处理以形成经处理的图像。 组合多个处理后的图像，每个对应于不同的照明方位角，以扩展系统分辨率。
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8.发明授权Apparatuses and methods for irradiating a substrate to avoid substrate edge damage 有权用于照射衬底以避免衬底边缘损坏的装置和方法公开(公告)号：US08314360B2
公开(公告)日：2012-11-20
申请号：US13164700
申请日：2011-06-20
申请人： Boris Grek , David A. Markle
发明人： Boris Grek , David A. Markle
IPC分类号： H01L21/268
CPC分类号： B23K26/0853 , B23K26/0006 , B23K26/352 , B23K26/40 , B23K26/703 , B23K2101/40 , B23K2103/50 , B23K2103/56
摘要： Apparatuses and methods are provided for processing a substrate having an upper surface that includes a central region, a peripheral region, and an edge adjacent to the peripheral region. An image having an intensity sufficient to effect thermal processing of the substrate is scanned across the upper surface of the substrate. The image scanning geometry allows processing the central region of the substrate at a substantially uniform temperature without damaging the outer edge. In some instances, the image may be formed from a beam traveling over at least a portion of the central region so that no portion thereof directly illuminates any portion of the edge when the image is scanned across the periphery region. The substrate may be rotated 180° or the beam direction may be switched after part of the scanning operation has been completed.
摘要翻译： 提供了用于处理具有上表面的基板的装置和方法，所述上表面包括中心区域，周边区域和与周边区域相邻的边缘。 在衬底的上表面上扫描具有足以实现衬底的热处理的强度的图像。 图像扫描几何形状允许以基本均匀的温度处理基板的中心区域而不损坏外边缘。 在一些情况下，图像可以由在中心区域的至少一部分上行进的光束形成，使得当图像跨过周边区域扫描图像时，它的任何部分都不直接照亮边缘的任何部分。 基板可以旋转180°，或者在部分扫描操作完成之后可以切换光束方向。
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9.发明授权公开(公告)号：US07767927B2
公开(公告)日：2010-08-03
申请号：US11129971
申请日：2005-05-16
申请人： David A. Markle
发明人： David A. Markle
CPC分类号： G01K11/125 , G01J5/0003 , G01J5/58 , G01J2005/0077
摘要： Methods and apparatus for remotely measuring temperature of a specular surface. Method takes two measurements of P-polarized radiation emitted at or near Brewster angle from the surface. First measurement (SA) collects and detects first amount of radiation emitted directly from a surface portion using a collection optical system. Second measurement (SB) includes first amount of radiation and adds quantity of radiation collected at or near at/near Brewster angle and reflected from the surface with a retro optical system with a round-trip transmission t2 that retro-reflects a quantity of radiation received from surface portion back to same surface portion where it reflects and combines with first amount of radiation collected by collection optical system. Measurements SA and SB and t2 are used to determine surface emissivity (ξ). Calibration curve is used that relates ratio of the first measurement SA to surface emissivity (SA/ξ), to surface temperature. Surface temperature determined from SA/ξ by calibration curve.
摘要翻译： 用于远程测量镜面温度的方法和装置。 方法采用两个来自表面布鲁斯特角附近发射的P偏振辐射的测量。 第一测量（SA）使用收集光学系统收集并检测直接从表面部分发射的辐射量。 第二测量（SB）包括第一量的辐射，并增加在布鲁斯特角附近或附近收集的辐射量，并用具有回射反射接收的辐射量的往复传输t2的复古光学系统从表面反射 从表面部分返回到其反射的相同表面部分，并与由收集光学系统收集的第一量的辐射组合。 测量SA和SB和t2用于确定表面发射率（＆xgr。）。 使用校准曲线，其将第一测量SA与表面发射率（SA / xgr）的比率与表面温度相关联。 表面温度由SA /＆xgr; 通过校准曲线。
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公开(公告)号：US07763828B2
公开(公告)日：2010-07-27
申请号：US10653625
申请日：2003-09-02
申请人： Somit Talwar , David A. Markle
发明人： Somit Talwar , David A. Markle
CPC分类号： B23K26/0604 , B23K26/073 , B23K2101/40
摘要： A method and apparatus for performing laser thermal processing (LTP) using a two-dimensional array of laser diodes to form a line image, which is scanned across a substrate. The apparatus includes a two-dimensional array of laser diodes, the radiation from which is collimated in one plane using a cylindrical lens array, and imaged onto the substrate as a line image using an anomorphic, telecentric optical imaging system. The apparatus also includes a scanning substrate stage for supporting a substrate to be LTP processed. The laser diode radiation beam is incident on the substrate at angles at or near the Brewster's angle for the given substrate material and the wavelength of the radiation beam, which is linearly P-polarized. The use of a two-dimensional laser diode array allows for a polarized radiation beam of relatively high energy density to be delivered to the substrate, thereby allowing for LTP processing with good uniformity, reasonably short dwell times, and thus reasonably high throughput.
摘要翻译： 一种使用激光二极管的二维阵列进行激光热处理（LTP）的方法和装置，以形成跨越衬底扫描的线像。 该装置包括激光二极管的二维阵列，使用柱面透镜阵列在一个平面中准直的辐射，并使用异常远心光学成像系统作为线图像成像到基板上。 该装置还包括用于支撑待处理LTP的衬底的扫描衬底台。 对于给定的衬底材料，激光二极管辐射束以布鲁斯特角度或附近的角度入射到衬底上，并且是线性P偏振的辐射束的波长。 使用二维激光二极管阵列允许将相对较高能量密度的偏振辐射束输送到衬底，从而允许LTP处理具有良好的均匀性，合理短的停留时间，并因此允许相当高的通量。
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