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    Plasma source
    1.
    发明授权
    Plasma source 失效
    等离子体源

    公开(公告)号：US06710524B2

    公开(公告)日：2004-03-23

    申请号：US09828737

    申请日：2001-04-09

    Applicant: Desmond Gibson

    Inventor： Desmond Gibson

    IPC: H01J1726

    CPC classification number: H01J37/32009 ,  H01J37/321 ,  H01J37/32192 ,  H01J37/3233 ,  H05H1/46

    Abstract: A plasma source comprises a thermionic emitter (2) heated by an induction coil (7), which also provides radiofrequency energy within an electrically insulated cylindrical former (1). A cylindrical anode (10) is concentric with emitter (2) and axially displaced therefrom, generating a potential difference between anode (10) and emitter (2). The potential difference between anode (2) and ground and axial magnetic fields causes the plasma to be extracted from the source. Emitter (2) is held at negative potential via a conductive support (5). Process gas is introduced near emitter (2) and a secondary gas injected in the anode space. Radiofrequency excitation of emitter (2) generates electrons via thermionic and field effects, resulting in efficient plasma generation. Both electron generation effects contribute to a broad energy spectrum of electrons, providing effective neutralization of the plasma. Moreover, the time varying axial magnetic field induced by coil (7) in the vicinity of emitter (2) provides enhancement of plasma generation and confinement of plasma to minimize erosion of emitter (2).

    Abstract translation: 等离子体源包括由感应线圈（7）加热的热离子发射器（2），其也在电绝缘圆柱形成形器（1）内提供射频能量。 圆柱形阳极（10）与发射体（2）同心并且与其轴向偏移，产生阳极（10）和发射极（2）之间的电位差。 阳极（2）与地面和轴向磁场之间的电位差导致等离子体从源中提取。 发射极（2）通过导电支撑（5）保持在负电位。 在发射极（2）附近引入工艺气体，并在阳极空间注入二次气体。 发射极（2）的射频激发通过热离子和场效应产生电子，从而产生有效的等离子体产生。 电子产生效应都有助于电子的宽能谱，提供等离子体的有效中和。 此外，由发射极（2）附近的线圈（7）感应的时变轴向磁场提供等离子体产生和限制等离子体的增强，以最小化发射极（2）的侵蚀。

    Coating of optical substrates using closed field system
    2.
    发明授权
    Coating of optical substrates using closed field system 有权
    使用封闭场系统涂覆光学基片

    公开(公告)号：US09562283B2

    公开(公告)日：2017-02-07

    申请号：US11575953

    申请日：2005-09-26

    Applicant: Desmond Gibson ,  John Michael Walls

    Inventor： Desmond Gibson ,  John Michael Walls

    IPC: C23C14/00 ,  C23C14/35 ,  C23C14/50 ,  C23C14/10 ,  C23C14/06 ,  C23C14/54 ,  C23C14/08 ,  H01J37/34

    CPC classification number: C23C14/54 ,  C23C14/0036 ,  C23C14/0078 ,  C23C14/06 ,  C23C14/0682 ,  C23C14/082 ,  C23C14/10 ,  C23C14/352 ,  C23C14/505 ,  H01J37/3405

    Abstract: The invention relates to apparatus and a method for depositing material onto substrates, particularly optical substrates, to form a coating thereon. The apparatus and method incorporates the use of a series of magnetrons provided to be controlled to sputter deposit material provided in targets mounted therein, on to the substrates. There is provided a voltage to the magnetrons to operate the same and the level of voltage which is required to form required coating or coating layer characteristics is determined by using monitoring apparatus, at least when forming the coating or coating layer for the first time. The appropriate voltage level data for operation of the magnetrons can be held in a database and subsequently used to control the voltage level when forming an identified coating or layers of coatings.

    Abstract translation: 本发明涉及用于将材料沉积到基材上，特别是光学基底上以在其上形成涂层的装置和方法。 该装置和方法包括使用一系列被控制的磁控管，以将设置在其中的靶中的沉积材料溅射到基板上。 向磁控管提供电压以进行操作，并且通过使用监测装置来确定形成所需涂层或涂层特性所需的电压水平，至少在首次形成涂层或涂层时。 用于操作磁控管的适当电压电平数据可以保存在数据库中，随后用于在形成所识别的涂层或涂层时控制电压电平。

    Coating of Optical Substrates Using Closed Field System
    4.
    发明申请
    Coating of Optical Substrates Using Closed Field System 有权
    使用封闭场系统涂覆光学基片

    公开(公告)号：US20080223715A1

    公开(公告)日：2008-09-18

    申请号：US11575953

    申请日：2005-09-26

    Applicant: Desmond Gibson ,  John Michael Walls

    Inventor： Desmond Gibson ,  John Michael Walls

    IPC: C23C14/35 ,  H01J37/32

    CPC classification number: C23C14/54 ,  C23C14/0036 ,  C23C14/0078 ,  C23C14/06 ,  C23C14/0682 ,  C23C14/082 ,  C23C14/10 ,  C23C14/352 ,  C23C14/505 ,  H01J37/3405

    Abstract: The invention relates to apparatus and a method for depositing material onto substrates, particularly optical substrates, to form a coating thereon. The apparatus and method incorporates the use of a series of magnetrons provided to be controlled to sputter deposit material provided in targets mounted therein, on to the substrates. There is provided a voltage to the magnetrons to operate the same and the level of voltage which is required to form required coating or coating layer characteristics is determined by using monitoring apparatus, at least when forming the coating or coating layer for the first time. The appropriate voltage level data for operation of the magnetrons can be held in a database and subsequently used to control the voltage level when forming an identified coating or layers of coatings.

    Abstract translation: 本发明涉及用于将材料沉积到基材上，特别是光学基底上以在其上形成涂层的装置和方法。 该装置和方法包括使用一系列被控制的磁控管，以将设置在其中的靶中的沉积材料溅射到基板上。 向磁控管提供电压以进行操作，并且通过使用监测装置来确定形成所需涂层或涂层特性所需的电压水平，至少在首次形成涂层或涂层时。 用于操作磁控管的适当电压电平数据可以保存在数据库中，随后用于在形成所识别的涂层或涂层时控制电压电平。

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