公开(公告)号：US07462570B2

公开(公告)日：2008-12-09

申请号：US11431923

申请日：2006-05-11

申请人： Dong-Youn Shin ,  Tae Su Kim

发明人： Dong-Youn Shin ,  Tae Su Kim

IPC分类号： H01L21/469

CPC分类号： C09D11/30 ,  H01L21/02118 ,  H01L21/02288 ,  H01L21/312

摘要： A patterning method comprising (a) providing a substrate having a sacrificial layer made of a first material, partially or totally formed on the substrate; (b) forming pattern grooves, which are free from the first material and have a line width of a first resolution or lower, on the sacrificial layer by using a first means; (c) filling the pattern grooves with a second material by using a second means; and (d) removing the first material present in a remaining sacrificial layer by way of irradiation or heating, wherein the first material has a threshold fluence of less than a threshold fluence of the second material, the first material is removed in step (d) under a dose ranging from the threshold fluence of the first material to that of the second material, and the pattern is formed on the substrate by the second material.

摘要翻译： 一种图案化方法，包括（a）提供具有由基板上部分或全部形成的第一材料制成的牺牲层的基板; （b）通过使用第一装置在牺牲层上形成不含第一材料且具有第一分辨率或更低的线宽的图案凹槽; （c）使用第二装置用第二材料填充图案凹槽; 和（d）通过照射或加热去除剩余牺牲层中存在的第一材料，其中第一材料具有小于第二材料的阈值注量的阈值注量，在步骤（d）中将第一材料除去， 在从第一材料的阈值注量与第二材料的阈值注量之间的剂量下，通过第二材料在基板上形成图案。

公开(公告)号：US20060281334A1

公开(公告)日：2006-12-14

申请号：US11431923

申请日：2006-05-11

申请人： Dong-Youn Shin ,  Tae Su Kim

发明人： Dong-Youn Shin ,  Tae Su Kim

IPC分类号： H01L21/20 ,  H01L23/58

CPC分类号： C09D11/30 ,  H01L21/02118 ,  H01L21/02288 ,  H01L21/312

摘要： Disclosed is a method for forming a pattern, which comprises the steps of: (a) providing a substrate having a sacrificial layer made of a first material, partially or totally formed on the substrate; (b) forming pattern grooves, which are free from the first material and have a line width of a first resolution or lower, on the sacrificial layer by using a first means; (c) filling the pattern grooves with a second material by using a second means; and (d) removing the first material present in a remaining sacrificial layer by way of irradiation or heating, wherein the first material has a threshold fluence of less than a threshold fluence of the second material, the first material is removed in step (d) under a dose ranging from the threshold fluence of the first material to that of the second material, and the pattern is formed on the substrate by the second material. A substrate having a pre-pattern formed by the method is also disclosed. The method for forming a pattern provides a high-resolution pattern with little or no waste of the second material, thereby reducing production costs. The method includes use of the first means with a high resolution, such as focused energy beams of laser, combined with the second means with a low resolution, such as ink-jet, and provides a high-resolution pattern with high processing efficiency.

摘要翻译： 公开了一种用于形成图案的方法，其包括以下步骤：（a）提供具有由第一材料制成的牺牲层的基板，部分地或全部地形成在基板上; （b）通过使用第一装置在牺牲层上形成不含第一材料且具有第一分辨率或更低的线宽的图案凹槽; （c）使用第二装置用第二材料填充图案凹槽; 和（d）通过照射或加热去除剩余牺牲层中存在的第一材料，其中第一材料具有小于第二材料的阈值注量的阈值注量，在步骤（d）中将第一材料除去， 在从第一材料的阈值注量与第二材料的阈值注量之间的剂量下，通过第二材料在基板上形成图案。 还公开了通过该方法形成的预制图案的基板。 形成图案的方法提供了高分辨率图案，几乎或不浪费第二材料，从而降低了生产成本。 该方法包括使用具有高分辨率的第一装置，例如与诸如喷墨的低分辨率与第二装置结合的激光的聚焦能量束，并且提供具有高处理效率的高分辨率图案。

公开(公告)号：US20140242642A1

公开(公告)日：2014-08-28

申请号：US13880374

申请日：2012-01-27

申请人： Jung Kul Lee ,  Hee Jung Moon ,  Manish Tiwari ,  Tae Su Kim

发明人： Jung Kul Lee ,  Hee Jung Moon ,  Manish Tiwari ,  Tae Su Kim

IPC分类号： C12P19/02 ,  C12N9/04

CPC分类号： C12P19/02 ,  C12N9/0006 ,  C12Y101/01056

摘要： There are provided a novel ribitol dehydrogenase, a residue determining double coenzyme specificity, and a method for preparing L-ribulose using the same, and more particularly, to a ribitol dehydrogenase producing rare sugars, nucleic acid molecules encoding the same, a vector including the nucleic acid molecules, a transformant including the vector, a mutant of the ribitol dehydrogenase, and a method for preparing L-ribulose using the ribitol dehydrogenase. The ribitol dehydrogenase having double coenzyme specificity, which is derived from Zymomonas mobilis, can effectively be used for preparing high-priced rare sugars and an investigation of coenzyme specificity determinants for the ribitol dehydrogenase is applied for all of dedydrogenases as a based technique.

摘要翻译： 提供了新的核糖醇脱氢酶，确定双辅酶特异性的残基，以及使用其制备L-核酮糖的方法，更具体地，涉及制备核糖醇脱氢酶的稀有糖，编码它的核酸分子，包含 核酸分子，包含载体的转化体，核糖醇脱氢酶的突变体和使用核糖醇脱氢酶制备L-核酮糖的方法。 具有双辅酶特异性的衍生自运动发酵单胞菌的核糖醇脱氢酶可以有效地用于制备高价稀有糖，并且对所有的脱氢酶作为基础技术应用于核糖醇脱氢酶的辅酶特异性决定簇的研究。

公开(公告)号：US09005937B2

公开(公告)日：2015-04-14

申请号：US13880374

申请日：2012-01-27

申请人： Jung Kul Lee ,  Hee Jung Moon ,  Manish Tiwari ,  Tae Su Kim

发明人： Jung Kul Lee ,  Hee Jung Moon ,  Manish Tiwari ,  Tae Su Kim

IPC分类号： C12P19/02 ,  C12N9/00 ,  C12N9/04 ,  C12N1/20 ,  C12N15/00 ,  C07H21/04

CPC分类号： C12P19/02 ,  C12N9/0006 ,  C12Y101/01056

摘要： There are provided a novel ribitol dehydrogenase, a residue determining double coenzyme specificity, and a method for preparing L-ribulose using the same, and more particularly, to a ribitol dehydrogenase producing rare sugars, nucleic acid molecules encoding the same, a vector including the nucleic acid molecules, a transformant including the vector, a mutant of the ribitol dehydrogenase, and a method for preparing L-ribulose using the ribitol dehydrogenase. The ribitol dehydrogenase having double coenzyme specificity, which is derived from Zymomonas mobilis, can effectively be used for preparing high-priced rare sugars and an investigation of coenzyme specificity determinants for the ribitol dehydrogenase is applied for all of dedydrogenases as a based technique.

摘要翻译： 提供了新的核糖醇脱氢酶，确定双辅酶特异性的残基，以及使用其制备L-核酮糖的方法，更具体地，涉及制备核糖醇脱氢酶的稀有糖，编码它的核酸分子，包含 核酸分子，包含载体的转化体，核糖醇脱氢酶的突变体和使用核糖醇脱氢酶制备L-核酮糖的方法。 具有双辅酶特异性的衍生自运动发酵单胞菌的核糖醇脱氢酶可以有效地用于制备高价稀有糖，并且对所有的脱氢酶作为基础技术应用于核糖醇脱氢酶的辅酶特异性决定簇的研究。

公开(公告)号：US07576008B2

公开(公告)日：2009-08-18

申请号：US11526690

申请日：2006-09-26

申请人： Tae Su Kim ,  Bu Gon Shin ,  Jae Sung You ,  Hyun Woo Shin

发明人： Tae Su Kim ,  Bu Gon Shin ,  Jae Sung You ,  Hyun Woo Shin

IPC分类号： H01L21/311

CPC分类号： H01L31/022425 ,  H01L33/382 ,  H01L33/42 ,  H05K3/0029 ,  H05K3/107 ,  H05K3/1241 ,  Y02E10/50

摘要： Disclosed is a method for manufacturing an optoelectronic semiconductor device having a p-n junction diode, which includes the steps of: (a) etching at least one surface of the p-n junction diode in a depth direction to form a plurality of continuous, isolated or mixed type electrode pattern grooves with a certain array; and (b) filling the formed grooves with a conductive ink containing a transparent conducting particle through an inkjet and then performing heat treatment to form a buried transparent electrode, the optoelectronic semiconductor device, and an apparatus for manufacturing the optoelectronic semiconductor device. In the present invention, covering loss is significantly reduced due to a buried transparent electrode so that the high efficiency of photoelectric conversion can be implemented, and there can be provided the easiness of a manufacturing process and the enhancement of productivity through the unification of etching and electrode forming processes.

摘要翻译： 公开了一种制造具有pn结二极管的光电子半导体器件的方法，其包括以下步骤：（a）在深度方向上蚀刻pn结二极管的至少一个表面以形成多个连续，隔离或混合型 具有一定阵列的电极图形凹槽; 和（b）通过喷墨用含有透明导电颗粒的导电油墨填充所形成的槽，然后进行热处理以形成掩埋的透明电极，光电子半导体器件和用于制造光电半导体器件的装置。 在本发明中，由于埋入了透明电极而导致的覆盖损耗显着降低，从而可以实现高效率的光电转换，并且可以提供制造工艺的容易性和通过蚀刻的统一提高生产率 电极形成工艺。

公开(公告)号：US20100018919A1

公开(公告)日：2010-01-28

申请号：US12558801

申请日：2009-09-14

申请人： Sang ill Lee ,  Keum Young Kim ,  Jin Hyung Kim ,  Joa Hyoung Kang ,  Hyoung soon Park ,  Tae Su Kim

发明人： Sang ill Lee ,  Keum Young Kim ,  Jin Hyung Kim ,  Joa Hyoung Kang ,  Hyoung soon Park ,  Tae Su Kim

IPC分类号： C02F3/30 ,  C02F3/08

CPC分类号： C02F3/302 ,  C02F1/283 ,  C02F3/006 ,  C02F3/087 ,  C02F3/10 ,  Y02W10/15

摘要： A system for treating recirculating nutrients using floating media is disclosed. The system is operated in such way that wastewater influent path is changed between a first mode and a second mode at a certain period of time interval. Wastewater influent at the first mode sequentially flows into a first anoxic tank, a second anoxic tank, and an aerobic tank. Wastewater influent at the second mode sequentially flows into the second anoxic tank, the first anoxic tank, and the aerobic tank. Part of the wastewater that flows into the aerobic tank bypasses the first anoxic tank and the second anoxic tank. Part of the wastewater, which flows from the aerobic tank into the first anoxic tank or from the aerobic tank into the second anoxic tank, continuously bypasses the aerobic tank through an internal recirculation pump.

摘要翻译： 公开了一种使用浮动介质处理再循环营养物的系统。 该系统以使得废水流入路径在一定时间间隔在第一模式和第二模式之间改变的方式操作。 在第一模式下进入的废水依次流入第一缺氧罐，第二缺氧罐和需氧罐。 在第二模式下的废水流入顺序流入第二缺氧罐，第一缺氧罐和好氧罐。 流入有氧罐的部分废水绕过第一个缺氧罐和第二个缺氧罐。 从好氧池流入第一个缺氧罐或从好氧池进入第二个缺氧罐的部分废水通过内部再循环泵连续绕过需氧罐。