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公开(公告)号：US12237162B2
公开(公告)日：2025-02-25
申请号：US17371899
申请日：2021-07-09
Applicant: Duke University , Coldquanta, Inc.
Inventor： Jungsang Kim , Geert Vrijsen , Ismail Inlek , Tom Noel , Megan Ivory , Alexander Kato , Steve Hughes
Abstract: Aspects of the present disclosure describe systems, methods, and structures that enable a compact, UHV ion trap system that can operate at temperatures above cryogenic temperatures. Ion trap systems in accordance with the present disclosure are surface treated and sealed while held in a UHV environment, where disparate components are joined via UHV seals, such as weld joints, compressible metal flanges, and UHV-compatible solder joints. As a result, no cryogenic pump is required, thereby enabling an extremely small-volume system.
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Patent Agency Ranking
公开(公告)号：US11538674B2
公开(公告)日：2022-12-27
申请号：US16950703
申请日：2020-11-17
Applicant: Duke University
Inventor： Geert Vrijsen , Jungsang Kim , Robert Spivey , Ismail Inlek , Yuhi Aikyo
Abstract: Systems and methods for loading microfabricated ion traps are disclosed. Photo-ablation via an ablation pulse is used to generate a flow of atoms from a source material, where the flow is predominantly populated with neutral atoms. As the neutral atoms flow toward the ion trap, two-photon photo-ionization is used to selectively ionize a specific isotope contained in the atom flow. The velocity of the liberated atoms, atom-generation rate, and/or heat load of the source material is controlled by controlling the fluence of the ablation pulse to provide high ion-trapping probability while simultaneously mitigating generation of heat in the ion-trapping system that can preclude cryogenic operation. In some embodiments, the source material is held within an ablation oven comprising an electrically conductive housing that is configured to restrict the flow of agglomerated neutral atoms generated during photo-ablation toward the ion trap.
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公开(公告)号：US12142473B2
公开(公告)日：2024-11-12
申请号：US18223246
申请日：2023-07-18
Applicant: Duke University
Inventor： Jungsang Kim , Kai Hudek , Geert Vrijsen , Robert Spivey , Peter Maunz
Abstract: A package-level, integrated high-vacuum ion-chip enclosure having improved thermal characteristics is disclosed. Enclosures in accordance with the present invention include first and second chambers that are located on opposite sides of a chip carrier, where the chambers are fluidically coupled via a conduit through the chip carrier. The ion trap is located in the first chamber and disposed on the chip carrier. A source for generating an atomic flux is located in the second chamber. The separation of the source and ion trap in different chambers affords thermal isolation between them, while the conduit between the chambers enables the ion trap to receive the atomic flux.
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公开(公告)号：US11749518B2
公开(公告)日：2023-09-05
申请号：US16913932
申请日：2020-06-26
Applicant: Duke University
Inventor： Jungsang Kim , Kai Hudek , Geert Vrijsen , Robert Spivey , Peter Maunz
CPC classification number: H01J49/422 , G06N10/00 , H01J49/16 , H01J49/24 , H01J49/42
Abstract: A package-level, integrated high-vacuum ion-chip enclosure having improved thermal characteristics is disclosed. Enclosures in accordance with the present invention include first and second chambers that are located on opposite sides of a chip carrier, where the chambers are fluidically coupled via a conduit through the chip carrier. The ion trap is located in the first chamber and disposed on the chip carrier. A source for generating an atomic flux is located in the second chamber. The separation of the source and ion trap in different chambers affords thermal isolation between them, while the conduit between the chambers enables the ion trap to receive the atomic flux.
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公开(公告)号：US10923335B2
公开(公告)日：2021-02-16
申请号：US16357488
申请日：2019-03-19
Applicant: Duke University
Inventor： Geert Vrijsen , Jungsang Kim , Robert Spivey , Ismail Inlek , Yuhi Aikyo
Abstract: Systems and methods for loading microfabricated ion traps are disclosed. Photo-ablation via an ablation pulse is used to generate a flow of atoms from a source material, where the flow is predominantly populated with neutral atoms. As the neutral atoms flow toward the ion trap, two-photon photo-ionization is used to selectively ionize a specific isotope contained in the atom flow. The velocity of the liberated atoms, atom-generation rate, and/or heat load of the source material is controlled by controlling the fluence of the ablation pulse to provide high ion-trapping probability while simultaneously mitigating generation of heat in the ion-trapping system that can preclude cryogenic operation. In some embodiments, the source material is held within an ablation oven comprising an electrically conductive housing that is configured to restrict the flow of agglomerated neutral atoms generated during photo-ablation toward the ion trap.
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公开(公告)号：US10755913B2
公开(公告)日：2020-08-25
申请号：US15935312
申请日：2018-03-26
Applicant: Duke University
Inventor： Jungsang Kim , Kai Hudek , Geert Vrijsen , Robert Spivey , Peter Maunz
Abstract: A package-level, integrated high-vacuum ion-chip enclosure having improved thermal characteristics is disclosed. Enclosures in accordance with the present invention include first and second chambers that are located on opposite sides of a chip carrier, where the chambers are fluidically coupled via a conduit through the chip carrier. The ion trap is located in the first chamber and disposed on the chip carrier. A source for generating an atomic flux is located in the second chamber. The separation of the source and ion trap in different chambers affords thermal isolation between them, while the conduit between the chambers enables the ion trap to receive the atomic flux.
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