Thermoelectric deposit monitor
    1.
    发明授权

    公开(公告)号:US10816285B2

    公开(公告)日:2020-10-27

    申请号:US15442221

    申请日:2017-02-24

    Abstract: Fluid flow systems can include one or more thermoelectric devices in contact with the fluid flowing through the system. One or more thermoelectric devices can be operated in a temperature control mode and a measurement mode. Thermal behavior of the one or more thermoelectric devices can be analyzed to characterize a level of deposit formed on the thermoelectric device(s) from the fluid flowing through the system. Characterizations of deposition on thermoelectric devices operated at different temperatures can be used to establish a temperature-dependent deposition profile. The deposition profile can be used to determine if depositions are likely to form at various locations in the system, such as at a use device or in a flow vessel. Detected deposit conditions can initiate one or more corrective actions that can be taken to remove deposits, or to prevent or minimize deposit formation before deposits negatively impact operation of the system.

    DEPOSIT MONITOR
    2.
    发明申请

    公开(公告)号:US20220099604A1

    公开(公告)日:2022-03-31

    申请号:US17549625

    申请日:2021-12-13

    Abstract: Fluid flow systems can include one or more resistance temperature detectors (RTDs) in contact with the fluid flowing through the system. One or more RTDs can be operated in a heating mode and a measurement mode. Thermal behavior of the one or more RTDs can be analyzed to characterize a level of deposit formed on the RTD(s) from the fluid flowing through the system. Characterizations of deposition on RTDs operated at different temperatures can be used to establish a temperature-dependent deposition profile. The deposition profile can be used to determine if depositions are likely to form at certain locations in the fluid flow system, such as at a use device. Detected deposit conditions can initiate one or more corrective actions that can be taken to prevent or minimize deposit formation before deposits negatively impact operation of the fluid flow system.

    THERMOELECTRIC DEPOSIT MONITOR
    3.
    发明申请

    公开(公告)号:US20180245865A1

    公开(公告)日:2018-08-30

    申请号:US15442221

    申请日:2017-02-24

    Abstract: Fluid flow systems can include one or more thermoelectric devices in contact with the fluid flowing through the system. One or more thermoelectric devices can be operated in a temperature control mode and a measurement mode. Thermal behavior of the one or more thermoelectric devices can be analyzed to characterize a level of deposit formed on the thermoelectric device(s) from the fluid flowing through the system. Characterizations of deposition on thermoelectric devices operated at different temperatures can be used to establish a temperature-dependent deposition profile. The deposition profile can be used to determine if depositions are likely to form at various locations in the system, such as at a use device or in a flow vessel. Detected deposit conditions can initiate one or more corrective actions that can be taken to remove deposits, or to prevent or minimize deposit formation before deposits negatively impact operation of the system.

    Method for Monitoring and Control of a Wastewater Process Stream

    公开(公告)号:US20240044794A1

    公开(公告)日:2024-02-08

    申请号:US18380961

    申请日:2023-10-17

    CPC classification number: G01N21/643 G01N21/51

    Abstract: The invention is directed towards methods, compositions, and apparatus for accurately detecting the presence and amounts of contaminants in wastewater. The method comprises the steps of adding to a volume of wastewater at least one tracer molecule, observing the tracer for indications of particular contaminants, conducting at least one second form of contamination detection, and interrelating the two measured properties to identify the specific composition of the contamination. Using a tracer molecule allows for the detection of otherwise hard to detect oils and grease. Use of the second method however compensates for tracer interfering contaminants and allows for more accurate readings. The invention includes feeding of functional chemicals in response to the detections and conducting the detections online and continuously.

    Method for Monitoring and Control of a Wastewater Process Stream

    公开(公告)号:US20190204224A1

    公开(公告)日:2019-07-04

    申请号:US16295797

    申请日:2019-03-07

    CPC classification number: G01N21/643 G01N21/51 G01N2021/6432 G01N2021/6491

    Abstract: The invention is directed towards methods, compositions, and apparatus for accurately detecting the presence and amounts of contaminants in wastewater. The method comprises the steps of adding to a volume of wastewater at least one tracer molecule, observing the tracer for indications of particular contaminants, conducting at least one second form of contamination detection, and interrelating the two measured properties to identify the specific composition of the contamination. Using a tracer molecule allows for the detection of otherwise hard to detect oils and grease. Use of the second method however compensates for tracer interfering contaminants and allows for more accurate readings. The invention includes feeding of functional chemicals in response to the detections and conducting the detections online and continuously.

    DEPOSIT MONITOR
    9.
    发明申请
    DEPOSIT MONITOR 审中-公开

    公开(公告)号:US20180073996A1

    公开(公告)日:2018-03-15

    申请号:US15262807

    申请日:2016-09-12

    CPC classification number: G01N25/14 G01B21/085 G01K7/18 G01K13/02 G01N17/008

    Abstract: Fluid flow systems can include one or more resistance temperature detectors (RTDs) in contact with the fluid flowing through the system. One or more RTDs can be operated in a heating mode and a measurement mode. Thermal behavior of the one or more RTDs can be analyzed to characterize a level of deposit formed on the RTD(s) from the fluid flowing through the system. Characterizations of deposition on RTDs operated at different temperatures can be used to establish a temperature-dependent deposition profile. The deposition profile can be used to determine if depositions are likely to form at certain locations in the fluid flow system, such as at a use device. Detected deposit conditions can initiate one or more corrective actions that can be taken to prevent or minimize deposit formation before deposits negatively impact operation of the fluid flow system.

Patent Agency Ranking