公开(公告)号：US11688690B2

公开(公告)日：2023-06-27

申请号：US17354705

申请日：2021-06-22

申请人： EPISTAR CORPORATION

发明人： Yung-Chung Pan ,  Chang-Yu Tsai ,  Ching-Chung Hu ,  Ming-Pao Chen ,  Chi Shen ,  Wei-Chieh Lien

IPC分类号： H01L33/32 ,  H01L33/14 ,  H01L33/06 ,  H01L29/205 ,  H01L23/532 ,  H01L21/02 ,  H01L21/285 ,  H01L33/04 ,  H01L31/0304 ,  H01L33/30

CPC分类号： H01L23/53223 ,  H01L21/0254 ,  H01L21/02458 ,  H01L21/02579 ,  H01L21/28575 ,  H01L33/04 ,  H01L33/06 ,  H01L33/145 ,  H01L33/32 ,  H01L29/205 ,  H01L31/03042 ,  H01L31/03046 ,  H01L33/305 ,  H01L33/325

摘要： A semiconductor device includes: a first semiconductor structure; a second semiconductor structure on the first semiconductor structure; an active region between the first semiconductor structure and the second semiconductor structure, wherein the active region includes multiple alternating well layers and barrier layers, wherein each of the barrier layers has a band gap, the active region further includes an upper surface facing the second semiconductor structure and a bottom surface opposite the upper surface; an electron blocking region between the second semiconductor structure and the active region, wherein the electron blocking region includes a band gap, and the band gap of the electron blocking region is greater than the band gap of one of the barrier layers; a first aluminum-containing layer between the electron blocking region and the active region, wherein the first aluminum-containing layer has a band gap greater than the band gap of the electron blocking region; a confinement layer between the first aluminum-containing layer and the active region, wherein the confinement layer includes a thickness smaller than the thickness of one of the barrier layers; and a p-type dopant above the bottom surface of the active region and comprising a concentration profile comprising a peak shape having a peak concentration value, wherein the peak concentration value lies in the electron blocking region.

公开(公告)号：US11056434B2

公开(公告)日：2021-07-06

申请号：US15875735

申请日：2018-01-19

申请人： EPISTAR CORPORATION

发明人： Yung-Chung Pan ,  Chang-Yu Tsai ,  Ching-Chung Hu ,  Ming-Pao Chen ,  Chi Shen ,  Wei-Chieh Lien

IPC分类号： H01L33/04 ,  H01L33/14 ,  H01L33/26 ,  H01L23/532 ,  H01L33/12 ,  H01L33/28 ,  H01L21/02 ,  H01L21/285 ,  H01L21/768 ,  H01L33/32 ,  H01L33/06 ,  H01L31/0304 ,  H01L29/205 ,  H01L33/30

摘要： A semiconductor device comprises: a first semiconductor structure; a second semiconductor structure on the first semiconductor structure; an active region, wherein the active region comprises multiple alternating well layers and barrier layers, the active region further comprises an upper surface facing the second semiconductor structure and a bottom surface opposite the upper surface; an electron blocking region between the second semiconductor structure and the active region; a first aluminum-containing layer between the electron blocking region and the active region, wherein the first aluminum-containing layer has a band gap greater than the band gap of the first electron blocking layer; and a p-type dopant above the bottom surface of the active region and comprising a concentration profile comprising a peak shape having a peak concentration value, wherein the peak concentration value lies at a distance of between 15 nm and 60 nm from the upper surface of the active region.

公开(公告)号：US11600746B2

公开(公告)日：2023-03-07

申请号：US17221563

申请日：2021-04-02

申请人： EPISTAR CORPORATION

发明人： Chia-Ming Liu ,  Chang-Hua Hsieh ,  Yung-Chung Pan ,  Chang-Yu Tsai ,  Ching-Chung Hu ,  Ming-Pao Chen ,  Chi Shen ,  Wei-Chieh Lien

IPC分类号： H01L33/14 ,  H01L33/06 ,  H01L33/32 ,  H01L33/26 ,  H01L33/30

摘要： A semiconductor device comprises: a first semiconductor structure; a second semiconductor structure on the first semiconductor structure; an active region, wherein the active region comprises multiple alternating well layers and barrier layers, the active region further comprises an upper surface facing the second semiconductor structure and a bottom surface opposite the upper surface; an electron blocking region between the second semiconductor structure and the active region; a first aluminum-containing layer between the electron blocking region and the active region, wherein the first aluminum-containing layer has a band gap greater than the band gap of the first electron blocking layer; and a p-type dopant above the bottom surface of the active region and comprising a concentration profile comprising a peak shape having a peak concentration value, wherein the peak concentration value lies at a distance of between 15 nm and 60 nm from the upper surface of the active region.

公开(公告)号：US10971652B2

公开(公告)日：2021-04-06

申请号：US16513264

申请日：2019-07-16

申请人： EPISTAR CORPORATION

发明人： Chia-Ming Liu ,  Chang-Hua Hsieh ,  Yung-Chung Pan ,  Chang-Yu Tsai ,  Ching-Chung Hu ,  Ming-Pao Chen ,  Chi Shen ,  Wei-Chieh Lien

IPC分类号： H01L33/26 ,  H01L33/14 ,  H01L33/06 ,  H01L33/04 ,  H01L33/30 ,  H01L33/32 ,  H01L33/20

摘要： A semiconductor device comprises: a first semiconductor structure; a second semiconductor structure on the first semiconductor structure; an active region, wherein the active region comprises multiple alternating well layers and barrier layers, the active region further comprises an upper surface facing the second semiconductor structure and a bottom surface opposite the upper surface; an electron blocking region between the second semiconductor structure and the active region; a first aluminum-containing layer between the electron blocking region and the active region, wherein the first aluminum-containing layer has a band gap greater than the band gap of the first electron blocking layer; and a p-type dopant above the bottom surface of the active region and comprising a concentration profile comprising a peak shape having a peak concentration value, wherein the peak concentration value lies at a distance of between 15 nm and 60 nm from the upper surface of the active region.