公开(公告)号：US5276725A

公开(公告)日：1994-01-04

申请号：US996508

申请日：1992-12-14

申请人： Eigo Kawakami ,  Minoru Yoshii ,  Shunichi Uzawa

发明人： Eigo Kawakami ,  Minoru Yoshii ,  Shunichi Uzawa

IPC分类号： G03F7/20 ,  G21K5/00

CPC分类号： G03F7/702

摘要： An exposure apparatus usable with a mask having a pattern and a wafer having a radiation-sensitive surface layer, for transferring with a radiation energy beam the pattern of the mask to the wafer, is disclosed. The apparatus includes a mask supporting member for supporting the mask; a wafer supporting member for supporting the wafer; a reflective member having a reflection surface and an indication pattern, the reflective member being supported by one of the mask supporting member and the wafer supporting member; an arrangement for projecting a beam, which is thinner than the radiation energy beam and which advances along or about the axis of the radiation energy beam, upon the reflective member; a device for observing a positional relationship between the indication pattern and a spot formed by projection of the thinner beam upon the reflective member; and a device for correcting a relationship between the indication pattern and the spot, on the basis of the observation.

摘要翻译： 公开了一种可用于具有图案的掩模和具有辐射敏感表面层的晶片的曝光装置，用于将辐射能量束将掩模的图案转印到晶片。 该装置包括用于支撑面罩的面罩支撑构件; 用于支撑晶片的晶片支撑构件; 反射构件，其具有反射面和指示图案，所述反射构件由所述面罩支撑构件和所述晶片支撑构件中的一个支撑; 用于投射比辐射能量束更薄并且沿辐射能量束的轴线或围绕辐射能量束的轴线前进的光束的反射构件的布置; 用于观察指示图案与通过将较薄光束投射在反射构件上形成的光斑之间的位置关系的装置; 以及用于基于观察来校正指示图案与斑点之间的关系的装置。

公开(公告)号：US5226523A

公开(公告)日：1993-07-13

申请号：US963517

申请日：1992-10-20

申请人： Eigo Kawakami ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Mitsutoshi Kuno ,  Kazunori Iwamoto ,  Takao Kariya

发明人： Eigo Kawakami ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Mitsutoshi Kuno ,  Kazunori Iwamoto ,  Takao Kariya

IPC分类号： G03F7/20 ,  G05B19/23

CPC分类号： G03F7/70741 ,  G03F7/7075 ,  G05B19/231

摘要： A conveying apparatus includes a plurality of position limiting devices provided along the direction of conveyance and a selecting device operable to select one of or those of the plurality of position limiting devices which are effective in view of a target position, before a start of conveyance. The selecting device is further operable to select, again, one of or those of the plurality of position limiting devices which are effective in view of the current position of an article being conveyed, after a start of conveyance.

摘要翻译： 传送装置包括沿着传送方向设置的多个位置限制装置，以及选择装置，可操作以在开始传送之前选择在目标位置有效的多个位置限制装置中的一个或那些位置限制装置。 选择装置还可操作以在开始运送之后再次选择多个位置限制装置中的一个或那些位置限制装置中的一个或那些位置限制装置，其在待传送物品的当前位置有效。

公开(公告)号：US5157700A

公开(公告)日：1992-10-20

申请号：US401615

申请日：1989-08-31

申请人： Hiroshi Kurosawa ,  Mitsuaki Amemiya ,  Shigeru Terashima ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Kunitaka Ozawa ,  Makiko Mori ,  Ryuichi Ebinuma ,  Shinichi Hara ,  Nobutoshi Mizusawa ,  Eigo Kawakami

发明人： Hiroshi Kurosawa ,  Mitsuaki Amemiya ,  Shigeru Terashima ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Kunitaka Ozawa ,  Makiko Mori ,  Ryuichi Ebinuma ,  Shinichi Hara ,  Nobutoshi Mizusawa ,  Eigo Kawakami

IPC分类号： G03F7/20

CPC分类号： G03F7/70691 ,  G03F7/70058 ,  G03F7/70091 ,  G03F7/702

摘要： An exposure apparatus usable with synchrotron radiation source wherein the synchrotron radiation is generated by electron injection into a ring. The exposure apparatus is to transfer a semiconductor element pattern of a mask onto a semiconductor wafer by the synchrotron radiation. The apparatus includes a shutter for controlling the exposure of the wafer. The shutter controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined in response to the electron injection, and thereafter, the illuminance distribution is corrected in a predetermined manner. By this, the illuminance distribution data for controlling the shutter always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer are exposed with high precision.

公开(公告)号：US5641264A

公开(公告)日：1997-06-24

申请号：US996870

申请日：1992-12-21

申请人： Mitsutoshi Kuno ,  Hidehiko Fujioka ,  Nobutoshi Mizusawa ,  Yuji Chiba ,  Takao Kariya ,  Koji Uda ,  Shunichi Uzawa ,  Eigo Kawakami

发明人： Mitsutoshi Kuno ,  Hidehiko Fujioka ,  Nobutoshi Mizusawa ,  Yuji Chiba ,  Takao Kariya ,  Koji Uda ,  Shunichi Uzawa ,  Eigo Kawakami

IPC分类号： G03F7/20 ,  H01L21/687 ,  B65G65/00

CPC分类号： G03F7/70741 ,  H01L21/68707 ,  Y10S294/907

摘要： A method of controlling a conveying device having a gripping hand for gripping an article to be conveyed and a conveying mechanism for conveying the gripping hand, wherein a pressing force applied to the gripping hand through the article being conveyed is detected and the conveying operation of the conveying mechanism is stopped when the pressing force exceeds a predetermined force.

摘要翻译： 一种控制输送装置的方法，所述输送装置具有用于夹持要输送的物品的夹持手和用于输送夹持手的输送机构，其中检测到通过被输送物品施加到抓握手的按压力，并且输送操作 当按压力超过预定力时，输送机构停止。

公开(公告)号：US5443932A

公开(公告)日：1995-08-22

申请号：US161099

申请日：1993-12-03

申请人： Hirohisa Ohta ,  Kunitaka Ozawa ,  Eigo Kawakami ,  Shunichi Uzawa

发明人： Hirohisa Ohta ,  Kunitaka Ozawa ,  Eigo Kawakami ,  Shunichi Uzawa

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7023 ,  G03F7/201

摘要： An exposure method includes disposing a mask and a semiconductor wafer opposed to each other in a close proximity relation with respect to a Z-axis direction and printing a pattern of the mask on each of different shot areas of the semiconductor wafer in a step-and-repeat manner, with a predetermined exposure energy. In this method, the spacing between the mask and the wafer for the paralleling of them is made larger than the spacing therebetween as assumed at the time of mask-to-wafer alignment with respect to X-Y plane or the spacing between the mask and the wafer as assumed at the time of exposure of the wafer to the mask. After the paralleling of the mask and the wafer, the mask and the wafer are moved closer to each other in the Z-axis direction and alignment and exposure is performed. This ensures that the alignment and exposure are effected at an optimum spacing while, on the other hand, contact of the mask and the wafer at the time of paralleling is precluded.

摘要翻译： 曝光方法包括以相对于Z轴方向彼此紧密相对的方式设置掩模和半导体晶片，并且在半导体晶片的不同照射区域的每一个上以均匀的方式印刷掩模的图案，并且 以预定的曝光能量。 在这种方法中，掩模和与它们并联的晶片之间的间隔被制成大于它们之间的间隔，如假设在相对于XY平面的掩模到晶片对准时或掩模和晶片之间的间隔 如在晶片暴露于掩模时所假设的那样。 在掩模和晶片平行之后，掩模和晶片在Z轴方向上彼此靠近移动，并进行对准和曝光。 这确保了对准和曝光以最佳间隔进行，另一方面，阻止了并联时的掩模与晶片的接触。

公开(公告)号：US5008703A

公开(公告)日：1991-04-16

申请号：US407434

申请日：1989-09-06

申请人： Eigo Kawakami ,  Kunitaka Ozawa ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa

发明人： Eigo Kawakami ,  Kunitaka Ozawa ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/7075 ,  G03F7/709

摘要： Exposure apparatus and control of the same, for exposing a semiconductor wafer to a mask with a predetermined radiation energy, for manufacture of semiconductor devices, is disclosed. During a time period in which the mask-to-wafer alignment or the exposure of the wafer to the mask is made, the operation of any other driving device that has no participation in the aligning operation or the exposure operation, is prohibited. This ensures high-precision pattern printing.

公开(公告)号：US4788596A

公开(公告)日：1988-11-29

申请号：US855732

申请日：1986-04-25

申请人： Eigo Kawakami ,  Yukichi Niwa ,  Mitsutoshi Ohwada ,  Yasuo Ogino ,  Minoru Yoshii ,  Shigeyuki Suda

发明人： Eigo Kawakami ,  Yukichi Niwa ,  Mitsutoshi Ohwada ,  Yasuo Ogino ,  Minoru Yoshii ,  Shigeyuki Suda

IPC分类号： H04N5/232 ,  H04N5/228

CPC分类号： H04N5/23254 ,  H04N5/23212 ,  H04N5/23248 ,  H04N5/23287

摘要： A characteristic point such as an image contrast of a target image in an image screen of an object produced by an image sensor is counted, a correlation between counts at two points in time is determined. A drive means for preventing vibration of an imaging lens is controlled in accordance with the correlation signal and imaging information such as in-focus or out-of-focus information.

摘要翻译： 计算特征点，例如由图像传感器产生的对象的图像画面中的目标图像的图像对比度，确定两个时间点的计数之间的相关性。 根据相关信号和诸如焦点内或焦点外信息的成像信息来控制用于防止成像镜头的振动的驱动装置。

公开(公告)号：US4780739A

公开(公告)日：1988-10-25

申请号：US900997

申请日：1986-08-27

申请人： Eigo Kawakami ,  Yukichi Niwa ,  Yasuo Ogino ,  Minoru Yoshii ,  Shigeyuki Suda ,  Mitsutoshi Ohwada

发明人： Eigo Kawakami ,  Yukichi Niwa ,  Yasuo Ogino ,  Minoru Yoshii ,  Shigeyuki Suda ,  Mitsutoshi Ohwada

IPC分类号： G02B27/64 ,  H04N5/232 ,  G03B7/08

CPC分类号： H04N5/23254 ,  G02B27/646 ,  H04N5/23248 ,  H04N5/23287 ,  G03B2217/005

摘要： An imaging device has detection means for detecting an image vibration of the imaging device and drive means for driving at least one of a photoelectric conversion device for converting a light of an object transmitted through a lens system of the imaging device to an electrical signal and the imaging device itself in a direction to cancel the vibration. For a high frequency image vibration, the vibration is compensated by using a piezoelectric device.

摘要翻译： 一种成像装置具有用于检测成像装置的图像振动的检测装置和用于驱动用于将通过成像装置的透镜系统传输的物体的光转换成电信号的光电转换装置中的至少一个的驱动装置， 成像装置本身在消除振动的方向上。 对于高频图像振动，通过使用压电装置来补偿振动。

公开(公告)号：US5519686A

公开(公告)日：1996-05-21

申请号：US438079

申请日：1995-05-08

申请人： Yoshihiro Yanagisawa ,  Yuko Morikawa ,  Hiroshi Matsuda ,  Haruki Kawada ,  Kunihiro Sakai ,  Hisaaki Kawade ,  Ken Eguchi ,  Eigo Kawakami ,  Toshimitsu Kawasa ,  Minoru Yoshii ,  Kenji Saitoh ,  Akihiko Yamano ,  Hiroyasu Nose

发明人： Yoshihiro Yanagisawa ,  Yuko Morikawa ,  Hiroshi Matsuda ,  Haruki Kawada ,  Kunihiro Sakai ,  Hisaaki Kawade ,  Ken Eguchi ,  Eigo Kawakami ,  Toshimitsu Kawasa ,  Minoru Yoshii ,  Kenji Saitoh ,  Akihiko Yamano ,  Hiroyasu Nose

IPC分类号： G01B7/00 ,  G01D5/244 ,  G01D5/245 ,  G01Q10/00 ,  G01Q20/04 ,  G01Q60/00 ,  G01Q60/10 ,  G01Q70/06 ,  G11B9/00 ,  G11B7/00

CPC分类号： G01D5/244 ,  G01B7/003 ,  G01D5/2451 ,  G11B9/1418 ,  G11B9/1427 ,  G11B9/1481 ,  B82Y10/00 ,  G01Q10/06 ,  G01Q60/16 ,  G01Q80/00 ,  G11B9/1472 ,  Y10S977/851 ,  Y10S977/861 ,  Y10S977/947

摘要： An encoder includes an electrically conductive reference scale having surface steps formed at predetermined positions; an electrically conductive probe having a tip disposed opposed to the reference scale; wherein the reference scale and the probe are relatively movable in a direction different from the opposing direction of the tip of the probe and the reference scale; a portion for applying an electrical voltage to between the reference scale and the probe; a portion for detecting a change in a tunnel current between the reference scale and the probe, to between which the electric voltage is applied by the voltage applying portion at the time of the relative movement between the scale and the probe, the detecting portion detecting the change in the tunnel current when the probe passes a position opposed to a surface step of the reference scale; and portion for detecting the amount of the relative movement between the scale and probe, on the basis of the detection by the change detecting portion.

摘要翻译： 编码器包括具有形成在预定位置处的表面台阶的导电参考标尺; 导电探针，其具有与参考标尺相对设置的尖端; 其中所述参考标尺和所述探针在与所述探针的尖端和所述参考标尺的相反方向不同的方向上相对移动; 用于将电压施加到参考标尺和探针之间的部分; 用于检测参考标尺和探针之间的隧道电流变化的部分，在标尺和探头之间的相对移动时由电压施加部施加电压，检测部分检测 当探针经过与参考刻度的表面台阶相对的位置时隧道电流的变化; 以及用于根据变化检测部分的检测来检测标尺和探针之间的相对移动量的部分。

公开(公告)号：US5721721A

公开(公告)日：1998-02-24

申请号：US589473

申请日：1996-01-22

申请人： Yoshihiro Yanagisawa ,  Yuko Morikawa ,  Hiroshi Matsuda ,  Haruki Kawada ,  Kunihiro Sakai ,  Hisaaki Kawade ,  Ken Eguchi ,  Eigo Kawakami ,  Toshimitsu Kawase ,  Minoru Yoshii ,  Kenji Saitoh ,  Akihiko Yamano ,  Hiroyasu Nose

发明人： Yoshihiro Yanagisawa ,  Yuko Morikawa ,  Hiroshi Matsuda ,  Haruki Kawada ,  Kunihiro Sakai ,  Hisaaki Kawade ,  Ken Eguchi ,  Eigo Kawakami ,  Toshimitsu Kawase ,  Minoru Yoshii ,  Kenji Saitoh ,  Akihiko Yamano ,  Hiroyasu Nose

IPC分类号： G01B7/00 ,  G01D5/244 ,  G01D5/245 ,  G01Q10/00 ,  G01Q20/04 ,  G01Q60/00 ,  G01Q60/10 ,  G01Q70/06 ,  G11B9/00 ,  G11B7/00

CPC分类号： G01D5/244 ,  G01B7/003 ,  G01D5/2451 ,  G11B9/1418 ,  G11B9/1427 ,  G11B9/1481 ,  B82Y10/00 ,  G01Q10/06 ,  G01Q60/16 ,  G01Q80/00 ,  G11B9/1472 ,  Y10S977/851 ,  Y10S977/861 ,  Y10S977/947

摘要： An encoder includes an electrically conductive reference scale having surface steps formed at predetermined positions; an electrically conductive probe having a tip disposed opposed to the reference scale; wherein the reference scale and the probe are relatively movable in a direction different from the opposing direction of the tip of the probe and the reference scale; a portion for applying an electrical voltage to between the reference scale and the probe; a portion for detecting a change in a tunnel current between the reference scale and the probe, to between which the electric voltage is applied by the voltage applying portion at the time of the relative movement between the scale and the probe, the detecting portion detecting the change in the tunnel current when the probe passes a position opposed to a surface step of the reference scale; and portion for detecting the amount of the relative movement between the scale and probe, on the basis of the detection by the change detecting portion.

摘要翻译： 编码器包括具有形成在预定位置处的表面台阶的导电参考标尺; 导电探针，其具有与参考标尺相对设置的尖端; 其中所述参考标尺和所述探针在与所述探针的尖端和所述参考标尺的相反方向不同的方向上相对移动; 用于将电压施加到参考标尺和探针之间的部分; 用于检测参考标尺和探针之间的隧道电流变化的部分，在标尺和探头之间的相对移动时由电压施加部施加电压，检测部分检测 当探针经过与参考刻度的表面台阶相对的位置时隧道电流的变化; 以及用于根据变化检测部分的检测来检测标尺和探针之间的相对移动量的部分。