Steam generator and mixer using the same
    9.
    发明授权
    Steam generator and mixer using the same 失效
    蒸汽发生器和搅拌机使用相同

    公开(公告)号:US06961516B2

    公开(公告)日:2005-11-01

    申请号:US10811822

    申请日:2004-03-30

    摘要: A steam generating apparatus includes: a liquid tank portion 1 for storing a liquid; an evaporator portion 2 which is directly connected to the liquid tank portion, heats the liquid supplied from the liquid tank portion, and generates steam; a steam storage portion 3 which is directly connected to the evaporator portion, and stores the steam generated by the evaporator portion; a passageway 4 which is directly connected to the steam storage portion and outwardly passes the generated steam; a liquid pathway 10b which is connected to the liquid tank portion, and supplies the liquid; and a heater unit 20 which is provided on one side of the evaporator portion, and heats at least the evaporator portion. The liquid tank portion 1, the evaporator portion 2, the steam storage portion 3, the passageway 4, and the liquid pathway 10b are formed within an integral member of a translucent material.

    摘要翻译: 蒸汽发生装置包括:用于储存液体的液体罐部分1; 蒸发器部分2直接连接到液罐部分,加热从液罐部分供应的液体,并产生蒸汽; 蒸汽存储部3,其直接连接到蒸发器部分,并且存储由蒸发器部分产生的蒸汽; 通道4,其直接连接到蒸汽存储部分并向外通过产生的蒸汽; 液体通道10b,其连接到液体罐部分,并供应液体; 以及加热器单元20,其设置在蒸发器部分的一侧,并且至少加热蒸发器部分。 液体罐部分1,蒸发器部分2,蒸汽存储部分3,通道4和液体通道10b形成在半透明材料的整体构件内。

    Ceramic device
    10.
    发明授权
    Ceramic device 失效
    陶瓷装置

    公开(公告)号:US5449545A

    公开(公告)日:1995-09-12

    申请号:US006856

    申请日:1993-01-21

    摘要: A ceramic device is disclosed that has a silicon base plate, a first ceramic film formed on a first surface of the silicon base plate, a second ceramic film formed on a second surface of the silicon base plate opposite to the first surface, and an operation opening formed in the silicon base plate between the first and second surfaces. A surface portion of the first ceramic film exposed to the operation opening Is a mirror surface having 0.05 micrometers or less of center line average height Ra. A mirror surface keeping film can be formed between the first surface of the silicon base plate and the first ceramic film for keeping a mirror surface in an etching step to etch the silicon base plate, and the silicon base plate can be reduced partially in the etching step for forming an operation opening thereby exposing a corresponding portion of the mirror surface keeping film to the operation opening.

    摘要翻译: 公开了一种陶瓷器件,其具有硅基板,形成在硅基板的第一表面上的第一陶瓷膜,形成在与第一表面相对的硅基板的第二表面上的第二陶瓷膜,以及操作 开口形成在第一和第二表面之间的硅基板中。 暴露于操作开口的第一陶瓷膜的表面部分是具有0.05微米或更小的中心线平均高度Ra的镜面。 在蚀刻步骤中,在硅基板的第一表面和第一陶瓷膜之间可以形成镜面保持膜,用于在蚀刻步骤中保持镜面,以蚀刻硅基板,并且可以在蚀刻中部分地减少硅基板 用于形成操作开口的步骤,从而将镜面保持膜的相应部分暴露于操作开口。