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    Process for purifying hydrogen gas
    2.
    发明授权
    Process for purifying hydrogen gas 失效
    氢气净化方法

    公开(公告)号：US5489327A

    公开(公告)日：1996-02-06

    申请号：US373032

    申请日：1995-01-17

    申请人： Kenji Otsuka ,  Noboru Takemasa

    发明人： Kenji Otsuka ,  Noboru Takemasa

    IPC分类号： B01D53/14 ,  B01D53/86 ,  C01B3/56 ,  B01D53/04

    CPC分类号： C01B3/56 ,  C01B2203/042 ,  C01B2203/0465 ,  C01B2203/047 ,  C01B2203/0475 ,  C01B2203/048

    摘要： There is diclosed a process for purifying hydrogen gas which comprises removing impurities such as nitrogen, oxygen, methane, carbon monoxide, carbon dioxide and moisture contained in a crude hydrogen gas by bringing the crude hydrogen gas into contact under heating with a hydride of a zirconium alloy such as Zr-V, Zr-V-Ni, Zr-V-Cr, Zr-V-Co, Zr-V-Fe, Zr-V-Cu, Zr-V-Ni-Cr, Zr-V-Ni-Co and Zr-V-Cr-Fe. By virtue of using the above Zr alloy hydride, the process enables highly advanced purification of crude hydrogen gas by removing such impurities as above to a level as low as 1 ppb or less in high safety and efficiency at low installation and running costs.

    摘要翻译： 包括一种净化氢气的方法，其中包括通过使粗氢气在加热下与锆的氢化物接触来除去粗氢气中所含的氮，氧，甲烷，一氧化碳，二氧化碳和水分中的杂质 合金如Zr-V，Zr-V-Ni，Zr-V-Cr，Zr-V-Co，Zr-V-Fe，Zr-V-Cu，Zr-V-Ni-Cr，Zr-V-Ni -Co和Zr-V-Cr-Fe。 通过使用上述Zr合金氢化物，该方法能够在安装和运行成本低的情况下以高安全性和高效率除去上述这样的杂质，从而高精度地纯化粗氢气。

    Processing method of exhaust gas and processing apparatus of exhaust gas
    4.
    发明申请
    Processing method of exhaust gas and processing apparatus of exhaust gas 审中-公开
    废气处理方法和废气处理装置

    公开(公告)号：US20060075895A1

    公开(公告)日：2006-04-13

    申请号：US11244239

    申请日：2005-10-06

    申请人： Takashi Shimada ,  Noboru Takemasa ,  Koshi Ochi

    发明人： Takashi Shimada ,  Noboru Takemasa ,  Koshi Ochi

    IPC分类号： B01D53/14 ,  B01D53/68

    CPC分类号： B01D53/1493 ,  B01D53/18

    摘要： A processing method of an exhaust gas which comprises a step (A) adding a halogen-based gas-absorbing liquid to an adsorbent and a step (B) bringing the exhaust gas containing a halogen-based gas discharged from semiconductor manufacturing facilities into contact with the adsorbent, to remove the halide-based gas from the exhaust gas. A processing apparatus of an exhaust gas, which comprises an inlet for the exhaust gas containing a halogen-based gas discharged from semiconductor manufacturing facilities, a filling part of an adsorbent, means for adding a halogen-based gas-absorbing liquid to the filling part and an outlet of the processed gas. A processing method and a processing apparatus both for an exhaust gas containing the halogen-based gas discharged from semiconductor manufacturing facilities without requiring to frequently replace a cleaning agent with a new one, without jeopardy of causing fire even when processing a dry exhaust gas containing a highly reactive gas, and capable of easily reducing a concentration of the halogen-based gas among the gas after being processed is provided.

    摘要翻译： 一种排气处理方法，其特征在于，包括：向吸附剂添加卤素系吸气液体的工序（A）和使从半导体制造装置排出的含有卤素系气体的排气与第 吸附剂，以从废气中除去卤化物基气体。 一种排气处理装置，其特征在于，包括：含有从半导体制造装置排出的卤素系气体的废气的入口，吸附剂的填充部，向所述填充部添加卤素系气体吸收液的装置 和处理气体的出口。 一种包含从半导体制造设备排出的卤素系气体的废气的处理方法和处理装置，不需要频繁地更换新的清洁剂，即使在加工含有 提供高反应性气体，并且能够容易地降低处理后的气体中的卤素系气体的浓度。

    Processing method of gas and processing apparatus of gas
    5.
    发明申请
    Processing method of gas and processing apparatus of gas 审中-公开
    气体处理方法及气体处理装置

    公开(公告)号：US20060018814A1

    公开(公告)日：2006-01-26

    申请号：US11174519

    申请日：2005-07-06

    申请人： Takashi Shimada ,  Noboru Takemasa ,  Koshi Ochi ,  Hiroshi Waki

    发明人： Takashi Shimada ,  Noboru Takemasa ,  Koshi Ochi ,  Hiroshi Waki

    IPC分类号： B01J8/00 ,  B01J8/04

    CPC分类号： F01N3/0807 ,  B01D51/10 ,  B01D53/261 ,  B01D53/9409 ,  B01D2253/108 ,  B01D2255/1023 ,  B01J8/025 ,  B01J8/0457 ,  B01J2208/00203 ,  B01J2219/00038 ,  B01J2219/0004 ,  F01N3/0878 ,  F01N13/0097 ,  F01N2570/22 ,  Y02T10/20

    摘要： A processing method of gas containing water and nitrogen oxides, which comprises the steps of bringing the gas into contact with a water adsorbent to remove water contained in the gas, and then, bringing the gas into contact with a palladium catalyst to remove nitrogen oxides contained in the gas. A processing apparatus of gas containing water and nitrogen oxides, which comprises an inlet for the gas containing water and nitrogen oxides, a filling part for a water adsorbent, a filling part for a palladium catalyst and an outlet for the processed gas, wherein the filling part for a water adsorbent is deployed adjacent to the inlet, and the filling part for a palladium catalyst is deployed adjacent to the outlet. A processing method and a processing apparatus for easily removing nitrogen oxides contained in gas such as air with superior processing capability and removing efficiency without employing processing unit having the structure of large-scale or complicated, without unintentionally desorbing the nitrogen oxides once adsorbed is obtained.

    摘要翻译： 一种包含水和氮氧化物的气体的处理方法，包括使气体与水吸附剂接触以除去气体中所含的水，然后使气体与钯催化剂接触以除去所含的氮氧化物的步骤 在气中。 一种含有水和氮氧化物的气体的处理装置，包括用于含有水和氮氧化物的气体的入口，用于吸水剂的填充部分，用于钯催化剂的填充部分和用于处理气体的出口，其中填充物 用于吸附剂的部分邻近入口部署，并且用于钯催化剂的填充部分邻近出口部署。 获得了一种处理方法和处理装置，用于容易地除去气体如空气中所含的氮氧化物，具有优异的处理能力和除去效率，而不使用具有大规模或复杂结构的处理单元，而不会一旦吸附一氧化氮就无意地解吸附。

    Process for purification of rare gas
    6.
    发明授权
    Process for purification of rare gas 失效
    稀有气体净化工艺

    公开(公告)号：US5294422A

    公开(公告)日：1994-03-15

    申请号：US956619

    申请日：1992-10-05

    申请人： Koichi Kitahara ,  Kenji Ohtsuka ,  Noboru Takemasa ,  Shinobu Kamiyama

    发明人： Koichi Kitahara ,  Kenji Ohtsuka ,  Noboru Takemasa ,  Shinobu Kamiyama

    IPC分类号： B01D53/14 ,  B01D53/28 ,  B01J20/02 ,  C01B23/00 ,  C22C16/00 ,  C22C27/02 ,  B01D53/04

    CPC分类号： C01B23/00

    摘要： Highly purified rare gas (helium, neon, argon, krypton, xenon, etc.) is obtained by removing impurities contained therein, such as nitrogen, hydrocarbon, carbon monoxide, carbon dioxide, oxygen, hydrogen and water, at relatively low temperatures by the use of a getter. This getter is a two-component alloy of zirconium and vanadium, or a multi-component alloy containing, as well as zirconium and vanadium, at least one of chromium, nickel and cobalt.

    摘要翻译： 通过在相对较低的温度下除去其中包含的杂质如氮气，烃，一氧化碳，二氧化碳，氧气，氢气和水，可以获得高纯度稀有气体（氦气，氖气，氩气，氪气，氙气等） 使用吸气剂。 该吸气剂是锆和钒的双组分合金，或含有铬，镍和钴中的至少一种的锆和钒的多组分合金。