PROCESS FOR PREPARING TRICHLOROSILANE
    1.
    发明申请
    PROCESS FOR PREPARING TRICHLOROSILANE 审中-公开
    制备三氯硅烷的方法

    公开(公告)号:US20140017155A1

    公开(公告)日:2014-01-16

    申请号:US13884326

    申请日:2011-10-13

    IPC分类号: C01B33/107

    摘要: The present invention relates to a process for preparing trichlorosilane and optionally, if required, HCDS and OCTS, by a) in a first step, allowing silicon tetrachloride and silicon to react at a temperature of >800 to 1450° C., b) in a step two, cooling the product stream (PS) thus obtained from step one to obtain a product stream (PG2), c) optionally, in a step three, removing STC and HCDS from the product stream (PG2) to obtain, as a residue or bottom product, a product mixture (PG3), d) optionally, in a step four, removing OCTS from the product stream PG3 from step three, to obtain, as a residue or bottom product, a product mixture (PG4), e) in a step five, reacting the product stream (PG2) originating from step two or the product mixture (PG3) originating from step three or the product mixture (PG4) originating from step four, or a mixture of product streams PG2 and PG3 or a mixture of product streams PG2 and PG4 with hydrogen chloride to obtain a product stream (PHS), and f) in a subsequent step six, removing trichlorosilane from a product stream (PHS) thus obtained, and discharging the remaining STC-containing bottoms or recycling them as a reactant component into step one of the process.

    摘要翻译: 本发明涉及一种制备三氯硅烷的方法,以及任选地,如果需要,HCDS和OCTS,通过a)在第一步中,使四氯化硅和硅在> 800至1450℃的温度下反应,b)在 步骤二,冷却从步骤1获得的产物流(PS)以获得产物流(PG2),c)任选地,在步骤3中,从产物流(PG2)中除去STC和HCDS,以获得作为 残留物或底部产物,产物混合物(PG3),d)任选地,在步骤4中,从步骤3从产物流PG3中除去OCTS,得到作为残余物或底部产物的产物混合物(PG4),e )在步骤5中使来自步骤2的产物流(PG2)或源自步骤3的产物混合物(PG3)或源自步骤4的产物混合物(PG4)或产物流PG2和PG3的混合物或 产物流PG2和PG4与氯化氢的混合物以获得产物流(PHS),和f)in 随后的步骤6,从如此获得的产物流(PHS)中除去三氯硅烷,并排出剩余的含STC的底部物质或将其作为反应物组分再循环到该方法的第一步中。

    CONTAINER FOR HANDLING AND TRANSPORTING OF HIGH-PURITY AND ULTRA-HIGH-PURITY CHEMICALS
    4.
    发明申请
    CONTAINER FOR HANDLING AND TRANSPORTING OF HIGH-PURITY AND ULTRA-HIGH-PURITY CHEMICALS 审中-公开
    用于处理和运输高纯度和超高纯化学品的容器

    公开(公告)号:US20150102070A1

    公开(公告)日:2015-04-16

    申请号:US14383757

    申请日:2013-02-11

    IPC分类号: B67D7/02 B65B3/00 B67D7/84

    摘要: The invention relates to an empty container (1) for accommodating high-purity and ultra-high-purity, air- and/or moisture-sensitive liquid or condensable compounds, comprising a cylindrical jacket (3), a bottom (4a) and an upper end piece (4b, 4b′) at the two ends of the cylindrical jacket, an associated connection unit (2) including shut-off/multiple-way and rinsing system (5), and an associated immersion pipe (7), characterized in that the lower end of the immersion pipe (7a) protrudes into a recess (4c) (depression), which is introduced in the bottom (4a) and which is the lowest point of the bottom, and/or the lower end of the immersion pipe (7a) is tapered and is brought close to the lowest point of the bottom (4a) to within less than 2 mm by means of the tip of the tapered immersion pipe (7b) or touches the lowest point of the bottom with the tip of the tapered immersion pipe (7b). The invention further relates to the use of empty containers according to the invention for storing, handling, and/or transporting such high-purity and ultra-high-purity compounds.

    摘要翻译: 本发明涉及一种用于容纳高纯度和超高纯度空气和/或湿度敏感性液体或可冷凝化合物的空容器(1),其包括圆柱形护套(3),底部(4a)和 包括关闭/多路和冲洗系统(5)的关联连接单元(2)和相关联的浸入式管道(7),其特征在于,所述圆柱形套管两端的上端件(4b,4b') 浸入管(7a)的下端突出到凹入部(4c)(凹陷部)(凹部),该凹部被引入到底部(4a)中,并且是底部的最低点,和/ 浸入管(7a)是锥形的,并且通过锥形浸入管(7b)的尖端使其靠近底部(4a)的最低点到小于2mm内,或者接触底部的最低点 锥形浸入管(7b)的尖端。 本发明还涉及根据本发明的用于储存,处理和/或运输这种高纯度和超高纯度化合物的空容器的用途。