公开(公告)号：US5892579A

公开(公告)日：1999-04-06

申请号：US843453

申请日：1997-04-16

申请人： Emanuel Elyasaf ,  Yair Eran

发明人： Emanuel Elyasaf ,  Yair Eran

IPC分类号： G01N21/88 ,  G01N21/956 ,  G03F1/84 ,  H01L21/66

CPC分类号： G01N21/88

摘要： This invention discloses an apparatus for optically inspecting an object having upper and lower faces for indicating the condition of the object, including a lighting system periodically reflecting a beam of light from one face of the object to produce a series of short-duration time-spaced reflected beams, and periodically transmitting a beam of light through both faces of the object to produce a series of short-duration time-spaced transmitted beams time-interlaced with the reflected beams, a sensor sensing the short-duration time-spaced reflected beams and transmitted beams, and generating electrical outputs corresponding thereto, and a processor receiving the electrical outputs and processing them to provide an indication of the condition of the object.A method of optically inspecting an object having upper and lower faces for indicating the condition of the object is also described.

摘要翻译： 本发明公开了一种用于光学检查具有上表面和下表面的物体以指示物体的状态的装置，包括周期性地反射来自物体的一个面的光束的照明系统，以产生一系列短时间间隔 反射光束，并且周期性地发射光束通过物体的两个面，以产生与反射光束时间隔行的一系列短时间间隔的发射光束;传感器感测短时间间隔反射光束， 发射光束，以及产生对应于其的电输出，以及处理器，其接收电输出并对其进行处理以提供对象的状况的指示。 还描述了用于光学检查具有用于指示对象的状况的上表面和下表面的对象的方法。

公开(公告)号：US06268093B1

公开(公告)日：2001-07-31

申请号：US09417518

申请日：1999-10-13

申请人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

发明人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

IPC分类号： G03F900

CPC分类号： G03F7/701 ,  G03F1/84 ,  G03F7/70125 ,  G03F7/70616 ,  G03F7/70633

摘要： A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.

摘要翻译： 可以使用用于检查掩模版的掩模版检查系统作为进入的检查工具，以及作为周期性和预曝光检查工具。 面具店可以将其用作与客户兼容的检测工具，也可以作为可打印的错误检测工具。 本发明系统检测出两种缺陷：（1）打印图像中的线宽错误; （2）表面缺陷。 在模具区域上检测线宽错误。 通过在与曝光条件（即波长，数值孔径，西格玛和照明孔径类型）相同的光学条件下获取掩模版的图像，并且通过比较多个管芯以发现线宽中的误差来执行检测。 在掩模版上遍历表面缺陷。 通过获取掩模版的透射和暗场反射图像并使用组合信息来检测颗粒和其它表面缺陷来执行表面缺陷的检测。

公开(公告)号：US07133548B2

公开(公告)日：2006-11-07

申请号：US09851779

申请日：2001-05-08

申请人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

发明人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

IPC分类号： G06K9/00

CPC分类号： G03F7/701 ,  G03F1/84 ,  G03F7/70125 ,  G03F7/70616 ,  G03F7/70633

摘要： A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.

摘要翻译： 可以使用用于检查掩模版的掩模版检查系统作为进入的检查工具，以及作为周期性和预曝光检查工具。 面具店可以将其用作与客户兼容的检测工具，并可作为可打印的错误检测工具。 本发明系统检测出两种缺陷：（1）打印图像中的线宽错误; （2）表面缺陷。 在模具区域上检测线宽错误。 通过在与曝光条件（即波长，数值孔径，西格玛和照明孔径类型）相同的光学条件下获取掩模版的图像，并且通过比较多个管芯以发现线宽中的误差来执行检测。 在掩模版上遍历表面缺陷。 通过获取掩模版的透射和暗场反射图像并使用组合信息来检测颗粒和其它表面缺陷来执行表面缺陷的检测。

公开(公告)号：US07587700B2

公开(公告)日：2009-09-08

申请号：US10817104

申请日：2004-04-01

申请人： Youval Nehmadi ,  Zamir Abraham ,  Gil Sod-Moriah ,  Yair Eran ,  Chen Ofek ,  Yaron Cohen ,  Ariel Ben-Porath

发明人： Youval Nehmadi ,  Zamir Abraham ,  Gil Sod-Moriah ,  Yair Eran ,  Chen Ofek ,  Yaron Cohen ,  Ariel Ben-Porath

IPC分类号： G06F17/50

CPC分类号： G01R31/303 ,  G01N23/225 ,  H01J2237/2814

摘要： The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing the received design information to provide a large number of measurement targets; and (iii) associating target measurement parameters to each of large number of measurement targets.The invention provides a system that includes: (i) an interface for receiving design information representative of a portion of a layer of an object that includes sub micron measurement targets; and (ii) a processor, coupled to the interface, for processing the received design information to provide a large number of measurement targets; and for associating target measurement parameters to each of large number of measurement targets.

摘要翻译： 本发明提供了一种方法，其包括以下阶段：（i）接收表示包含亚微米测量目标的对象的一部分的设计信息，（ii）处理所接收的设计信息以提供大量的测量目标; 和（iii）将目标测量参数与大量测量目标中的每一个相关联。 本发明提供了一种系统，其包括：（i）接口，用于接收表示包含亚微米测量目标的物体层的一部分的设计信息; 以及（ii）耦合到所述接口的处理器，用于处理所接收的设计信息以提供大量的测量目标; 并且用于将目标测量参数与大量测量目标中的每一个相关联。

公开(公告)号：US20060251317A1

公开(公告)日：2006-11-09

申请号：US11400530

申请日：2006-04-10

申请人： Yair Eran ,  Gad Greenberg ,  Ami Sade ,  Shirley Hemar

发明人： Yair Eran ,  Gad Greenberg ,  Ami Sade ,  Shirley Hemar

IPC分类号： G06K9/00

CPC分类号： G03F1/84 ,  G03F7/70625 ,  G06T7/0006 ,  G06T2207/30148

摘要： A method and apparatus for inspecting a reticle measures line widths using an inspection tool that images the reticle and compares the image with a design database to detect errors in real time. The differences between the line widths of patterns on the reticle and the design database are stored during the inspection procedure. The difference (or “bias”) information is then processed off-line to create a map of all the local line-width deviation values (i.e., bias) of every feature on the reticle. The resultant local bias map can be used as a feedback mechanism to improve the reticle manufacturing process, as a “go/no go” criteria for the validity of the reticle, and as a standard report shipped together with the mask to the wafer fabrication facility, where it can be used as a yield-enhancing tool.

公开(公告)号：US06360005B1

公开(公告)日：2002-03-19

申请号：US08679739

申请日：1996-07-12

申请人： Meir Aloni ,  Amir Alon ,  Yair Eran ,  Itzhak Katz ,  Yigal Katzir ,  Gideon Rosenfeld

发明人： Meir Aloni ,  Amir Alon ,  Yair Eran ,  Itzhak Katz ,  Yigal Katzir ,  Gideon Rosenfeld

IPC分类号： G06K964

CPC分类号： G06T7/001 ,  G01N21/95607 ,  G06T2207/10056 ,  G06T2207/20036 ,  G06T2207/30141 ,  G06T2207/30148

摘要： A defect detection system for inspecting objects such as reticles, photomasks, semiconductor wafers, flat panel displays and other patterned objects has two or more stages, whereby the object is examined separately for fine defects, by inspecting a binary level representation of the object, and for ultra fine defects, by inspecting a gray level representation of the object. The system also includes re-inspection apparatus for re-inspection of detected defects, thereby to reduce the false alarm rate, and for classifying the remaining defects by size, area and type.

摘要翻译： 用于检查诸如掩模版，光掩模，半导体晶片，平板显示器和其它图案对象的物体的缺陷检测系统具有两个或更多个阶段，由此通过检查物体的二进制水平表示来分开检查物体以获得精细缺陷，以及 对于超细缺陷，通过检查对象的灰度级表示。 该系统还包括用于重新检查检测到的缺陷的再检查装置，从而降低误报率，并根据尺寸，面积和类型对剩余缺陷进行分类。

公开(公告)号：US07486814B2

公开(公告)日：2009-02-03

申请号：US11400530

申请日：2006-04-10

申请人： Yair Eran ,  Gad Greenberg ,  Ami Sade ,  Shirley Hemar

发明人： Yair Eran ,  Gad Greenberg ,  Ami Sade ,  Shirley Hemar

IPC分类号： G06K9/00

CPC分类号： G03F1/84 ,  G03F7/70625 ,  G06T7/0006 ,  G06T2207/30148

摘要： A method and apparatus for inspecting a reticle measures line widths using an inspection tool that images the reticle and compares the image with a design database to detect errors in real time. The differences between the line widths of patterns on the reticle and the design database are stored during the inspection procedure. The difference (or “bias”) information is then processed off-line to create a map of all the local line-width deviation values (i.e., bias) of every feature on the reticle. The resultant local bias map can be used as a feedback mechanism to improve the reticle manufacturing process, as a “go/no go” criteria for the validity of the reticle, and as a standard report shipped together with the mask to the wafer fabrication facility, where it can be used as a yield-enhancing tool.

摘要翻译： 用于检查掩模版的方法和装置使用对掩模版进行成像的检查工具测量线宽，并将图像与设计数据库进行比较以实时检测错误。 在检查过程中存储了掩模版和设计数据库上的图案的线宽之间的差异。 然后离线处理差异（或“偏置”）信息以创建掩模版上每个特征的所有局部线宽偏差值（即，偏置）的图。 所得到的局部偏置图可以用作反馈机制来改进光罩制造过程，作为标线的有效性的“去/不去”标准，以及作为与掩模一起发送到晶片制造设备的标准报告 ，其中它可以用作产量增强工具。

公开(公告)号：US5619429A

公开(公告)日：1997-04-08

申请号：US801761

申请日：1991-11-27

申请人： Meir Aloni ,  Amir Alon ,  Yair Eran ,  Itzhak Katz ,  Yigal Katzir ,  Gideon Rosenfeld

发明人： Meir Aloni ,  Amir Alon ,  Yair Eran ,  Itzhak Katz ,  Yigal Katzir ,  Gideon Rosenfeld

IPC分类号： G01N21/956 ,  G06T7/00 ,  G06K9/68

CPC分类号： G06T7/001 ,  G01N21/95607 ,  G06T2207/10056 ,  G06T2207/30148

摘要： An inspection method including the steps of providing a patterned object to be inspected and compared with a reference, inspecting the patterned object and providing an output of information relating to the visual characteristics of the patterned object, comparing binary level information relating to the visual characteristics of the patterned object to binary level information relating to the visual characteristics of the reference, and comparing gray level information relating to the visual characteristics of the patterned object to gray level information relating to the visual characteristics of the reference.

摘要翻译： 一种检查方法，包括以下步骤：提供待检查的图案化对象并与参考进行比较，检查图案化对象并提供与图案化对象的视觉特征相关的信息的输出，比较与视觉特征有关的二进制级信息 所述图案化对象与所述参考物的视觉特征相关的二进制级信息，以及将与所述图案对象的视觉特征相关的灰度级信息与所述参考的视觉特征相关的灰度级信息进行比较。

公开(公告)号：US20080092088A1

公开(公告)日：2008-04-17

申请号：US10817104

申请日：2004-04-01

申请人： Youval Nehmadi ,  Zamir Abraham ,  Gil Sod-Moriah ,  Yair Eran ,  Chen Ofek ,  Yaron Cohen ,  Ariel Ben-Porath

发明人： Youval Nehmadi ,  Zamir Abraham ,  Gil Sod-Moriah ,  Yair Eran ,  Chen Ofek ,  Yaron Cohen ,  Ariel Ben-Porath

IPC分类号： G06F17/50

CPC分类号： G01R31/303 ,  G01N23/225 ,  H01J2237/2814

摘要： The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing the received design information to provide a large number of measurement targets; and (iii) associating target measurement parameters to each of large number of measurement targets.The invention provides a system that includes: (i) an interface for receiving design information representative of a portion of a layer of an object that includes sub micron measurement targets; and (ii) a processor, coupled to the interface, for processing the received design information to provide a large number of measurement targets; and for associating target measurement parameters to each of large number of measurement targets.

摘要翻译： 本发明提供了一种方法，其包括以下阶段：（i）接收表示包含亚微米测量目标的对象的一部分的设计信息，（ii）处理所接收的设计信息以提供大量的测量目标; 和（iii）将目标测量参数与大量测量目标中的每一个相关联。 本发明提供了一种系统，其包括：（i）接口，用于接收表示包含亚微米测量目标的物体层的一部分的设计信息; 以及（ii）耦合到所述接口的处理器，用于处理所接收的设计信息以提供大量的测量目标; 并且用于将目标测量参数与大量测量目标中的每一个相关联。

公开(公告)号：US07133549B2

公开(公告)日：2006-11-07

申请号：US10322708

申请日：2002-12-19

申请人： Yair Eran ,  Gad Greenberg ,  Ami Sade ,  Shirley Hemar

发明人： Yair Eran ,  Gad Greenberg ,  Ami Sade ,  Shirley Hemar

IPC分类号： G06K9/00 ,  G06K9/48

CPC分类号： G03F1/84 ,  G03F7/70625 ,  G06T7/0006 ,  G06T2207/30148

摘要： A method and apparatus for inspecting a reticle measures line widths using an inspection tool that images the reticle and compares the image with a design database to detect errors in real time. The differences between the line widths of patterns on the reticle and the design database are stored during the inspection procedure. The difference (or “bias”) information is then processed off-line to create a map of all the local line-width deviation values (i.e., bias) of every feature on the reticle. The resultant local bias map can be used as a feedback mechanism to improve the reticle manufacturing process, as a “go/no go” criteria for the validity of the reticle, and as a standard report shipped together with the mask to the wafer fabrication facility, where it can be used as a yield-enhancing tool.