公开(公告)号：US20100245829A1

公开(公告)日：2010-09-30

申请号：US12750356

申请日：2010-03-30

申请人： Eric Peter Goodwin ,  Daniel Gene Smith ,  Michael Sogard

发明人： Eric Peter Goodwin ,  Daniel Gene Smith ,  Michael Sogard

IPC分类号： G01N21/55 ,  G02B27/14 ,  G02B15/14

CPC分类号： G02B7/28 ,  G01B11/02 ,  G02B27/40

摘要： An autofocus system and method designed to account for instabilities in the system, e.g. due to instabilities of system components (e.g. vibrating mirrors, optics, etc) and/or environmental effects such as refractive index changes of air due to temperature, atmospheric pressure, or humidity gradients, is provided. An autofocus beam is split into a reference beam component (the split off reference channel) and a measurement beam component, by a beam splitting optic located a predetermined distance from (and in predetermined orientation relative to) the substrate, to create a first space between the beam splitting optic and the substrate. A reflector is provided that is spaced from the beam splitting optic by the predetermined distance, to create a second space between the reflector and the beam splitting optic. The measurement beam component is directed at the substrate and a reflected measurement beam component through the first space between the substrate and the beam splitting optic, while the reference beam component is directed at the reflector and a reflected reference beam component is directed from the reflector through the second space between the beam splitting optic and the reflector. The reflected reference and measurement beam components are returned to the beam splitting optic, and emerge substantially collinear from the beam splitting optic. The reference and measurement beam components are then detected, and provide information that enables compensation for changes in the z position of the substrate that are due to instabilities in the autofocus system components and/or environmental factors.

摘要翻译： 一种自动对焦系统和方法，设计用于解决系统中的不稳定性，例如。 由于系统组件（例如振镜，光学等）的不稳定性和/或诸如由于温度，大气压力或湿度梯度引起的空气折射率变化的环境影响。 通过分束光学器件将自动聚焦光束分成参考光束分量（分离参考通道）和测量光束分量，所述分束光学元件位于距基板（并且在相对于基板的预定取向）预定距离处，以在基板之间产生第一空间， 分束光学元件和基板。 提供了一个与光束分离光学元件隔开预定距离的反射器，以在反射器和分束光学元件之间产生第二空间。 测量光束分量指向基板，反射的测量光束分量通过基板和分束光学元件之间的第一空间，而参考光束分量指向反射器，反射参考光束分量从反射器通过 分束光学元件和反射器之间的第二个空间。 反射的参考和测量光束分量返回到分束光学元件，并且从分束光学器件基本上共线地出射。 然后检测参考和测量光束分量，并且提供能够补偿由于自动聚焦系统部件和/或环境因素中的不稳定性导致的基板的z位置的变化的信息。

公开(公告)号：US20120099089A1

公开(公告)日：2012-04-26

申请号：US13277085

申请日：2011-10-19

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G03B27/68 ,  G03B27/32

CPC分类号： G01M11/02 ,  G03F1/84 ,  G03F7/70 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70875

摘要： An apparatus and method for measuring thermo-mechanically induced reticle distortion or other distortion in a lithography device enables detecting distortion at the nanometer level in situ. The techniques described use relatively simple optical detectors and data acquisition electronics that are capable of monitoring the distortion in real time, during operation of the lithography equipment. Time-varying anisotropic distortion of a reticle can be measured by directing slit patterns of light having different orientations to the reticle and detecting reflected, transmitted or diffracted light from the reticle. In one example, corresponding segments of successive time measurements of secondary light signals are compared as the reticle scans a substrate at a reticle stage speed of about 1 m/s to detect temporal offsets and other features that correspond to spatial distortion.

摘要翻译： 用于测量光刻设备中热机械感应掩模版失真或其它变形的装置和方法能够在原位检测纳米级的失真。 所描述的技术使用相对简单的光学检测器和数据采集电子器件，其能够在光刻设备的操作期间实时监测失真。 可以通过将具有不同取向的光的狭缝图案引导到掩模版并检测来自掩模版的反射的，透射的或衍射的光来测量光罩的时变各向异性失真。 在一个示例中，当光掩模版以大约1m / s的标线片级速度扫描衬底以检测对应于空间失真的时间偏移和其他特征时，比较次级光信号的相继的连续时间测量段。

公开(公告)号：US07426014B2

公开(公告)日：2008-09-16

申请号：US11628960

申请日：2005-05-18

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03D3/02 ,  C07K14/005 ,  C12N2740/15022 ,  G01N33/56983 ,  G01N2333/155 ,  G01N2469/20 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/7085 ,  G03F7/709

摘要： A dynamic fluid control system and method capable of reducing dynamic forces from the fluid on the last optical element (20) and substrate stage (14) caused by the motion of the immersion fluid. The system includes an imaging element (12) that defines an image and a stage (14) configured to support a substrate (16). An optical system (18) is provided to project the image defined by the imaging element onto the substrate. The optical system (18) includes a last optical element (20). A gap (22) filled with immersion fluid is provided between the substrate (16) and the last optical element (20). A dynamic force control system (34) is provided to maintain a substantially constant force on the last optical element and the stage (14) by compensating for dynamic changes of the immersion fluid caused by the motion of the immersion fluid through the gap and/or movement of the stage.

摘要翻译： 一种动态流体控制系统和方法，其能够减少由浸没流体的运动引起的最后光学元件（20）和基底台（14）上的流体的动力。 该系统包括限定图像的成像元件（12）和被配置为支撑衬底（16）的台（14）。 提供光学系统（18）以将由成像元件限定的图像投影到基板上。 光学系统（18）包括最后一个光学元件（20）。 在衬底（16）和最后一个光学元件（20）之间提供填充有浸液的间隙（22）。 提供动态力控制系统（34），以通过补偿由浸没流体通过间隙和/或运动的运动引起的浸没流体的动态变化，在最后的光学元件和载物台（14）上保持基本恒定的力 舞台运动。

公开(公告)号：US20070121091A1

公开(公告)日：2007-05-31

申请号：US11572394

申请日：2007-01-19

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G03B27/62

CPC分类号： G03F7/70875 ,  G03F7/70916 ,  G03F7/70933

摘要： Methods and apparatus for using a flow of a relatively cool gas to establish a temperature gradient between a reticle and a reticle shield to reduce particle contamination on the reticle are disclosed. According to one aspect of the present invention, an apparatus that reduces particle contamination on a surface of an object includes a plate and a gas supply. The plate is positioned in proximity to the object such that the plate, which has a second temperature, and the object, which has a first temperature, are substantially separated by a space. The gas supply supplies a gas flow into the space. The gas has a third temperature that is lower than both the first temperature and the second temperature. The gas cooperates with the plate and the object to create a temperature gradient and, hence, a thermophoretic force that conveys particles in the space away from the object.

摘要翻译： 公开了使用相对冷气体的流动来建立标线片和掩模版屏蔽之间的温度梯度以减少掩模版上的颗粒污染的方法和装置。 根据本发明的一个方面，减少物体表面上的颗粒污染的装置包括板和气体供应。 板被定位在物体附近，使得具有第二温度的板和具有第一温度的物体基本上被空间隔开。 气体供应气体供应到空间。 气体具有低于第一温度和第二温度的第三温度。 气体与板和物体配合以产生温度梯度，并因此产生将空间中的颗粒传送离开物体的热解压力。

公开(公告)号：US20070103656A1

公开(公告)日：2007-05-10

申请号：US11266839

申请日：2005-11-04

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70066 ,  G03F7/70875

摘要： Blind devices and related methods are described in the context of lithography systems. In an exemplary system a vacuum chamber has a first chamber portion and a second chamber portion. An exposure aperture is defined in a member situated between the chambers. A reticle stage in the first chamber portion holds a reticle movably relative to the exposure aperture. A gas with a temperature gradient is delivered into the first chamber portion so as to establish a thermophoretic condition with respect to at least a portion of the reticle. A fixed-blind-aperture assembly, movable relative to the exposure aperture and the reticle to an exposure position and to a non-exposure position, defines an illumination aperture through which light from the second chamber portion and gas from the first chamber portion pass through the exposure aperture when the fixed-blind-aperture assembly is in the exposure position. A gas-passage aperture, defined in the member, conducts the gas, passing through the illumination aperture, from the first chamber portion to the second chamber portion when the fixed-blind-aperture assembly is in the non-exposure position.

摘要翻译： 在光刻系统的上下文中描述了盲设备和相关方法。 在示例性系统中，真空室具有第一室部分和第二室部分。 暴露孔被限定在位于室之间的构件中。 第一室部分中的标线片台相对于曝光孔保持可移动的标线片。 具有温度梯度的气体被输送到第一室部分中，以便相对于掩模版的至少一部分建立热解析条件。 固定盲孔组件可相对于曝光孔和掩模版移动到曝光位置和非曝光位置，限定了一个照明孔，来自第二室部分的光和来自第一室部分的气体通过该孔径通过 当固定式盲孔组件处于曝光位置时的曝光孔径。 当固定盲孔组件处于非曝光位置时，限定在构件中的气体通道孔口将通过照明孔的气体从第一室部分传导到第二室部分。

公开(公告)号：US20060187434A1

公开(公告)日：2006-08-24

申请号：US11064169

申请日：2005-02-22

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G03B27/52

CPC分类号： G03F9/7026 ,  G03F9/7049

摘要： Improved autofocusing (“AF”) methods and devices for lithography are provided. Some embodiments of the invention provide an AF system that includes one or more interferometers for measuring a distance to a wafer surface or a reticle surface. The invention includes methods and devices for calibrating the interferometer(s) according to known distances to a target. According to some embodiments of the invention, a spatial filter reduces the amount of undesired signal coming from the wafer or reticle surface. In some such embodiments, higher orders of diffracted light from the wafer or reticle multilayer surfaces are eliminated with a pinhole filter oriented to reject light that is not vertically directed. Other embodiments include a spatial filtering system that passes a selected diffraction order, e.g., the first order of diffracted light, from the target. These spatial filters reduce variations in the signal and make further signal processing easier. By including a beam expander, the interferometer beam can sample a larger or smaller area on the wafer. In another embodiment a polarizer will help attenuate scattered or diffracted light received by the interferometer. In some embodiments, the wavelength of the light used by the AF system is selected to maximize the absorption or reflection of this light by part of the target, e.g., by the reticle multilayer or the absorber layer.

摘要翻译： 提供了改进的自动对焦（“AF”）方法和光刻设备。 本发明的一些实施例提供一种AF系统，其包括用于测量到晶片表面或掩模版表面的距离的一个或多个干涉仪。 本发明包括用于根据到目标的已知距离校准干涉仪的方法和装置。 根据本发明的一些实施例，空间滤波器减少了来自晶片或标线片表面的非期望信号的量。 在一些这样的实施例中，用针孔滤光器取代来自晶片或标线片多层表面的更高级的衍射光，以排除不垂直指向的光。 其他实施例包括空间滤波系统，其将来自目标的选定衍射级，例如衍射光的一级传递。 这些空间滤波器减少了信号的变化，并使得进一步的信号处理更容易。 通过包括光束扩展器，干涉仪光束可以对晶片上的更大或更小的区域进行采样。 在另一个实施例中，偏振器将有助于衰减由干涉仪接收的散射光或衍射光。 在一些实施例中，AF系统使用的光的波长被选择为使得该光的一部分被靶的吸收或反射最大化，例如通过掩模版多层或吸收层。

公开(公告)号：US20060124864A1

公开(公告)日：2006-06-15

申请号：US11011863

申请日：2004-12-14

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G01N23/00

CPC分类号： G03F7/70841 ,  F16C29/025 ,  F16C32/0603 ,  F16C2300/62 ,  G03F7/70716 ,  G03F7/70816

摘要： Methods and apparatus for enabling the stroke length of a linear guide that is suitable for use in an environment with high vacuum levels to be substantially independent of a length associated with the linear guide are disclosed. According to one aspect of the present invention, a guide bearing system includes a linear guide and a first guide beam. The linear guide has an inner surface which includes an air pad. The linear guide is wrapped around the first guide beam such that it may slide with respect to the guide beam. The guide beam includes a first chamber that is in fluid communication with the linear guide through at least one of a first plurality of ports in the guide beam which enable access to the first chamber.

摘要翻译： 公开了一种能够使线性引导件的行程长度适用于具有高真空度的环境中的方法和装置，其基本上与直线引导件相关联的长度无关。 根据本发明的一个方面，一种导向轴承系统包括直线导轨和第一导向梁。 线性引导件具有包括气垫的内表面。 线性引导件围绕第一引导梁缠绕，使得其可相对于引导梁滑动。 引导梁包括通过导向梁中的第一多个端口中的至少一个与线性引导件流体连通的第一室，其能够进入第一室。

公开(公告)号：US20060082742A1

公开(公告)日：2006-04-20

申请号：US10967123

申请日：2004-10-19

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  G03F7/70916

摘要： A subsystem for an exposure apparatus has a thermophoretic plate and at least one shielding layer covering a first surface of the thermophoretic plate. The at least one shielding layer controls thermally induced distortions of the exposure apparatus by reducing heat transfer between the exposure apparatus and the thermophoretic plate. The shielding layer includes an insulation layer and a reflective layer, where the reflective layer has a surface with a low emissivity. In one implementation, the reflective surface may be a surface of the thermophoretic plate. The reflective surface should be facing the exposure apparatus, but is not a requirement. More than one shielding layer may be used, in which each outermost shielding layer will have a higher temperature.

摘要翻译： 用于曝光装置的子系统具有热泳板和覆盖热泳板的第一表面的至少一个屏蔽层。 所述至少一个屏蔽层通过减少曝光装置和热泳板之间的热传导来控制曝光装置的热诱导失真。 屏蔽层包括绝缘层和反射层，其中反射层具有低发射率的表面。 在一个实施方案中，反射表面可以是热泳板的表面。 反射面应面向曝光装置，但不是要求。 可以使用多于一个屏蔽层，其中每个最外面的屏蔽层将具有较高的温度。

公开(公告)号：US20060028632A1

公开(公告)日：2006-02-09

申请号：US11237799

申请日：2005-09-29

申请人： Andrew Hazelton ,  Michael Sogard

发明人： Andrew Hazelton ,  Michael Sogard

IPC分类号： G03B27/42

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near the device. The immersion fluid system delivers an immersion fluid that fills the gap and collects the immersion fluid that is directly between the fluid barrier and the device. The fluid barrier can include a scavenge inlet that is positioned near the device, and the immersion fluid system can include a low pressure source that is in fluid communication with the scavenge inlet. The fluid barrier confines any vapor of the immersion fluid and prevents it from perturbing a measurement system. Additionally, the environmental system can include a bearing fluid source that directs a bearing fluid between the fluid barrier and the device to support the fluid barrier relative to the device.

公开(公告)号：US06734117B2

公开(公告)日：2004-05-11

申请号：US10098896

申请日：2002-03-12

申请人： Michael Sogard

发明人： Michael Sogard

IPC分类号： H01L2126

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

摘要： A method and system for reducing displacements of a semiconductor wafer caused by thermal stresses during a fabrication process includes clamping the wafer to the multiple segments of a segmented chuck wherein the segmented chuck is capable of selectively clamping and unclamping regions of the semiconductor wafer, exposing a region of the wafer clamped to a segment of the chuck to an energy source during the fabrication process that causes thermal stress in the clamped region, unclamping the exposed region of the semiconductor wafer from the corresponding segment of the segmented chuck, and reclamping the exposed region of the semiconductor wafer to the segmented chuck as the thermal stresses of the exposed wafer region are relieved.

摘要翻译： 一种用于减少在制造过程中由热应力引起的半导体晶片的位移的方法和系统，包括将晶片夹紧到分段卡盘的多个段，其中分段卡盘能够选择性地夹紧和解除半导体晶片的区域， 晶片的一部分区域在制造过程中被夹持到能量源，从而在夹紧区域中引起热应力，从分段卡盘的对应部分松开半导体晶片的暴露区域，并重新拉近暴露区域 的半导体晶片到分段卡盘，因为暴露的晶片区域的热应力被释放。